Gigaphoton at SPIE Advanced Lithography 2011

Gigaphoton will present the paper and exhibit at the "SPIE Advanced Lithography 2011", to be held on February 27 (Sun.) through March 3 (Thu.), 2011, at the San Jose McEnery Convention Center and San Jose Marriot (Headquarters Hotel) in San Jose, California, USA (Booth No. 119).

Oral Presentation, Tuesday 1 March, 8:00 AM

100W 1st generation laser-produced plasma source system for HVM EUV lithography 
Paper 7969-7

Time: 8:00 AM - 8:20 AM
Author(s): Hakaru Mizoguchi, EUVA (Japan) and Komatsu Ltd. (Japan); Tamotsu Abe, Yukio Watanabe, EUVA (Japan); Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Akihiko Kurosu, Hiroshi Komori, Kouji Kakizaki, Akira Sumitani, Komatsu Ltd. (Japan); Osamu Wakabayashi, Hiroaki Nakarai, Junichi Fujimoto, Akira Endo, EUVA (Japan)

■ Paper Presentation, Wednesday 2 March, 6:00 PM

Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser-produced plasma EUV light source 
Paper 7969-100
Author(s): Tatsuya Yanagida, Komatsu Ltd. (Japan) and EUVA (Japan); Hitoshi Nagano, Komatsu Ltd. (Japan); Takayuki Yabu, Shinji Nagai, Georg Soumagne, Tsukasa Hori, Komatsu Ltd. (Japan) and EUVA (Japan); Kouji Kakizaki, Komatsu Ltd. (Japan); Akira Sumitani, Komatsu Ltd. (Japan) and EUVA (Japan); Junichi Fujimoto, Hakaru Mizoguchi, Gigaphoton Inc. (Japan); Akira Endo, Forschungszentrum Dresden-Rossendorf e.V. (Germany)

 

Development of the reliable 20-kW class pulsed carbon dioxide laser system for LPP EUV light source
Paper 7969-99
Author(s): Junichi Fujimoto, Takeshi Ohta, Krzysztof M. Nowak, Takashi Suganuma, Hidenobu Kameda, Toshio Yokoduka, Koji Fujitaka, Masato Moriya, Gigaphoton Inc. (Japan); Akira Sumitani, EUVA/Komatsu Ltd. (Japan); Hakaru Mizoguchi, Gigaphoton Inc. (Japan); Akira Endo, Forschungszentrum Dresden-Rossendorf e.V. (Germany)

■ Oral Presentatio, Thursday 3 March, 5:10 PM

Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography 
Paper 7973-55
Time: 5:10 PM - 5:30 PM
Author(s): Hiroshi Umeda, Gigaphoton Inc. (Japan)

Note to editors: Gigaphoton will be also exhibiting at SPIE Advanced Lithography 2011. For more information about Gigaphoton and the Company's technology and product offerings, please visit us in Booth #119.