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Technology

• DUV Topics

  - GigaTwin Platform

  • Injection-Locking Technology
  • Advantages of the Injection Locking Method
  • Challenges in the Injection Locking Method
  • Common Platform for Twin-Chamber System

  - E95&Lithography Process

  • Overview
  • What is E95?
  • E95 and the K1 Factor
  • Improving E95 Stability
  • Bias Caused by Changing
    the E95 Performance

  - Bandwidth Control Model

  • Simulation
  • BCM Configuration and Principle
  • Spectrum Performance when BCM is Mounted on the Actual Laser Unit

• EUV Topics

  • What is EUV lithopgraphy?
  • Status of World Research
    in EUV Lithography
  • Latest Accomplishments in
    EUV Light Source Development
    at the EUVA

• Reduction of CoO

  • CoO Reduction Activities
  • Calculation and Classification of Laser CoD
  • Reduction of the Cost of Consumable (CoC)
  • Reduction of the Cost of Downtime (CoD)
  • Shortening of Consumables Replacement Time
  • Reduction of CoO: Final Report
• Technical Paper

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