In 2004, Gigaphoton adopted injection-locking technology and commercialized a twin-chamber mass-production ArF excimer laser before anyone else.  Subsequently, as lithography tools evolve , Gigaphoton has introduced to the market a series of cutting-edge ArF excimer lasers specially designed for immersion lithography and double-patterning immersion lithography. Gigaphoton has also greatly contributed to the development of lithography technologies for gigabit-generation ultra-fine integrated circuits.

In just nine years, Gigaphoton has phenomenally increased its world market share to 50% today from a single-digit market share in 2000 when it was founded. It also has attained the No. 1 share in the Asian market, including Japan, and is expected to seen exceed 40% in the US market.

We at Gigaphoton will continue to achieve steady growth on a global scale, to establish the unchallenged position as the world’s No. 1 excimer laser supplier. Furthermore, we will strive to become a trusted partner of and contributor to our customers.

Gigaphoton is aggressively working on development of extreme ultraviolet (EUV) lithography as one of the next-generation lithography (NGL) technologies for advancing beyond the era of ArF lithography. Gigaphoton has participated in the Extreme Ultraviolet Lithography System Development Association (EUVA), formed with support from Japan’s Ministry of Economy, Trade and Industry (METI), as an original member, and has played an important role in the development of lithography light sources using the laser-produced plasma (LPP) method.