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Products

• GT63A
• GT62A
• GT61A
• GT60A
• GT40A
• G41A / G42A
• G41K-1H
• G20K / G21K
• G10K
• REDeeM
• Product Catalogues

Quality

• State-of-the-Art Factory
• Gino Juku
• Reliability Enhancement Activities

Support

• Maintenance
• REDeeM
• Training
• Technical Publication

Technology

• DUV Topics

  - GigaTwin Platform

  • Injection-Locking Technology
  • Advantages of the Injection Locking Method
  • Challenges in the Injection Locking Method
  • Common Platform for Twin-Chamber System

  - E95 & Lithography Process

  • Overview
  • Definition and Impact of E95
  • E95 and the K1 Factor
  • Improving E95 Stability
  • Bias Caused by Changing
    the E95 Performance

  - Bandwidth Control Module

  • Overview
  • BCM Configuration and Principle
  • Spectrum Performance when BCM is Mounted on the Actual Laser Unit
  • sMPL (Spectrum Multi-Positioning LNM) Technology

• EUV Topics

  • What is EUV lithopgraphy?
  • Status of World Research
    in EUV Lithography
  • Latest Accomplishments in
    EUV Light Source Development
    at the EUVA

• Reduction of CoO

  • CoO Reduction Activities
  • Calculation and Classification of Laser CoD
  • Reduction of the Cost of Consumable (CoC)
  • Reduction of the Cost of Downtime (CoD)
  • Shortening of Consumables Replacement Time
  • Reduction of CoO: Final Report
• Technical Paper

News&Event

• 2013
• 2012
• 2011
• 2010
• 2009
• 2008
• 2007
• 2006
• 2005
• 2004
• 2003
• 2002
• 2001
• 2000

Careers

A Milestone: 1000 Units Shipped!

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