We will hold a private seminar on "Challenges in High-End Lithography and Solutions from the Light Source" at Semicon Japan 2008. Leading engineer from the world's major semiconductor device manufacturer will make a presentation on the leading edge of lithography technologies as well as the Gigaphoton's solutions in technologies and products.
| When: | 15:00 - 17:00, December 5 (Fri.), 2008 (followed by a dinner party) |
| Where: | “Makuhari Hall”, Tokyo Bay Makuhari |
| Seminar: | “Challenges in High-End Lithography and Solutions from the Light Source” |
| Agenda (simultaneous interpretation will be provided) | |
| 15:00-15:15 | “Opening Remarks” by Dr. Yuji Watanabe, Representative Director and President, Gigaphoton Inc. |
| 15:15-15:45 | Innovation of a Lithography Technology for Next Generation Dr. Tatsuhiko Higashiki Senior Manager Advance ULSI Process Engineering Dept. II Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company |
| 15:45-16:15 | The New Lithography Material Dr Yi Shiyong Senior Engineer Samsung Electronics Co., Ltd. Semiconductor Business |
| 16:15-16:40 | Present Status and Future of R&D of LPP-EUV Light Sources Akira Endo Manager, Development Division, Gigaphoton Inc. |
| 16:40-17:00 | Gigaphoton DUV Laser Roadmap Tatsuo Enami Manager, Marketing Division Gigaphoton Inc. |
| 17:00 - | Dinner Party |
Seminar Contact
Yutatsu Matsui, Sales Division, Gigaphoton Inc.
TEL: +81-285-28-8415, FAX: +81-285-28-8439
E-mail:yuutatsu_matsui@gigaphoton.com
Gigaphoton at SPIE Advanced Lithography 2008
Gigaphoton will present the paper and exhibit at the "SPIE Advanced Lithography 2008", to be held on February 24 (Sun.) through February 29 (Fri.), 2008, at the San Jose McEnery Convention Center and San Jose Marriot (Headquarters Hotel) in San Jose, California, USA (Booth No. 115).
■ Paper Tuesday 26 February, 4:50 PM – 5:10 PM
CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography (Paper Presentation)
Paper 6921-29 of Conference 6921
Authors(s): Akira Endo, Yoshifumi Ueno, Georg Soumagne, Masaki Nakano, Hiroshi Komori, Hideo Hoshino, Takashi Suganuma, Takayuki Yabu, Takeshi Asayama, Krzysztof Nowak, Masato Moriya, Hiroshi Someya, Tamotsu Abe, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan)
■ Paper/Poster Tuesday 28 February, 6:00 PM – 8:00 PM
Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography (Poster Presentation)
Paper 6924-198 of Conference 6924
Authors(s): Takahito Kumazaki, Ryoichi Nohdomi, Hiroaki Nakarai, Takashi Matsunaga, Kouji Kakizaki, Junichi Fujimoto, Hakaru Mizoguchi, Gigaphoton Inc. (Japan)
High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography
Paper 6924-199 of Conference 6924
Authors(s): Masaya Yoshino, Hiroaki Nakarai, Takashi Matsunaga, Junichi Fujimoto, Ryoichi Nohdomi, Kouji Kakizaki, Taku Yamazaki, Hakaru Mizoguci, Gigaphoton Inc. (Japan)
Magnetic debris mitigation of a CO2 laser-produced Sn plasma
Paper 6921-113 of Conference 6921
Author(s): Yoshifumi Ueno, Georg Soumagne, Masato Moriya, Takashi Suganuma, Takayuki Yabu, Tamotsu Abe, Hirosh Komori, Akira Endo, Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)
Sn-droplet target development for laser-produced plasma EUV-light source
Paper 6921-114 of Conference 6921
Author(s): Masaki Nakano, Takayuki Yabu, Hiroshi Someya, Tamotsu Abe, Georg Soumagne, Akira Endo, Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)
LPP EUV-light source employing high-power CO2 laser
Paper 6921-115 of Conference 6921
Author(s): Hideo Hoshino, Takashi Suganuma, Tamotsu Abe, Takeshi Asayama, Krzysztof Nowak, Masato Moriya, Akira Endo, Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)
Note to editors: Gigaphoton will be also exhibiting at SPIE Advanced Lithography 2008. For more information about Gigaphoton and the Company's technology and product offerings, please visit us in Booth #115.