Recent press releases issued by Gigaphoton and event information in which Gigaphoton will participate.

Press Releases

April 26, 2010

EUV LITHOGRAPHY LIGHT SOURCE ACHIEVES INDUSTRY-RECORD
100+ WATT OUTPUT
Significant Industry Milestone Signals a Major Step Forward in the Volume Production of EUV Light Sources that Offer Higher Output and Stability at a Lower Cost of Ownership

Oyama, Japan, APRIL 26, 2010 —Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced that an extreme ultraviolet (EUV) light source developed by the technology consortium Extreme Ultraviolet Lithography System Development Association has achieved the world’s highest output—104 Watts. Today’s milestone marks an industry first and signals a significant step forward in the realization of the first volume-production-worthy EUV light source shipment targeted for 2011.  The achievement was made under the Laser Produced Plasma (LPP) Light Source Development Program for EUV Lithography, which is promoted by EUVA.  As an EUVA member company, Gigaphoton has been working on the development of LPP light sources for EUV lithography since 2002.
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