GT62A
GIGAPHOTON CELEBRATES 100TH GIGATWIN ARF LIGHT SOURCE MILESTONE INSTALLATION
Latest Achievement Demonstrates Burgeoning Confidence in Gigaphoton for Addressing Leading-edge Lithography Applications Among Chipmakers and Foundries Alike

Gigaphoton announced the installation of its 100th GigaTwin ArF light source platform at a major semiconductor foundry in Taiwan.  This milestone is testament to the success and growing adoption of Gigaphoton’s dual-chamber platform, which also features the company’s injection-locking laser technology.  Gigaphoton’s GT40A was integrated into a state-of-the-art ArF lithography tool for the foundry’s next-generation lithography applications.  Gigaphoton reports that its 100th GigaTwin will be used in the production of 55-nm to 65-nm devices.

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INFORMATION

Under About Us menu, we have posted the “Quality” and “Gino Juku” pages for introducing how we create quality in our products and a unique employee training system that supports our high-quality products, respectively.

 
CUSTOMER SUPPORT

Introduction of Technical Publications
This section introduces the system manuals and maintenance support software that we provide for our customers.
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TECHNOLOGY

We have posted " Spectrum Performance when BCM is Mounted on the Actual Laser Unit " about Gigaphoton’s original "Bandwidth Control Module (BCM)" expected to make a great contribution to stringent CD control required for advanced lithography.

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