Main Features

• Increase of the repetition rate to 4 kHz (double of the G20K) to achieve an average output of 30 W.
• Use of a high-speed actuator (4 kHz) to further enhance wavelength stability of the line-narrowing module.
  

Main Features

• Improvement of the maintenance interval (from 15 billion pulses to 20 billion pulses) by enhancing the efficiency of the field-proven G40K, renowned for its high performance and high uptime.
• Further reduction of CoO
  
  

The G41K+ achieves a high laser emission efficiency with sufficient margin by mounting a magnetic-levitation laser chamber and highly efficient line-narrowing and monitor modules on the G41K platform as standard features. The G41K+ is able to meet various user needs, and allows users to select either low-CoO type or high-output type. The G41K can be upgraded to the G41K+ in the field by replacing the modules.

Main Features

• Higher output (40 W) or ultra-low CoO by further enhancing the emission efficiency of the G41K.
• On-site upgrade from the G41K is possible.

Low-CoO Type
The low-CoO type G41K+ achieves a replacement interval of 30 billion pulses for not only its optical modules but also the magnetic-levitation laser chamber, thus achieving a dramatic reduction of CoO.

High-Output Type
The high-output type G41K+ achieves an output of 40 W, one class higher than any other product, to meet the need of advanced lithography processes that require higher dose. Even such a high output, the G40K+ has prolongs the life of each optical module to 30 billion pulses (50% longer than the G41K).