Gigaphoton at the 2011 International Symposia on Extreme Ultraviolet Lithography and Lithography Extensions

Gigaphoton will present the paper at the “2011 International Symposia on Extreme Ultraviolet Lithography and Lithography Extensions,” to be held on October 17 (Mon.) through October 21 (Fri.), 2011, at JW Marriott Marquis Miami in Miami, Florida, USA.

Oral Presentation, October 17 (Mon), 11:45 - 12:05

Development of LPP-EUV Source for HVM EUVL
Author(s): Junichi Fujimoto, Hiroaki Nakarai, Tsukasa Hori, Satoshi Tanaka, Yukio Watanabe, Yasufumi Kawasuji, Takeshi Ohta, Tamotsu Abe, Hakaru Mizoguchi
Gigaphoton Inc., Komatsu Ltd.

Poster Presentation, October 17 (Mon), 17:40 – 19:40; October 18 (Tue), 14:30– 16:00

Investigation on high conversion efficiency and Tin debris mitigation for laser produced plasma EUV light source
Author(s): Toru Suzuki, Tsukasa Hori, Tatsuya Yanagida, Takayuki Yabu, Hitoshi Nagano, Yasunori Wada, Soumagne Georg, Junichi Fujimoto, Hakaru Mizoguchi
Komatsu Ltd., Gigaphoton Inc.

Poster Presentation, October 17 (Mon), 17:40 – 19:40; October 18 (Tue), 14:30– 16:00

Efficient EUV Emission by Double-pulse Irradiation on Tin Droplet
Author(s): Atsushi Sunahara, Katsunobu Ninishihara, Richard More, Akira Sasaki, and Tsukasa Hori, Junichi Fujimoto, Hakaru Mizoguchi
Institute for Laser Technology, Japan, Institute of Laser Engineering, Osaka Univ., Lawrence Berkley National Lab, USA,
JAEA Kansai Advanced Photon Research Institute, Japan, Komatsu Ltd., Gigaphoton Inc.

Oral Presentation, October 20 (Thu), 14:25-14:50

Performance of Bandwidth Tuning Laser for Focus Drilling
Author(s): Takahito Kumazaki, S. Tanaka, H. Tanaka, Y. Watabe, S. Matsumoto, T. Matsunaga, J. Fujimoto
Gigaphoton Inc.