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Stability and durability are the biggest
technological challenges for an excimer laser, because it uses
fluorine, high-voltage discharge, and deep UV, all of which are
highly reactive. As well as stability and durability, an excimer
laser light source for lithography tools requires high monochromaticity
for the laser beam and high uniformity for the output energy.
As the world’s first excimer laser light source
that satisfies all of these requirements, the G10K has earned a
top reputation in the lithography light source market since it
was marketed in 1997. This model is still operating in the field
world wide. |