Gigaphoton at SPIE Advanced Lithography 2007

Gigaphoton will present the following paper at the "SPIE Advanced Lithography 2007", to be held on February 25 (Sun.) through March 2 (Fri.), 2007, at the San Jose McEnery Convention Center and San Jose Marriot (Headquarters Hotel) in San Jose, California, USA (including ones under EUVA):

■ Paper  Wednesday 28 February, 8:00 am - 8:20 am, Session 6

Laser-produced EUV light source development for HVM, A. Endo, H. Hoshino, T. Ariga, T. Miura, Y. Ueno, M. Nakano, T. Asayama, H. Komori, G. Soumagne, H. Mizoguchi, A. Sumitani, K. Toyoda, Extreme Ultraviolet Lithography System Development Association ( Japan ) [6517-23]

■ Posters  Thursday 1 March, 5:30 pm - 8:00 pm

Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography, H. Watanabe, S. Komae, R. Nohdomi, T. Yamazaki, H. Nakarai, J. Fujimoto, Gigaphoton Inc. ( Japan ); T. Matsunaga, K. Kakizaki, Komatsu Ltd. (Japan ); H. Mizoguchi, Gigaphoton Inc. ( Japan ) [6520-111]
CO2 laser and Sn-droplet target development for EUVL, A. Endo, H. Hoshino, T. Ariga, T. Miura, Y. Ueno, M. Nakano, T. Asayama, H. Komori, G. Soumagne, H. Mizoguchi, A. Sumitani, K. Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan) [6517-122]
Characterization of various Sn targets with respect to debris and fast ion generation, Y. Ueno, H. Hoshino, T. Ariga, T. Miura, M. Nakano, H. Komori, G. Soumagne, A. Endo, H. Mizoguchi, A. Sumitani, K. Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan) [6517-123]
Small field exposure tool (SFET) light source, T. Abe, T. Suganuma, M. Moriya, T. Yabu, T. Asayama, H. Someya, Y. Ueno, G. Soumagne, A. Sumitani, H. Mizoguchi, Extreme Ultraviolet Lithography System Development Association (Japan ) [6517-124]

■ Paper  Friday 2 March, 11:35 am - 11:55 am, Session 15

Ultra-narrowed injection lock laser light source for higher NA ArF immersion lithography tool, M. Shimbori, Ushio Inc. ( Japan ); T. Matsunaga, T. Suzuki, K. Kakizaki, Komatsu Ltd. ( Japan ); S. Tanaka, M. Yoshino, Gigaphoton Inc. ( Japan ); T. Kumazaki, S. Nagai, Y. Kawasuji, H. Umeda, Komatsu Ltd. ( Japan ); H. Nagano, Y. Sasaki, Ushio Inc. ( Japan ); H. Taniguchi, H. Mizoguchi, Gigaphoton Inc. ( Japan ) [6520-75]

 

In addition, Gigaphoton will exhibit its major products, such as the latest ArF excimer laser model "GT61A," at booth (#200).