2008

• CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography, SPIE 6921-29. (PDF)
• Magnetic debris mitigation of a CO2 laser-produced Sn plasma, SPIE 6921-113. (PDF)
• Sn droplet target development for laser produced plasma EUV light source. SPIE 6921-114. (PDF)
• LPP EUV light source employing high power CO2 laser. SPIE 6921-115. (PDF)
• Reliable High Power Injection Locked 6 kHz 60W Laser for ArF Immersion Lithography. SPIE 6924-198. (PDF)
• High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography. SPIE 6924-199. (PDF)

2007

• HighPowerCO2Laser_EUVA. (PDF)
• Combined NdYAG -CO2 LPP EUV source examination with the Code Z. (PDF)
• Evaluation of Xe and Sn droplets as LPP targets. (PDF)
• Scaling of short pulse CO2 laser into multi 10kW output power. (PDF)
• EUV Source Supplier update Gigaphoton. (PDF)

• Laser Produced EUV Light Source Development for HVM, SPIE 6517-23. (PDF)
• Presentation of Laser Produced EUV Light Source Development for HVM, SPIE 6517-23. (PDF)
• Characterization of Various Sn Targets with Respect to Debris and Fast Ion Generation, , SPIE 6517-123. (PDF)
• Small Field Exposure Tool (SFET) Light Source, SPIE 6517-124. (PDF)
• Presentation of Small Field Exposure Tool (SFET) Light Source, SPIE 6517-124. (PDF)
• Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool, SPIE 6520-75. (PDF)
• Presentation of Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool, SPIE 6520-75. (PDF)
• Reliable High Power Injection Locked 6kHz 60W Laser for ArF Immersion Lithography, SPIE 6520-111. (PDF)
• Sn + CO2 Poster, SPIE 6517-122. (PDF)
• Sn Debris Poster, SPIE 6517-123. (PDF)
• GT60A Poster. SPIE 8520-111. (PDF)

2006

• KrF Laser Driven Xenon Plasma Light Source of a Small Field Exposure Tool. (PDF)
• High Power Pulsed CO2 Laser for EUV Lithography. (PDF)
• High Power Injection Lock Laser Platform for ArF Dry/Wet Lithography. (PDF)
• Development of CO2 Laser Produced Xe Plasma EUV Light Source for Microlithography. (PDF)
• High Power Injection Lock 6kHz 60W Laser for ArF Dry/Wet Lithography. (PDF)

2005

• High power injection lock laser platform for ArF dry/wet lithography. (PDF)
• Feasibility Study of a 6kHz ArF excimer laser for 193nm immersion
  lithography. (PDF)

2004

• High durable 4-kHz ArF excimer laser G42A for sub-90-nm lithography, SPIE, 5377(2004), pp 1727-1734 (PDF)
• Beam quality of a new-type MOPO laser system for VUV laser lithography, SPIE, 5377(2004), pp 1772-1780 (PDF)
• Development of high power ArF/F2 laser platform for VUV microlithography, SPIE, 5377(2004), pp 1805-1814 (PDF)

2003

• Spectral dynamics analysis of ultra-line-narrowed F2 laser, SPIE, 5040(2003), pp 1363-1370 (PDF)
• Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography, SPIE, 5040(2003), pp 1704-1711 (PDF)

2002

• Development of a 5 kHz ultra-line-narrowed F2 laser for dioptric projection systems, SPIE, 4691(2002),. pp 652-659 (PDF)
• Spectral metrologies for ultra-line-narrowed F2 laser, SPIE, 4691(2002),. pp 1714-1720 (PDF)

2001

• Spectral measurement of ultra line-narrowed F2 laser SPIE, 4346 (2001), pp 1066-1073 (PDF)
• Long pulse duration of F2 laser for 157nm lithography, SPIE, 4346 (2001) ,pp 1074-1077 (PDF)
• Long run-time performance characteristics of a line-selected 2kHz F2-laser for optical microlithography, SPIE, 4346(2001), pp 1137-1144 (PDF)
• Challenge of the F2 Laser for Dioptric Projection System, SPIE, 4346 (2001), pp 1158-1165 (PDF)
• Ultra-high-repetition-rate ArF excimer laser with long pulse duration?for 193-nm lithography, SPIE, 4346(2001), pp 1210-1218 (PDF)
• Ultra-narrow bandwidth 4-kHz ArF excimer laser for 193-nm lithography, SPIE, 4346(2001), pp 1229-1237 (PDF)
• High-resolution multi grating spectrometer for high quality deep UV light source production, SPIE, 4346 (2001), pp 1254-1261 (PDF)
• Extreme high NA, High throughput scanner compatible 4 kHz KrF excimer laser for DUV lithography, SPIE, 4346(2001), pp 1617-1626 (PDF)

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