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April 27, 2005
GIGAPHOTON ANNOUNCES VOLUME PRODUCTION
AND SHIPMENT
OF NEW LASER MODEL “GT40A”
Industry’s First Injection-locking ArF Excimer Laser
OYAMA, Japan, April 27, 2005—Gigaphoton Inc., a major lithography
light source manufacturer for the global semiconductor industry,
today announced that it has begun volume production and shipment
of a new argon fluoride (ArF) excimer laser model, the “GT40A” (emission
wavelength: 193 nm; repetition rate: 4,000 Hz). This new model
has already been tested and qualified for integration with lithography
tools at ASML Holding NV (ASML) in the Netherlands, and will be
mounted on ASML lithography systems that are scheduled for delivery
to major global semiconductor manufacturers in mid-2005.
In today’s advanced lithography process, with LSI circuit
patterns becoming increasingly finer, ArF lithography has reached
mainstream, while immersion lithography has become the most promising
next-generation technology. A high level of throughput and stable
spectrum performance are essential for an ArF laser to be used
as a light source for immersion ArF lithography.
To meet such stringent requirements, Gigaphoton developed the “GT40A,” the
industry’s first 4-kHz ArF excimer laser mounted with an
injection-locking resonator for use as a mass-production lithography
light source for 65-nm and below technology nodes. Based on tests
performed at Gigaphoton’s headquarters in Japan and at a
major lithography tool manufacturer, the GT40A has demonstrated
stabilized high performance, low-running costs, and unprecedented
reliability and uptime—all of which are sufficient to meet
the requirements associated with mass-production lithography processes.
Gigaphoton has been supplying krypton fluoride (KrF) and ArF excimer
laser light sources for lithography tools to ASML and other leading
major lithography tool manufacturers since 2000. During that time,
ASML and Gigaphoton have established a successful collaboration
in development and product support, and both companies are confident
that the introduction and operation of the GT40A will proceed smoothly.
Gigaphoton is also committed to meeting the continuous improvement
targets of ASML’s supply chain management strategy, called
Value Sourcing. This strategy challenges suppliers to meet the
highest levels of performance in the areas of quality, logistics,
technology and cost (QLTC). Gigaphoton recently achieved the highest
supplier rating level for its QLTC performance. “I’m
very pleased that Gigaphoton and its employees achieved the “A” status,” commented
Henk Scheepers, Senior Vice President, Supply Chain Management,
at ASML. “We are confident that Gigaphoton will continue
to provide us with quality support while maintaining its high QLTC
standard.”
Main Features of the GT40A:
- An injection-locking laser
The GT40A is the industry’s first mass-production model
to use injection-locking technology*. This ensures highly stable
emission of a DUV beam with high output of 45 W and a spectral
bandwidth of 0.2 picometer (pm) for full-width half maximum (FWHM)
and 0.5 pm for E95 — the highest bandwidth level in the
industry.
* Injection-locking technology injects a low-output laser beam
(master)—which is emitted after being tuned to an extremely
narrow spectral bandwidth—into a laser resonator (amplifier)
that amplifies it with laser resonation. This technology allows
simultaneous maintenance of a narrower spectral bandwidth and
higher output, a combination that is difficult to achieve with
conventional technologies.
- The industry’s lowest running cost
The injection-locking technology allows greater reduction of
the load upon the laser optics. Furthermore, the system configuration
has been refined to significantly reduce both the number of
consumables (modules) and replacement frequency. As a result,
the GT40A can achieve the lowest running cost in the industry.
- A highly reliable/operable design
The high reliability and high uptime essential to semiconductor
fabs are achieved by introducing a newly developed self-diagnosis
function, which significantly improves the ease of module replacement
and serviceability.
| Major
Specifications |
| Wavelength |
193 nm |
| Max. Repetition Rate |
4,000 Hz |
| Pulse Energy |
11.25 mJ |
| Power |
45 W |
| Bandwidth (FWHM) |
< 0.2 pm |
Bandwidth
(95% Energy
Integral) |
< 0.5 pm |
| Energy Stability |
< ±0.3 % |
|
| Module
Replacement Intervals |
| MO Chamber |
13 billion
pulses |
| PO Chamber |
19 billion pulses |
| PO Front Module |
12 billion pulses |
| PO Rear Module |
12 billion pulses |
| Monitor Module |
30 billion pulses |
| F2 Trap Module |
120 cycles |
|
###
About Gigaphoton
Gigaphoton Inc. was founded in 2000 as a joint venture of Komatsu
Ltd., the world’s No. 2 construction machinery manufacturer,
and Ushio Inc., the world’s No. 1 lithography lamp manufacturer.
Since then, Gigaphoton has been developing and marketing user-friendly,
highly innovative laser light sources that make a great contribution
to lithography technology so as to meet the stringent requirements
of the ultra-fine circuit patterns required for the Gigabit era,
and delivering them to major lithography tool suppliers in the
global semiconductor industry. Gigaphoton has already grown to
dominate the Asian market including Japan, with a large number
of installed bases of most of the major semiconductor device manufacturers
in this region. Already the No. 2 excimer laser light source manufacturer
in the world, Gigaphoton continues to enjoy rapid growth in the
U.S. and European markets. More information about Gigaphoton can
be found on the company’s website at: www.gigaphoton.com
The company name and logo are the trademarks of Gigaphoton, Inc.
The content of this release may be changed without prior notice.
Gigaphoton shall not be liable for updating or announcing a correction
if the content of this release is changed for any reason in the
future.

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