In 2004, Gigaphoton adopted injection-locking technology and commercialized a twin-chamber mass-production ArF excimer laser before anyone else.  Subsequently, as lithography tools evolve , Gigaphoton has introduced to the market a series of cutting-edge ArF excimer lasers specially designed for immersion lithography and double-patterning immersion lithography. Gigaphoton has also greatly contributed to the development of lithography technologies for gigabit-generation ultra-fine integrated circuits.

Having significantly increased its market share since 2003, Gigaphoton is now recognized as the top company in excimer lasers in the Asian market including Japan, and continues to achieve rapid growth in the European and North American markets as well.

Gigaphoton is aggressively working on development of extreme ultraviolet (EUV) lithography as one of the next-generation lithography (NGL) technologies for advancing beyond the era of ArF lithography. Gigaphoton has participated in the Extreme Ultraviolet Lithography System Development Association (EUVA), formed with support from Japan’s Ministry of Economy, Trade and Industry (METI), as an original member, and has played an important role in the development of lithography light sources using the laser-produced plasma (LPP) method.