Recent press releases issued by Gigaphoton and event information in which Gigaphoton will participate.

Press Releases

December 5, 2011

Gigaphoton Ships 1,000th Excimer Laser for Photolithography

OYAMA, JAPAN; December 5, 2011 — Gigaphoton Inc., a major lithography light source manufacturer, announced today that the company has shipped its 1,000th excimer laser for semiconductor photolithography.
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JULY 12, 2011

Gigaphoton Confirms Its Debris Mitigation Technology Using
Magnetic Fields for EUV Light Sources

Gigaphoton Inc., a major lithography light source manufacturer, today announced that the company has confirmed its original technology for mitigating debris with magnetic fields for laser-produced plasma (LPP) light sources, scheduled to be shipped in the beginning of 2012.
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MAY 15, 2011

Gigaphoton Inc., has become a wholly owned subsidirary of Komatsu

Gigaphoton Inc. (Head office: Oyama City, Tochigi Prefecture in Japan. President and CEO: Yuji Watanabe) (website: http://www.gigaphoton.com/) today announces that the company has become a wholly owned subsidiary of Komatsu as the result that Komatsu purchased the remaining 50% shares of Gigaphoton from USHIO Inc.
Go To Komatsu Web Site

APRIL 25, 2011

Notice of Transfer of a Large Amount of Shares

Gigaphoton Inc. (Head office: Oyama City, Tochigi Prefecture in Japan. President and CEO: Yuji Watanabe) (website: http://www.gigaphoton.com/) today announces that Komatsu Ltd. (President and CEO: Kunio Noji), which currently owns 50% of all shares of Gigaphoton, has reached an agreement with Ushio Inc. (hereinafter “Ushio”) (President and CEO: Shiro Sugata) to purchase the remaining 50% shares from Ushio.
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March 25, 2011

Impact assessment of the Earthquakes and Tsunami in Japan
upon Gigaphoton’s Business (3^rd report)

Gigaphoton, Inc. would like to report an updated status of our current factory operations as of March 23, 2011.
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March 16, 2011

Impact assessment of the Earthquakes and Tsunami in Japan
upon Gigaphoton’s Business (2^nd report)

We would like to report updated status of our operations.
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February 28, 2011

GIGAPHOTON DEMONSTRATES THE HIGHEST EFFICIENCY IN CREATING EUV LIGHT
Company to Deliver Latest Breakthroughs Designed to Further Enable EUV Lithography

OYAMA, JAPAN — February 28, 2011 — Gigaphoton Inc., a major lithography light source manufacturer, today announced that the company has demonstrated the highest conversion efficiency (CE) in producing extreme ultraviolet (EUV) light from tin plasma – a major milestone leading to a highly efficient and cost effective source. The company also stated its new EUV factory came online a year ago. Gigaphoton’s first commercial system has been built, is in integration testing and will ship later this year.
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Event Information

Gigaphoton Seminar

We will hold a private seminar on "Challenges in High-End Lithography and Solutions from the Light Source" at SEMICON Japan 2011. Leading engineer from the world's major semiconductor device manufacturer will make a presentation on the leading edge of lithography technologies as well as the Gigaphoton's solutions in technologies and products. 

When:	15:00 - 17:15, December 9 (Fri.), 2011 (followed by a dinner party)
Where:	“Makuhari Hall”, Tokyo Bay Makuhari
Seminar:	“Challenges in High-End Lithography and Solutions from the Light Source”

Agenda (simultaneous interpretation will be provided)
15:00-15:15	“Opening Remarks” by Dr. Yuji Watanabe, President and CEO, Gigaphoton Inc.
15:15-15:45	Updates of Lithography Technologies Dr. Tatsuhiko Higashiki Senior Manager Advanced Lithography Process Technology Dpt. Device Process Development Center Corporate Research & Development Center Toshiba Corporation
15:45-16:15	Current Status for NXE EUV Scanners and Expectation to Source Suppliers Mr. Kenji Morisaki Director, Technical Marketing ASML Japan Co., Ltd.
16:15-16:45	EUV Lithography Development Status Mr. YoonSuk Hyun Senior Engineer, Research & Development Division DRAM Process AP Team HYNIX Semiconductor Inc.
16:45-17:15	Gigaphoton: Update and Roadmap of LPP EUV Light Source Development Dr. Akira Sumitani Deputy General Manager, Business Promotion Division Gigaphoton Inc.
17:15 -	Dinner Party

Seminar Contact
Masahiko Hasegawa, Sales Division, Gigaphoton Inc.
TEL: +81-285-28-8415, FAX: +81-285-28-8439
E-mail:masahiko_hasegawa@gigaphoton.com

 

Gigaphoton at the 2011 International Symposia on Extreme Ultraviolet Lithography and Lithography Extensions

Gigaphoton will present the paper at the “2011 International Symposia on Extreme Ultraviolet Lithography and Lithography Extensions,” to be held on October 17 (Mon.) through October 21 (Fri.), 2011, at JW Marriott Marquis Miami in Miami, Florida, USA.

■Oral Presentation, October 17 (Mon), 11:45 - 12:05

Development of LPP-EUV Source for HVM EUVL
Author(s): Junichi Fujimoto, Hiroaki Nakarai, Tsukasa Hori, Satoshi Tanaka, Yukio Watanabe, Yasufumi Kawasuji, Takeshi Ohta, Tamotsu Abe, Hakaru Mizoguchi
Gigaphoton Inc., Komatsu Ltd.

■Poster Presentation, October 17 (Mon), 17:40 – 19:40; October 18 (Tue), 14:30– 16:00

Investigation on high conversion efficiency and Tin debris mitigation for laser produced plasma EUV light source
Author(s): Toru Suzuki, Tsukasa Hori, Tatsuya Yanagida, Takayuki Yabu, Hitoshi Nagano, Yasunori Wada, Soumagne Georg, Junichi Fujimoto, Hakaru Mizoguchi
Komatsu Ltd., Gigaphoton Inc.

■Poster Presentation, October 17 (Mon), 17:40 – 19:40; October 18 (Tue), 14:30– 16:00

Efficient EUV Emission by Double-pulse Irradiation on Tin Droplet
Author(s): Atsushi Sunahara, Katsunobu Ninishihara, Richard More, Akira Sasaki, and Tsukasa Hori, Junichi Fujimoto, Hakaru Mizoguchi
Institute for Laser Technology, Japan, Institute of Laser Engineering, Osaka Univ., Lawrence Berkley National Lab, USA,
JAEA Kansai Advanced Photon Research Institute, Japan, Komatsu Ltd., Gigaphoton Inc.

■Oral Presentation, October 20 (Thu), 14:25-14:50

Performance of Bandwidth Tuning Laser for Focus Drilling
Author(s): Takahito Kumazaki, S. Tanaka, H. Tanaka, Y. Watabe, S. Matsumoto, T. Matsunaga, J. Fujimoto
Gigaphoton Inc.

Gigaphoton at SPIE Advanced Lithography 2011

Gigaphoton will present the paper and exhibit at the "SPIE Advanced Lithography 2011", to be held on February 27 (Sun.) through March 3 (Thu.), 2011, at the San Jose McEnery Convention Center and San Jose Marriot (Headquarters Hotel) in San Jose, California, USA (Booth No. 119).

■Oral Presentation, Tuesday 1 March, 8:00 AM

100W 1st generation laser-produced plasma source system for HVM EUV lithography 
Paper 7969-7

Time: 8:00 AM - 8:20 AM
Author(s): Hakaru Mizoguchi, EUVA (Japan) and Komatsu Ltd. (Japan); Tamotsu Abe, Yukio Watanabe, EUVA (Japan); Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Akihiko Kurosu, Hiroshi Komori, Kouji Kakizaki, Akira Sumitani, Komatsu Ltd. (Japan); Osamu Wakabayashi, Hiroaki Nakarai, Junichi Fujimoto, Akira Endo, EUVA (Japan)

■ Paper Presentation, Wednesday 2 March, 6:00 PM

Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser-produced plasma EUV light source
Paper 7969-100
Author(s): Tatsuya Yanagida, Komatsu Ltd. (Japan) and EUVA (Japan); Hitoshi Nagano, Komatsu Ltd. (Japan); Takayuki Yabu, Shinji Nagai, Georg Soumagne, Tsukasa Hori, Komatsu Ltd. (Japan) and EUVA (Japan); Kouji Kakizaki, Komatsu Ltd. (Japan); Akira Sumitani, Komatsu Ltd. (Japan) and EUVA (Japan); Junichi Fujimoto, Hakaru Mizoguchi, Gigaphoton Inc. (Japan); Akira Endo, Forschungszentrum Dresden-Rossendorf e.V. (Germany)

 

Development of the reliable 20-kW class pulsed carbon dioxide laser system for LPP EUV light source
Paper 7969-99
Author(s): Junichi Fujimoto, Takeshi Ohta, Krzysztof M. Nowak, Takashi Suganuma, Hidenobu Kameda, Toshio Yokoduka, Koji Fujitaka, Masato Moriya, Gigaphoton Inc. (Japan); Akira Sumitani, EUVA/Komatsu Ltd. (Japan); Hakaru Mizoguchi, Gigaphoton Inc. (Japan); Akira Endo, Forschungszentrum Dresden-Rossendorf e.V. (Germany)

■ Oral Presentatio, Thursday 3 March, 5:10 PM

Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography
Paper 7973-55
Time: 5:10 PM - 5:30 PM
Author(s): Hiroshi Umeda, Gigaphoton Inc. (Japan)

Note to editors: Gigaphoton will be also exhibiting at SPIE Advanced Lithography 2011. For more information about Gigaphoton and the Company's technology and product offerings, please visit us in Booth #119.