Stability and durability are the biggest technological challenges for an excimer laser, because it uses fluorine, high-voltage discharge, and deep UV, all of which are highly reactive. As well as stability and durability, an excimer laser light source for lithography tools requires high monochromaticity for the laser beam and high uniformity for the output energy.

As the world’s first excimer laser light source that satisfies all of these requirements, the G10K has earned a top reputation in the lithography light source market since it was marketed in 1997. This model is still operating in the field world wide.

G10K Main Features

Stable Emission and High Durability for High Uptime and Low CoO

• Gigaphoton’s original RF pre-ionizer and newly developed high-voltage pulse power supply allows great improvement of emission stability as well as great enhancement of durability.
• A sufficient performance margin for each module and a complete quality assurance system ensure high reliability of the product.

Major Specification (*)
	G10K
Wavelength (nm)	248
Power (W)	10
Pulse Energy (mJ)	10
Max Repetition Rate(Hz)	1000
Bandwidth(FWHM, pm)	0.6
Bandwidth (E95, pm)	2.0
Energy Stability (DOSE, %)	0.5
Each of the above specification values is a typical value.
Durability (Expected Life)
Module Replacement Interval	G10K
Laser Chamber (Bpls)	7
Line Narrowing Module (Bpls)	10
Monitor Module (Bpls)	10
Front Mirror (BPls)	10