Oyama, Japan, February 25, 2008 — Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced the inaugural shipment of the GT62A, the newest addition to the company’s argon fluoride (ArF) excimer laser light source portfolio. The first unit was delivered to a leading lithography tool manufacturer to support the introduction of its double-patterning immersion lithography tools, which have dramatically increased in demand.
In today’s advanced lithography processes, immersion lithography technology is beginning volume production at the 45-nm technology node. Beyond that, double-patterning immersion lithography is considered to be the most promising technology—meeting the requirements associated with the next-generation 32-nm technology node. This type of lithography tool requires high throughput and high uptime to enhance economic efficiency, as well as offer high resolution capabilities. The GT62A has an emission wavelength of 193-nm, an output of 90 W and a repetition rate of 6,000 Hz.
"We successfully introduced and delivered the first unit of the GT62A in a 60-watt version to meet the specifications of one of our customers,” commented Dr. Yuji Watanabe, president and representative director of Gigaphoton, Inc. “Now, by using the design concept for the GT platform, the GT62A can be upgraded to 90 watts, ensuring high product reliability and flexible solutions for our customers.”
Introduced in December 2007, the GT62A achieves high output and high uptime while incurring great reduction in the maintenance time and operating cost. Additionally, the GT62A features an improved laser chamber and consumables life, such as optics. The tool’s technology allows for minimal down time—enabling the most advanced processing with less economical risk.
The GT series has already been accepted by major users in the global semiconductor industry with 40-percent* world market share for immersion lithography light sources. Overall, the GT platform has made a great contribution to the productivity and enhancement of leading-edge semiconductor manufacturing fabs around the world.
* Based on the number of units sold in 2007, independent research by Gigaphoton Inc.
Key Features of the GT62A
- Newly developed power supply, allowing an output of 90-Watts (a 50% improvement compared to the GT61A)
- Light source is mounted with a technology to take measures against heat loads
- Reliable performance
- To provide a stabilized spectrum, the GT62A comes standard with Gigaphoton’s original
"Bandwidth Control Module (BCM)” technology
- To meet a variety of customer needs, a 60-Watt version is also available
|Max. Repetition Rate||6,000 Hz|
|Pulse Energy||10.0/15.0 mJ|
|Bandwidth (95% Energy Integral)||< 0.35 pm|
|Module Replacement Intervals|
|Laser Chamber (Oscillator)||20 billion pulses|
|Laser Chamber (Amplifier)||30 billion pulses|
|Monitor Module||30 billion pulses|
|PO Front Mirror||12 billion pulses|
|PO Rear Mirror||12 billion pulses|
|F2Trap Module||200 cycles|
Gigaphoton, Inc. was founded in 2000 as a joint venture of Komatsu Ltd., the world’s No. 2 construction machinery manufacturer, and Ushio Inc., the world’s No. 1 lithography lamp manufacturer. Since then, Gigaphoton has been developing and marketing user-friendly, highly innovative laser light sources that make a great contribution to lithography technology so as to meet the stringent requirements of the ultra-fine circuit patterns of the gigabit era, and is delivering them to major lithography tool suppliers in the global semiconductor industry. As the No. 2 excimer laser light source manufacturer in the world, Gigaphoton holds a strong position in the Asian market, including Japan, while continuing to enjoy rapid growth in the U.S. and European markets. More information about Gigaphoton can be found on the company’s website at http://www.gigaphoton.com.
The company name, logo, and designations GT40A, GT60A and GT61A are trademarks of Gigaphoton, Inc. The content of this release may be revised without prior notice. Gigaphoton shall not be liable for updating or announcing a correction if the content of this release is changed for any reason in the future.