Recent press releases issued by Gigaphoton and event information in which Gigaphoton will participate.

Press Releases

December 6, 2006

GIGAPHOTON UNLEASHES NEW ArF EXCIMER LASER, THE GT61A
Latest Addition to the GT Series of ArF Light Sources Delivers Enhanced Performance and Significantly Reduced Downtime and Maintenance Costs

OYAMA, Japan, December 6, 2006 — Kicking off SEMICON Japan 2006, Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, unveiled the newest addition to its argon fluoride (ArF) excimer laser light source portfolio, the GT61A. With an emission wavelength of 193 nm and a repetition rate: 6,000 Hz, the GT61A is designed for next-generation lithography tools with numerical apertures of 1.3 and higher. Having successfully completed testing and qualification, the GT61A has already begun shipment.
More

Photos available for downloading:
  GT61A Photo1 (Jpeg, 728KB)
  GT61A Photo2 (Jpeg, 638KB)

July 26, 2006

GIGAPHOTON ANNOUNCES JOINT SERVICE AGREEMENT WITH ASML IN U.S.A.
Major step to enhance customer support capability in support of lasers

OYAMA, JAPAN, July 26, 2006 — igaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced that it has signed a contract with ASML to provide seamless Customer Support for US chipmakers. Gigaphoton provides light source lasers, which are a critical subsystem used within the lithography tools manufactured by ASML.
More

 

Event Information

Semicon Japan 2006

Gigaphoton will make a presentation at Semicon Japan 2006, to be held in Makuhari Messe (Nihon Convention Center) from December 6 through 8, and will introduce our major products and services. Please visit booth 5C-723.

Gigaphoton Seminar

We will hold a private seminar on “Challenges in High-End Lithography and Solutions from the Light Source” along with our exhibit at Semicon Japan 2006. Leading engineer from the world's major semiconductor device manufacturer will make a presentation on the leading edge of lithography technologies as well as the Gigaphoton’s solutions in technologies and products.

When:	15:00 - 17:00, December 8 (Thu.), 2006 (followed by a dinner party)
Where:	“Makuhari Hall”, Tokyo Bay Makuhari
Seminar:	“Challenges in High-End Lithography and Solutions from the Light Source”

Agenda (simultaneous interpretation will be provided)
15:00-15:20	“Opening Remarks” by Dr. Yuji Watanabe, Representative Director and President, Gigaphoton Inc.
15:20-15:50	“View Towards 32-nm Lithography” by Dr. SHIN JAN GHO, Senior Engineer, Memory Division Fab Process Development Team, Semiconductor Business, Samsung Electronics Co., Ltd.
15:50-16:15	“Latest ArF Laser Technology and Product Roadmap” by Dr. Hakaru Mizoguchi, Director, Gigaphoton Inc.
16:15-16:40	“Present Status of EUV Light Sources” by Akira Sumitani, Head of EUVA Light Source Laboratory
16:40-16:55	“Laser Downtime Reduction For More Fab Output” by Kenji Takahisa, Marketing Division, Gigaphoton Inc.
17:00 -	Dinner Party

Seminar Contact
Yutatsu Matsui, Sales Division, Gigaphoton Inc.,
TEL: +81-285-28-8415, FAX: +81-285-28-8439

Semicon Taiwan 2006

Gigaphoton will make a presentation at Semicon Taiwan 2006, which will be held at the Taipei World Trade Center in Taipei, Taiwan, from September 11 through 13 (Monday through Wednesday). We will demonstrate the unparalleled reliability of our ArF/KrF lasers and introduce our major products, including the latest ArF excimer laser model, the GT60A. Please visit us at booth 1072.