

GIGAPHOTON BEGINS SHIPMENT OF
6-KHZ INJECTION-LOCKING ArF EXCIMER LASER, THE GT60A
OYAMA, Japan, December 7, 2005 - Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, announced today that it has begun shipment of its new argon fluoride (ArF) excimer laser, which is designed for lithography applications at 45 nm or below design rules. The GT60A (emission wavelength: 193 nm, repetition rate: 6,000 Hz) will be tested and qualified for integration at major lithography tool manufacturers immediately, and subsequently used in volume production at major global semiconductor manufacturers beginning mid-2006.
In today’s advanced lithography process, with LSI circuit patterns becoming increasingly finer, ArF lithography has become mainstream, while immersion ArF lithography has emerged as the most promising next-generation technology. A high level of throughput and stable spectrum performance are essential for an ArF laser to be used as a light source for immersion ArF lithography. To meet the required lithography roadmap, Gigaphoton launched the GT40A (repetition rate: 4,000 Hz, output: 45 W) this past spring. The GT40A was the industry’s first 4-kHz ArF excimer laser mounted with an injection-locking resonator, and is being used as a mass-production lithography light source for 65-nm and below technology nodes. The GT60A is the latest-generation model, featuring the same injection-locking platform as that used by the GT40A. Marking less than one year since the company began mass-production and shipment of the GT40A, Gigaphoton has now successfully developed the GT60A, delivering an improved repetition rate 1.5-times that of the GT40A.
The GT40A has already been accepted by major users in the global semiconductor industry, and its design concept and reliability are highly acclaimed in the industry. The GT60A is based on the same platform to maximize standardization as well as enable the use of common components, thereby ensuring users to achieve high reliability right from the onset.
Main Features of the GT60A:
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Gigaphoton will have key executives available to discuss the new GT60A during SEMICON Japan, which starts today and runs through Friday, December 9, 2005, at Makuhari Messe, Chiba. Editors are invited to visit Gigaphoton’s booth 6A-910.
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About Gigaphoton
Gigaphoton Inc. was founded in 2000 as a joint venture of Komatsu Ltd., the world’s No. 2 construction machinery manufacturer, and Ushio Inc., the world’s No. 1 lithography lamp manufacturer. Since then, Gigaphoton has been developing and marketing user-friendly, highly innovative laser light sources that make a great contribution to lithography technology so as to meet the stringent requirements of the ultra-fine circuit patterns of the gigabit era, and delivering them to major lithography tool suppliers in the global semiconductor industry. In the area of advanced KrF excimer light sources, Gigaphoton dominates the worldwide market. As a leading global manufacturer of excimer laser light sources, Gigaphoton is also expanding its presence in the U.S. and European markets. More information about Gigaphoton can be found on the company’s website at: www.gigaphoton.com
The company name and logo are the trademarks of Gigaphoton, Inc. The content of this release may be revised without prior notice. Gigaphoton shall not be liable for updating or announcing a correction if the content of this release is changed for any reason in the future.
© 2005 Gigaphoton