In 2004, Gigaphoton adopted injection-locking technology and commercialized a twin-chamber mass-production ArF excimer laser before anyone else. Subsequently, as lithography tools evolve , Gigaphoton has introduced to the market a series of cutting-edge ArF excimer lasers specially designed for immersion lithography and double-patterning immersion lithography. Gigaphoton has also greatly contributed to the development of lithography technologies for gigabit-generation ultra-fine integrated circuits.
Today, Gigaphoton’s laser light sources have been introduced by most semiconductor manufacturers in Asia, including Japan, and are gaining rapid acceptance in Europe and the US as well. As the result, in just over 11 years, Gigaphoton has phenomenally increased its world market share to almost 50%, from a single-digit market share in 2000 when it was founded.
We at Gigaphoton will continue to seek steady growth on a global scale, to establish an unchallenged position as the world’s No. 1 excimer laser supplier. Furthermore, we will strive to become a trusted partner of our customers and help them to enhance their productivity.
Addressing the Development of Next-generation Lithography Technologies
Gigaphoton has been aggressively working on development of extreme ultraviolet (EUV) lithography as one of the next-generation lithography technologies for advancing beyond the era of ArF lithography. For nine years, from 2002 until 2010, Gigaphoton participated in the Extreme Ultraviolet Lithography System Development Association (EUVA) and as an original member, and played an important role in the development of lithography light sources.
We at Gigaphoton have developed an EUV light source using the laser-produced plasma (LPP) method, which generates EUV light from high-temperature plasma by radiating a pulse laser onto the Sn target. Currently, we are developing a mass-production light source and making a steady progress.