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 News & Events
Recent press releases issued by Gigaphoton
and event information in which Gigaphoton will participate.
| Press Releases |
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| JULY 7, 2008 |
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GIGAPHOTON DRIVES SEMICONDUCTOR MANUFACTURING COSTS DOWN WITH NEW TECHNOLOGIES AROUND ITS LEADING “GIGATWIN” ARF LASER PLATFORM
GRYCOS, MPL and TGM Substantially Reduce Running Cost and Downtime
for Company’s GigaTwin Platform Products
Oyama, Japan, July 7, 2008 — Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today unveiled three major technology enhancements to its “GigaTwin” ArF laser platform that significantly reduce costs and downtime—a new recycled chamber operating system, line-narrowing module and gas manager.
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| April 14, 2008 |
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GIGAPHOTON CELEBRATES 100TH GIGATWIN ARF LIGHT SOURCE MILESTONE INSTALLATION
Latest Achievement Demonstrates Burgeoning Confidence in Gigaphoton for Addressing Leading-edge Lithography Applications Among Chipmakers and Foundries Alike
Oyama, Japan, April 14, 2008 — Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced the installation of its 100th GigaTwin ArF light source platform at a major semiconductor foundry in Taiwan. This milestone is testament to the success and growing adoption of Gigaphoton’s dual-chamber platform, which also features the company’s injection-locking laser technology.
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| February 25, 2008 |
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GIGAPHOTON EXPANDS U.S. PRESENCE AND CUSTOMER SUPPORT
EFFORTS WITH THE OPENING OF GIGAPHOTON USA INC.
Local Subsidiary to Bolster Growing Adoption of its Laser Light Sources by Several Major U.S. Manufacturers
Oyama, Japan, February 25, 2008 — Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced its expansion in the U.S. with its subsidiary, Gigaphoton USA Inc., to be located in Beaverton, Oregon. Slated to open this April, Gigaphoton USA Inc. is set to substantially strengthen support for the company’s growing U.S. customer base. This expansion follows on the heels of heightened adoption of Gigaphoton’s laser light sources by several major U.S. device manufacturers, and the impending growth opportunities the U.S. market yields. With 40% share worldwide, Gigaphoton continues to achieve dominance in the laser light source market – gaining momentum year-over-year.
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| February 25, 2008 |
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GIGAPHOTON BEGINS SHIPPING NEW ArF GT62A EXCIMER LASER
Latest Addition to GT Family of ArF Light Sources to Enable
Double-Patterning Immersion Lithography at a Leading Supplier
Oyama, Japan, February 25, 2008 — Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced the inaugural shipment of the GT62A, the newest addition to the company’s argon fluoride (ArF) excimer laser light source portfolio. The first unit was delivered to a leading lithography tool manufacturer to support the introduction of its double-patterning immersion lithography tools, which have dramatically increased in demand.
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| Event Information |
| Semicon Taiwan 2008 |
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Gigaphoton will make a presentation at Semicon Taiwan 2008, which will be held at the Taipei World Trade Center in Taipei, Taiwan, from September 9 through 11 (Tuesday through Thursday). We will demonstrate the unparalleled reliability of our ArF/KrF lasers and introduce our major products, including the latest ArF excimer laser model, the GT62A. Please visit us at booth B-872. |
| Gigaphoton at SPIE Advanced Lithography 2008 |
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Gigaphoton will present the paper and exhibit at the "SPIE Advanced Lithography 2008", to be held on February 24 (Sun.) through February 29 (Fri.), 2008, at the San Jose McEnery Convention Center and San Jose Marriot (Headquarters Hotel) in San Jose, California, USA (Booth No. 115).
| Paper Tuesday 26 February, 4:50 PM – 5:10 PM |
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CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography (Paper Presentation)
Paper 6921-29 of Conference 6921
Authors(s): Akira Endo, Yoshifumi Ueno, Georg Soumagne, Masaki Nakano, Hiroshi Komori, Hideo Hoshino, Takashi Suganuma, Takayuki Yabu, Takeshi Asayama, Krzysztof Nowak, Masato Moriya, Hiroshi Someya, Tamotsu Abe, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan)
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| Paper/Poster Tuesday 28 February, 6:00 PM – 8:00 PM |
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Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography (Poster Presentation)
Paper 6924-198 of Conference 6924
Authors(s): Takahito Kumazaki, Ryoichi Nohdomi, Hiroaki Nakarai, Takashi Matsunaga, Kouji Kakizaki, Junichi Fujimoto, Hakaru Mizoguchi, Gigaphoton Inc. (Japan)
High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography (Poster Presentation)
Paper 6924-199 of Conference 6924
Authors(s): Masaya Yoshino, Hiroaki Nakarai, Takashi Matsunaga, Junichi Fujimoto, Ryoichi Nohdomi, Kouji Kakizaki, Taku Yamazaki, Hakaru Mizoguci, Gigaphoton Inc. (Japan)
Magnetic debris mitigation of a CO2 laser-produced Sn plasma
Paper 6921-113 of Conference 6921
Author(s): Yoshifumi Ueno, Georg Soumagne, Masato Moriya, Takashi Suganuma, Takayuki Yabu, Tamotsu Abe, Hirosh Komori, Akira Endo, Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)
Sn-droplet target development for laser-produced plasma EUV-light source
Paper 6921-114 of Conference 6921
Author(s): Masaki Nakano, Takayuki Yabu, Hiroshi Someya, Tamotsu Abe, Georg Soumagne, Akira Endo, Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)
LPP EUV-light source employing high-power CO2 laser
Paper 6921-115 of Conference 6921
Author(s): Hideo Hoshino, Takashi Suganuma, Tamotsu Abe, Takeshi Asayama, Krzysztof Nowak, Masato Moriya, Akira Endo, Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)
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Note to editors: Gigaphoton will be also exhibiting at SPIE Advanced Lithography 2008. For more information about Gigaphoton and the Company's technology and product offerings, please visit us in Booth #115. |
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