GIGAPHOTON BEGINS SHIPMENT OF 6-KHZ INJECTION-LOCKING ArF EXCIMER LASER, THE GT60A

Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, announced today that it has begun shipment of its new argon fluoride (ArF) excimer laser, which is designed for lithography applications at 45 nm or below design rules. The GT60A (emission wavelength: 193 nm, repetition rate: 6,000 Hz) will be tested and qualified for integration at major lithography tool manufacturers immediately, and subsequently used in volume production at major global semiconductor manufacturers beginning mid-2006.
More

GIGAPHOTON ANNOUNCES VOLUME PRODUCTION AND SHIPMENT OF NEW LASER MODEL "GT40A"
Industry's First Injection-locking ArF Excimer Laser

OYAMA, Japan, April 27, 2005-Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced that it has begun volume production and shipment of a new argon fluoride (ArF) excimer laser model, the "GT40A" (emission wavelength: 193 nm; repetition rate: 4,000 Hz). This new model has already been tested and qualified for integration with lithography tools at ASML Holding NV (ASML) in the Netherlands, and will be mounted on ASML lithography systems that are scheduled for delivery to major global semiconductor manufacturers in mid-2005.
More

Gigaphoton will make a presentation at Semicon Korea 2005, which will held at the Convention and Exhibition Centre (COEX) in Seoul, Korea, from February 8 through 10, and will introduce its major products such as the new GT60A model ArF excimer laser.
Please visit us at booth 218 (Ushio Korea Inc.).

We will hold a private seminar on “Challenges in High-End Lithography and Solutions from the Light Source” along with our exhibit at Semicon Japan 2005. Leading engineers from the world’s major semiconductor device manufacturers will make presentations on the leading edge of lithography technologies.

Seminar Contact
Yutatsu Matsui, Sales Division I, Sales Division, Gigaphoton Inc.,
TEL: 0285-28-8415, FAX: 0285-28-8439

Gigaphoton will make a presentation at Semicon Taiwan 2005 to be held at the Taipei World Trace Center in Taipei, Taiwan, from Septemer 12 through 14, and will exhibit its leading-edge ArF excimer laser model ”GT40A” and other major products. Please visit us at booth 426 (Ushio Taiwan Inc.).

Gigaphoton will present the following paper at the “SPIE 30th International Symposium”, to be held on February 27 (Sun.) through March 4 (Fri.), 2005, at the Mariott Hotel in San Jose, California, USA:

• March 4, 12:10 pm – 12:30 pm: “High-power Injection Lock Laser Platform for ArF Dry/Wet Lithography,” to be presented by Dr. Hakaru Mizoguchi [5754-74] at Session 14, “Advanced Exposure Systems and Components II”
• March 3, All day: “Feasibility Study of a 6-kHz Excimer Laser for 193-nm Immersion Lithography,” poster presentation by Dr. Tsukasa Hori [5754-140] at the Posters Session.