Recent press releases issued by Gigaphoton and event information in which Gigaphoton will participate.

Press Releases

December 1, 2004

Gigaphoton Introduces Its New "GT40A" Laser
First Injection-locking ArF Excimer Laser in the Industry

SEMICON JAPAN, Chiba, Japan—December 1, 2004 — Gigaphoton Inc. (Headquarters: Oyama-shi, Tochigi-ken, Japan; President and Representative Director: Dr. Yuji Watanabe, http://www.gigaphoton.com/), a major lithography light source manufacture for the global semiconductor industry, today announced that it has developed the "GT40A," an ArF (Argon Fluoride) excimer laser with emission wavelength of 193 nm and repetition rate of 4000 Hz.
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December 1, 2004

Gigaphoton Introduces Its New "G41K+" Laser
Upgraded Version of G40K Series of KrF Excimer Lasers
Greatly Enhanced Emission Efficiency

SEMICON JAPAN, Chiba, Japan—December 1, 2004 — Gigaphoton Inc. (Headquarters: Oyama-shi, Tochigi-ken, Japan; President and Representative Director: Dr. Yuji Watanabe, http://www.gigaphoton.com/), a major lithography light source manufacture for the world semiconductor industry, today announced that the company has developed and started marketing a new product: the "G41K+" model of its G41K series of KrF (Krypton Fluoride) excimer lasers.
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November 29, 2004

Gigaphoton Announces Complete Website Renewal
Reborn as a Powerful Tool to Enhance Communication with Users

Oyama-shi, Tochigi-ken, Japan—November 29, 2004 — Gigaphoton Inc. (Headquarters: Oyama-shi, Tochigi-ken, Japan; President and Representative Director: Dr. Yuji Watanabe, http://www.gigaphoton.com/), a major lithography light source manufacturer for the global semiconductor industry, today announced the total renewal of its website.
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Event Information

Semicon Japan 2004

Gigaphoton will make a presentation at Semicon Japan 2004, to be held in Nihon Convention Center (Makuhari Messe) from December 1 through 3, and will introduce the new ArF excimer laser model GT40A and a new KrF laser model G41K+ based on our field-proven G41K series. Please visit booth 6A-915.

Gigaphoton Seminar:

We will hold a private seminar on “Challenges in High-end Lithography & Solutions from the Light Source” along with our exhibit at Semicon Japan. Leading engineers from the world’s major semiconductor device manufacturers will make a presentation on the leading edge of lithography technologies, and we will introduce our newly developed ArF excimer laser model GT40A as well as the development roadmap of spectrum E95 technology.

 

When:	10:00 – 12:00, December 3 (Fri.), 2004 (followed by a luncheon party)
Where:	“Prince Hall 2F” at Makuhari Prince Hotel
Seminar:	“Challenges in High-end Lithography & Solutions from the Light Source”

 

Agenda (simultaneous interpretation will be provided)
10:00 - 10:10	“Opening Remarks” by Dr. Yuji Watanabe, Representative Director and President, Gigaphoton Inc.
10:10 - 10:30	“Low-k1, Resolution Improvement” by Guest Speaker.
10:30 - 10:50	“Challenges in Lithography and Requests to Light Sources” by Guest Speaker.
10:50 - 11:10	“E95 Impact & Improvement for CD Uniformity” by Dr. Tatsuo Enami, Manager, Technical Support Group, Sales Division I, Gigaphoton Inc.
11:20 - 12:00	“High-throughput ArF Excimer Laser GT40A” by Dr. Hakaru Mizoguchi, Director, Gigaphoton Inc.
12:00 -	Luncheon Party

Seminar Contact
Akinori Matsui, Sales Division I, Sales Division, Gigaphoton Inc.
TEL: 0285-28-8415 FAX: 0285-28-8439