Technical Paper

2012

- SPIE Advanced Lithography 2012 -

  • Development of laser-produced plasma based EUV light source technology for HVM EUV lithography. Presentation / Manuscript
  • Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source. Presentation / Manuscript
  • A Reliable Higher Power ArF Laser with Advanced Functionality for Immersion Lithography. Presentation / Manuscript

2011

- 2011 International Symposia on Extreme Ultraviolet Lithography and Lithography Extensions -

- SPIE Advanced Lithography 2011 -

  • 100W 1st generation Laser-Produced Plasma source system for HVM EUV lithography. Presentation / Manuscript
  • Development of the reliable 20 kW Class Pulsed Carbon Dioxide Laser System for LPP EUV Light Source. Presentation / Manuscript
  • Characterization and Optimization of Tin Particle Mitigation and EUV Conversion Efficiency in a Laser Produced Plasma EUV Light Source.Presentation / Manuscript
  • Ecology and High Durability Injection Locked Laser with Flexible Power for Double patterning ArF Immersion Lithography. Presentation / Manuscript

2010

- EUV Symposium 2010 -

- SPIE Advanced Lithography 2010 -

2009

- 2009 EUVL Symposium -

- SPIE Advanced Lithography 2009 -

2008

SPIE Advanced Lithography 2008 -

2007

- SEMATECH EUV Source Workshop 2007 -

- SPIE Advanced Lithography 2007 -

2006

2005

2004

2003

2002

2001

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