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GIGAPHOTON BEGINS SHIPMENT OF 6-KHZ
INJECTION-LOCKING
ArF EXCIMER LASER, THE GT60A
OYAMA, Japan, December 7, 2005 - Gigaphoton
Inc., a major lithography light source manufacturer for the global
semiconductor industry, announced today that it has begun shipment
of its new argon fluoride (ArF) excimer laser, which is designed
for lithography applications at 45 nm or below design rules. The
GT60A (emission wavelength: 193 nm, repetition rate: 6,000 Hz)
will be tested and qualified for integration at major lithography
tool manufacturers immediately, and subsequently used in volume
production at major global semiconductor manufacturers beginning
mid-2006.
In today’s advanced lithography process, with LSI circuit
patterns becoming increasingly finer, ArF lithography has become
mainstream, while immersion ArF lithography has emerged as the
most promising next-generation technology. A high level of throughput
and stable spectrum performance are essential for an ArF laser
to be used as a light source for immersion ArF lithography. To
meet the required lithography roadmap, Gigaphoton launched the
GT40A (repetition rate: 4,000 Hz, output: 45 W) this past spring.
The GT40A was the industry’s first 4-kHz ArF excimer laser
mounted with an injection-locking resonator, and is being used
as a mass-production lithography light source for 65-nm and below
technology nodes. The GT60A is the latest-generation model, featuring
the same injection-locking platform as that used by the GT40A.
Marking less than one year since the company began mass-production
and shipment of the GT40A, Gigaphoton has now successfully developed
the GT60A, delivering an improved repetition rate 1.5-times that
of the GT40A.
The GT40A has already been accepted by major users in the global
semiconductor industry, and its design concept and reliability
are highly acclaimed in the industry. The GT60A is based on the
same platform to maximize standardization as well as enable the
use of common components, thereby ensuring users to achieve high
reliability right from the onset.
Main Features of the GT60A:
- High Output and High Repetition Rate
Improving on the GT40A, which achieved a repetition rate of 4,000
Hz, the GT60A reaches a repetition rate of 6,000 Hz on the same
platform through greatly enhanced efficiency. This improvement
enables an output level of that is more than 33% higher than
the GT40A, while limiting the energy per pulse. While the GT60A
features output and repetition frequency enhancements, the laser’s
spectral performance supports the resolution of lithography tools
at the same level as the GT40A.
- High Reliability and High Stability
The GT60A leverages the same platform as that of the GT40A—maximizing
standardization as well as enabling the use of common components
for ensuring high reliability. In addition to its advanced self-diagnostic
function, the GT60A features a variety of functions to enhance
system availability. One of the major advantages of the GT series
is the ease of module replacement and serviceability, which ensures
the high reliability and high uptime essential in today’s
semiconductor fabs.
| Major
Specifications |
| Wavelength |
193 nm |
| Max. Repetition Rate |
6,000 Hz |
| Pulse Energy |
10.0 mJ |
| Power |
60 W |
| Bandwidth (FWHM) |
< 0.2 pm |
Bandwidth
(95% Energy
Integral) |
< 0.5 pm |
|
| Module
Replacement Intervals |
| Laser Chamber (Oscillator) |
13 billion
pulses |
| Laser Chamber (Amplifier) |
19 billion pulses |
| Monitor Module |
30 billion pulses |
| PO Front Mirror |
12 billion pulses |
| PO Rear Mirror |
12 billion pulses |
| F2 Trap Module |
200 cycles |
|
Gigaphoton will have key executives available to discuss the new GT60A
during SEMICON Japan, which starts today and runs through Friday, December
9, 2005, at Makuhari Messe, Chiba. Editors are invited to visit Gigaphoton’s
booth 6A-910.
###
About Gigaphoton
Gigaphoton Inc. was founded in 2000 as a joint venture of Komatsu
Ltd., the world’s No. 2 construction machinery manufacturer,
and Ushio Inc., the world’s No. 1 lithography lamp manufacturer.
Since then, Gigaphoton has been developing and marketing user-friendly,
highly innovative laser light sources that make a great contribution
to lithography technology so as to meet the stringent requirements
of the ultra-fine circuit patterns of the gigabit era, and delivering
them to major lithography tool suppliers in the global semiconductor
industry. In the area of advanced KrF excimer light sources, Gigaphoton
dominates the worldwide market. As a leading global manufacturer
of excimer laser light sources, Gigaphoton is also expanding its
presence in the U.S. and European markets. More information about
Gigaphoton can be found on the company’s website at: www.gigaphoton.com
The
company name and logo are the trademarks of Gigaphoton, Inc. The
content of this release may be revised without prior notice.
Gigaphoton shall not be liable for updating or announcing a correction
if the content of this release is changed for any reason in the
future.
© 2005 Gigaphoton

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