GIGAPHOTON UNVEILS NEW ArF EXCIMER LASER, THE GT62A

Latest Addition to GT Family of ArF Light Sources Delivers World's Highest Output of 90 Watts
and Offers Significantly Reduced Downtime and Maintenance Costs

OYAMA, Japan, December 3, 2007 - Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, has unveiled the newest addition to its argon fluoride (ArF) excimer laser light source portfolio, the GT62A.  With an emission wavelength of 193 nm, output of 90 W and repetition rate of 6,000 Hz, the GT62A is designed for double-patterning immersion lithography tools.  Having successfully completed testing, Gigaphoton expects the GT62A to be integrated into immersion lithography tools for production at major global semiconductor manufacturers beginning mid-2008.

In today’s advanced lithography processes, immersion lithography technology is ready to begin volume production at the 45-nm technology node.  Beyond that, double- patterning immersion lithography is considered to be the most promising technology to meet the requirements associated with the next-generation 32-nm technology node.  A double-patterning immersion lithography tool requires high throughput and high uptime to enhance economic efficiency, as well as offer high resolution capabilities.  This places strict demands on its light source as well—requiring that the laser delivers higher output and uptime at a lower operating cost.

In anticipation of these lithography roadmap requirements, Gigaphoton began volume production and shipment of the ArF excimer laser model “GT60A” (repetition rate: 6,000 Hz, output: 60 W) for immersion lithography tools at the end of 2005.  The company then unveiled the GT61A, which offered improved spectral bandwidth of 0.35 pm (E95%) and unprecedented stabilizing technology—a first for the industry.

The latest in the GT series, the GT62A is a fourth-generation model featuring the same injection-locking platform—delivering the world’s highest output of 90 watts to support double-patterning immersion lithography*.  In addition, the GT62A features an improved laser chamber and consumables life, such as optics.  Moreover, the tool’s technology allows for minimal down time—enabling the most advanced processing with less economical risk.

* Based on independent research by Gigaphoton Inc.

The GT series already has been accepted by major users in the global semiconductor industry, and its design and reliability have received wide acclamation. The GT62A is based on this same platform, which maximizes standardization as well as enables the use of common components—allowing users to benefit from its high reliability advantages right from the start.

Key Features of the GT62A:
1. High Output and High Reliability
The GT62A features a newly developed power supply, which allows high output of 90 watts (a 50% improvement compared to the GT61A).  The light source is also mounted with a technology to take measures against the heat load, which increases as the output increases.  It also has new highly durable optics to ensure extremely reliable performance even during high-output operation.  The GT62A also comes standard with Gigaphoton’s original "Bandwidth Control Module (BCM)” technology to provide a stabilized spectrum.

In order to meet a variety of customer needs, a 60-W version of the GT62A is also available. This version allows a customer to operate at the 60-W mode at less cost and to upgrade to 90 watts when ready to scale, enabling flexibility and maximizing the return on investment.

2.  Cost Savings
Gigaphoton is committed to ensuring that its lasers deliver high uptime over a long period of time in order to enhance customer fab productivity.  The GT62A is mounted with technologies that allow the reduction of downtime caused by gas refill to one tenth of that compared to other former GT series models, and enables longer laser chamber and optics life—ultimately reducing maintenance downtime and costs.

Major Specifications
Wavelength	193 nm
Max. Repetition Rate	6,000 Hz
Pulse Energy	10.0/15.0 mJ
Power	60/90 W
Bandwidth (95% Energy Integral)	< 0.35 pm
Module Replacement Intervals
Laser Chamber (Oscillator)	20 billion pulses
Laser Chamber (Amplifier)	30 billion pulses
Monitor Module	30 billion pulses
PO Front Mirror	12 billion pulses
PO Rear Mirror	12 billion pulses
F2Trap Module	200 cycles

Gigaphoton will have key executives available to discuss the new GT62A during SEMICON Japan 2007, which will start on Wednesday, December 5 and run through Friday, December 7, 2007, at Makuhari Messe, Chiba, Japan.  Editors/journalists are encouraged to visit the Gigaphoton booth, #4D-719, to learn more about the GT62A or the company.

About Gigaphoton
Gigaphoton Inc. was founded in 2000 as a joint venture of Komatsu Ltd., the world’s No. 2 construction machinery manufacturer, and Ushio Inc., the world’s No. 1 lithography lamp manufacturer. Since then, Gigaphoton has been developing and marketing user-friendly, highly innovative laser light sources that make a great contribution to lithography technology so as to meet the stringent requirements of the ultra-fine circuit patterns of the gigabit era, and delivering them to major lithography tool suppliers in the global semiconductor industry. As the No. 2 excimer laser light source manufacturer in the world, Gigaphoton has already grown to dominate the Asian market, including Japan, having the largest number of installed bases in the region of any major semiconductor device manufacturer. Gigaphoton also continues to enjoy rapid growth in the U.S. and European markets. More information about Gigaphoton can be found on the company’s website at: www.gigaphoton.com.

The company name, logo, and GT40A, GT60A, GT61A, and GT62A are trademarks of Gigaphoton, Inc. The content of this release may be revised without prior notice. Gigaphoton shall not be liable for updating or announcing a correction if the content of this release is changed for any reason in the future. ©2007 Gigaphoton

 

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