2012.5.14　News & Event
Gigaphoton Wholly Owned Korean Subsidiary Starts Business Operation
Aiming at Further Expansion of Its Business Through Gigaphoton Korea Inc., and Reinforcement of Relationships with Korean Device Manufacturers
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 Download Korean version (PDF)

2012.4.1　Management Team
We at Gigaphoton aim at further growth with the new management team.
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2012.4.1　Technical Paper
All of the papers presented at the SPIE Advanced Lithography 2012 held on February 12 through 16, 2011, in San Jose, California, have been posted on the Technical Paper page, and are available for downloading.
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2012.3.21　News & Event
Gigaphoton USA Consolidates Its Headquarters Functions in One Location
Business Management, Logistics and Training Facilities in Beaverton Oregon Designed to Meet 10X Growth in Demand in the USA
Gigaphoton, Inc., has announced the Grand Opening of its new US Headquarters and Training Center, located in Beaverton, Oregon.
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2012.2.23　News & Event
Notification of Change of President & CEO
We at Gigaphoton decided at a special meeting of the Board of Directors on February 21, 2012, to appoint a new president and CEO as described below.
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Photograph of New President Hitoshi Tomaru available for downloading:
  President Tomaru Photo (Jpeg 306 KB)

2012.2.13　News & Event
Gigaphoton's Mass Production EUV Light Source Generates EUV Power
Advancing its Mass-Production Plan for an LPP Light Source for EUV Lithography Shipping in 2012
OYAMA, JAPAN; February 13, 2012 - Gigaphoton, Inc., a major lithography light source manufacturer, announced that its mass-production laser-produced plasma (LPP) light source, scheduled to be shipped in 2012, generated 7 watts of EUV power.
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2012.2.6　News & Event
Gigaphoton Shipping the “GT63A” - The Next-Generation ArF Excimer Laser for Multi-Patterning Immersion Lithography
Introduction of the breakthrough “s” series features, extending DUV light source performance, enhancing availability and reducing operating costs
OYAMA, JAPAN; February 6, 2012 - Gigaphoton, Inc. (http://www.gigaphoton.com/e/index.html), a major lithography light source manufacturer, announced that the company will begin shipping the GT63A, the next-generation ArF excimer laser for multi-patterning immersion lithography scanners in the second quarter of 2012.
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2012.2.6　News & Event
Gigaphoton at SPIE Advanced Lithography 2012
Gigaphoton will present the paper at the "SPIE Advanced Lithography 20112", to be held on February 12 (Sun.) through 16 (Thu.), 2012, at the San Jose McEnery Convention Center and San Jose Marriot (Headquarters Hotel) in San Jose, California, USA.
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2011.12.5　News & Event
Gigaphoton Ships 1,000th Excimer Laser for Photolithography
OYAMA, JAPAN; December 5, 2011 — Gigaphoton Inc., a major lithography light source manufacturer, announced today that the company has shipped its 1,000th excimer laser for semiconductor photolithography.
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2011.11.17　News & Event
Gigaphoton Seminar
We will hold a private seminar on "Challenges in High-End Lithography and Solutions from the Light Source" at SEMICON Japan 2011. Leading engineer from the world's major semiconductor device manufacturer will make a presentation on the leading edge of lithography technologies as well as the Gigaphoton's solutions in technologies and products. 
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2011.11.8　Technical Paper
All of the papers presented at the 2011 International Symposia on Extreme Ultraviolet Lithography and Lithography Extensions held on October 17 (Mon.) through October 21 (Fri.), 2011, at JW Marriott Marquis Miami in Miami, Florida, have been posted on the Technical Paper page, and are available for downloading.
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2011.10.17　News & Event
Gigaphoton at the 2011 International Symposia on Extreme Ultraviolet Lithography and Lithography Extensions
Gigaphoton will present the paper at the “2011 International Symposia on Extreme Ultraviolet Lithography and Lithography Extensions,” to be held on October 17 (Mon.) through October 21 (Fri.), 2011, at JW Marriott Marquis Miami in Miami, Florida, USA.
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2011.7.12　News & Event
Gigaphoton Confirms Its Debris Mitigation Technology Using
Magnetic Fields for EUV Light Sources
Gigaphoton Inc., a major lithography light source manufacturer, today announced that the company has confirmed its original technology for mitigating debris with magnetic fields for laser-produced plasma (LPP) light sources, scheduled to be shipped in the beginning of 2012.
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2011.5.18　News & Event
Gigaphoton Inc., has become a wholly owned subsidirary of Komatsu
Gigaphoton Inc. (Head office: Oyama City, Tochigi Prefecture in Japan. President and CEO: Yuji Watanabe) (website: http://www.gigaphoton.com/) today announces that the company has become a wholly owned subsidiary of Komatsu as the result that Komatsu purchased the remaining 50% shares of Gigaphoton from USHIO Inc.
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2011.4.25　News & Event
Notice of Transfer of a Large Amount of Shares
Gigaphoton Inc. (Head office: Oyama City, Tochigi Prefecture in Japan. President and CEO: Yuji Watanabe) (website: http://www.gigaphoton.com/) today announces that Komatsu Ltd. (President and CEO: Kunio Noji), which currently owns 50% of all shares of Gigaphoton, has reached an agreement with Ushio Inc. (hereinafter “Ushio”) (President and CEO: Shiro Sugata) to purchase the remaining 50% shares from Ushio.
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2011.3.31　Technical Paper
All of the papers presented at the SPIE Advanced Lithography 2011 held on February 27 through March 3, 2011, in San Jose, California, have been posted on the Technical Paper page, and are available for downloading.
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2011.3.25　News & Event
Impact assessment of the Earthquakes and Tsunami in Japan
upon Gigaphoton’s Business (3^rd report)
Gigaphoton, Inc. would like to report an updated status of our current factory operations as of March 23, 2011.
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2011.3.16　News & Event
Impact assessment of the Earthquakes and Tsunami in Japan
upon Gigaphoton' s Business (2^nd report)
We would like to report updated status of our operations.
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2011.3.14　News & Event
Assesment of the Impact of the Earthquakes and Tsunami
upon Gigaphoton’s Business
We would like to express our sincere condolence to the victims of the Earthquakes and those who have been affected and going under hardship.
We do wish a speedy recovery.
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2011.2.28　News & Event
GIGAPHOTON DEMONSTRATES THE HIGHEST EFFICIENCY
IN CREATING EUV LIGHT
Company to Deliver Latest Breakthroughs Designed to Further Enable EUV Lithography
OYAMA, JAPAN — February 28, 2011 — Gigaphoton Inc., a major lithography light source manufacturer, today announced that the company has demonstrated the highest conversion efficiency (CE) in producing extreme ultraviolet (EUV) light from tin plasma – a major milestone leading to a highly efficient and cost effective source. The company also stated its new EUV factory came online a year ago.
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2011.2.28　News & Event
Gigaphoton at SPIE Advanced Lithography 2011
Gigaphoton will present the paper and exhibit at the "SPIE Advanced Lithography 2011", to be held on February 27 (Sun.) through March 3  (Thu.), 2011, at the San Jose McEnery Convention Center and San Jose Marriot (Headquarters Hotel) in San Jose, California, USA (Booth No. 119).
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