We will hold a private seminar on "Challenges in High-End Lithography and Solutions from the Light Source" at SEMICON Japan 2011. Leading engineer from the world's major semiconductor device manufacturer will make a presentation on the leading edge of lithography technologies as well as the Gigaphoton's solutions in technologies and products.
|When:||15:00 - 17:15, December 9 (Fri.), 2011 (followed by a dinner party)|
|Where:||“Makuhari Hall”, Tokyo Bay Makuhari|
|Seminar:||“Challenges in High-End Lithography and Solutions from the Light Source”|
|Agenda (simultaneous interpretation will be provided)|
|15:00-15:15||“Opening Remarks” by Dr. Yuji Watanabe, President and CEO, Gigaphoton Inc.|
|15:15-15:45||Updates of Lithography Technologies
Dr. Tatsuhiko Higashiki
Advanced Lithography Process Technology Dpt.
Device Process Development Center
Corporate Research & Development Center
|15:45-16:15||Current Status for NXE EUV Scanners and Expectation to Source Suppliers
Mr. Kenji Morisaki
Director, Technical Marketing
ASML Japan Co., Ltd.
|16:15-16:45||EUV Lithography Development Status
Mr. YoonSuk Hyun
Senior Engineer, Research & Development Division
DRAM Process AP Team
HYNIX Semiconductor Inc.
|16:45-17:15||Gigaphoton: Update and Roadmap of LPP EUV Light Source Development
Dr. Akira Sumitani
Deputy General Manager, Business Promotion Division
|17:15 -||Dinner Party|
Masahiko Hasegawa, Sales Division, Gigaphoton Inc.
TEL: +81-285-28-8415, FAX: +81-285-28-8439