Recent press releases issued by Gigaphoton and event information in which Gigaphoton will participate.
August 1, 2010
Celebrating Our 10th Anniversary as Part of the Evolution of Photolithography
We at Gigaphoton are pleased to announce that we are celebrating the 10-year anniversary of our founding (on August 1, 2000).
April 26, 2010
EUV LITHOGRAPHY LIGHT SOURCE ACHIEVES INDUSTRY-RECORD
100+ WATT OUTPUT
Significant Industry Milestone Signals a Major Step Forward in the Volume Production of EUV Light Sources that Offer Higher Output and Stability at a Lower Cost of Ownership
Oyama, Japan, APRIL 26, 2010 —Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced that an extreme ultraviolet (EUV) light source developed by the technology consortium Extreme Ultraviolet Lithography System Development Association has achieved the world’s highest output—104 Watts. Today’s milestone marks an industry first and signals a significant step forward in the realization of the first volume-production-worthy EUV light source shipment targeted for 2011. The achievement was made under the Laser Produced Plasma (LPP) Light Source Development Program for EUV Lithography, which is promoted by EUVA. As an EUVA member company, Gigaphoton has been working on the development of LPP light sources for EUV lithography since 2002.
March 23, 2010
All of the papers presented at the SPIE Advanced Lithography 2010 held on February 21 through February 25, 2010, in San Jose, Californiaon have been posted on the Technical Paper page, and are available for downloading.
It is our great pleasure to invite you to attend the private seminar, which will be presented by Gigaphoton.
The seminar is titled “Challenges in high-end lithography & Solutions from the light source”, in which there will be technical presentations on leading-edge lithography by top engineers of device makers. You will also find a presentation by Gigaphoton, offering technical solutions in EUV light source technology and our products. The presentations will be given in either English or Japanese with simultaneous translation to Japanese/English respectively.
After the seminar you are invited to dinner to meet Gigaphoton management.
Please inform our sales force or send e-mail (see bottom) for registration.
|Seminar:||"Challenges in high-end lithography & Solutions from the light source"|
|Date:||December 3rd, 2010 Time: 3:00 pm - 5:15 pm|
|Place:||Apa Hotel & Resort, Tokyo Bay Makuhari, Makuhari Hall|
|15:00-15:15||Greetings||Dr. Yuji Watanabe
|15:15-15:45||EUV lithography: Status and further challenges towards a maturing technology||Dr. Geert Vandenberghe
Advanced Lithography Program
|15:45-16:15||Current status of lithography for logic devices and expectations for light source||Mr. Takayuki Uchiyama
Lithography & etching Engineering Dept.
Process Technology Division
Renesas Electronics Co., Ltd.
|16:15-16:45||Current status of EUV process technology||Mr. Oh, Seokhwan
NR-D Project, Memory Division
Samsung Electronics Co., Ltd.
|16:45-17:15||Gigaphoton: Current status of LPP EUV light source development and product roadmap
||Dr. Hakaru Mizoguchi
Chief Technology Officer
Sales Division: Ryotaro Tanaka
TEL: +81-285-28-8415, FAX: +81-285-28-8439