2018
SPIE Laser Damage 2018
SPIE Photomask Technology + EUV Lithography 2018
International Conference on Extreme Ultraviolet Lithography 2018
Optics Express
2018 International Workshop on EUV Lithography
The 11th Asia-Pacific Laser Symposium
SPIE Advanced Lithography 2018
- Extreamely long life excimer laser technology for multi-patterning lithography
- High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing
- Improvement of conversion efficiency of DUV light generation at 221-nm using CLBO crystal
- Key components development progress updates of the 250W high-power LPP-EUV light source
- Next-generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes
2017
EUV-FEL Workshop
Laser Institute of America
SEMICON JAPAN 2017
IWAPS 2017 (International Workshop on Advanced Patterning Solutions)
SPIE Advanced Lithography 2017
- LPP-EUV light source for HVM lithography
- Performance of 250W high-power HVM LPP-EUV source
- Key components technology update of the 250W high-power LPP-EUV light source
- High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing
- Highly-efficient high-power pulsed CO2 laser characterized by transverse-flow laser amplifiers
- Excimer laser gas usage reduction technology for semiconductor manufacturing
- DUV high power lasers processing for glass and CFRP
- Devlopment of next-generation Arf excimr laser with ultra-narrow stable spectral bandwith for multiple patterning immersion lithography
- Development of 250W EUV light source for HVM lithography
- 193nm high power lasers for the wide bandgap material processing
2016
SPIE Advanced Lithography 2016
- The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation
- The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations
- Performance of new high-power HVM LPP-EUV source
- Key components development progress updates of the 250W high power LPP-EUV light source
- High power DUV lasers for material processing
- 100W EUV light-source key component technology update for HVM
2015
SPIE Advanced Lithography 2015
- Performance of one hundred watt HVM LPP-EUV source
- New robust and highly customizable light source management system
- Green solution: 120W ArF immersion light source supporting the next-generation multiple-pattering lithography
- Extending green technology innovations to enable greener fabs
- 120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography
2014
SPIE Advanced Lithography 2014
- Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes
- Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography
- Advanced excimer technologies enable green semiconductor manufacturing
2013
SPIE Advanced Lithography 2013
- Performance of one hundred watt HVM LPP-EUV source
- LPP-EUV light source development for high volume manufacturing lithography
2012
SPIE Advanced Lithography 2012
- Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography
- Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography
- Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source
- Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography
- Development of laser-produced plasma based EUV light source technology for HVM EUV lithography < Presentation / Manuscript >
- Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source < Presentation / Manuscript >
- A Reliable Higher Power ArF Laser with Advanced Functionality for Immersion Lithography < Presentation / Manuscript >
2011
2011 International Symposia on Extreme Ultraviolet Lithography and Lithography Extensions
- Performance of Bandwidth Tuning Laser for Focus Drilling
- Development of LPP-EUV source for HVM EUVL
- Investigation on high conversion efficiency and Tin debris mitigation for laser produced plasma EUV light source
SPIE Advanced Lithography 2011
- 100W 1st generation Laser-Produced Plasma source system for HVM EUV lithography < Presentation / Manuscript >
- Development of the reliable 20 kW Class Pulsed Carbon Dioxide Laser System for LPP EUV Light Source < Presentation / Manuscript >
- Characterization and Optimization of Tin Particle Mitigation and EUV Conversion Efficiency in a Laser Produced Plasma EUV Light Source < Presentation / Manuscript >
- Ecology and High Durability Injection Locked Laser with Flexible Power for Double patterning ArF Immersion Lithography < Presentation / Manuscript >
2010
EUV Symposium 2010
- 1st generation Laser-Produced Plasma 100W source system for HVM EUV lithography (PDF)
- Investigation on high conversion efficiency and Tin debris mitigation for laser produced plasma EUV light source (PDF)
- Improving efficiency of pulsed CO2 Laser system for LPP EUV light source (PDF)
SPIE Advanced Lithography 2010
- 1st generation Laser-Produced Plasma source system for HVM EUV lithography (PDF)
- Present status of laser-produced plasma EUV light source (PDF)
- Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography (PDF)
2009
2009 EUVL Symposium
- Laser-produced plasma source for EUV lithography (PDF)
- Present status of laser-produced plasma EUV light source (PDF)
- Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography (PDF)
SPIE Advanced Lithography 2009
- Laser-produced plasma source development for EUV lithography (PDF)
- Evaluation at the intermediate focus for EUV Light Source (PDF)
- Optical performance of laser light source for ArF immersion double patterning lithography tool (PDF)
- Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography (PDF)
2008
SPIE Advanced Lithography 2008
- CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography, SPIE 6921-29 (PDF)
- Magnetic debris mitigation of a CO2 laser-produced Sn plasma, SPIE 6921-113 (PDF)
- Sn droplet target development for laser produced plasma EUV light source, SPIE 6921-114 (PDF)
- LPP EUV light source employing high power CO2 laser, SPIE 6921-115 (PDF)
- Reliable High Power Injection Locked 6 kHz 60W Laser for ArF Immersion Lithography, SPIE 6924-198 (PDF)
- High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography, SPIE 6924-199 (PDF)
2007
SEMATECH EUV Source Workshop 2007
- High Power CO2 Laser, EUVA (PDF)
- Combined NdYAG -CO2 LPP EUV source examination with the Code Z (PDF)
- Evaluation of Xe and Sn droplets as LPP targets (PDF)
- Scaling of short pulse CO2 laser into multi 10kW output power (PDF)
- EUV Source Supplier update, Gigaphoton (PDF)
SPIE Advanced Lithography 2007
- Laser Produced EUV Light Source Development for HVM, SPIE 6517-23 (PDF)
- Presentation of Laser Produced EUV Light Source Development for HVM, SPIE 6517-23 (PDF)
- Characterization of Various Sn Targets with Respect to Debris and Fast Ion Generation, SPIE 6517-123 (PDF)
- Small Field Exposure Tool (SFET) Light Source, SPIE 6517-124 (PDF)
- Presentation of Small Field Exposure Tool (SFET) Light Source, SPIE 6517-124 (PDF)
- Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool, SPIE 6520-75 (PDF)
- Presentation of Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool, SPIE 6520-75 (PDF)
- Reliable High Power Injection Locked 6kHz 60W Laser for ArF Immersion Lithography, SPIE 6520-111 (PDF)
- Sn + CO2 Poster, SPIE 6517-122 (PDF)
- Sn Debris Poster, SPIE 6517-123 (PDF)
- GT60A Poster, SPIE 8520-111 (PDF)
2006
- KrF Laser Driven Xenon Plasma Light Source of a Small Field Exposure Tool (PDF)
- High Power Pulsed CO2 Laser for EUV Lithography (PDF)
- High Power Injection Lock Laser Platform for ArF Dry/Wet Lithography (PDF)
- Development of CO2 Laser Produced Xe Plasma EUV Light Source for Microlithography (PDF)
- High Power Injection Lock 6kHz 60W Laser for ArF Dry/Wet Lithography (PDF)
2005
- High power injection lock laser platform for ArF dry/wet lithography (PDF)
- Feasibility Study of a 6kHz ArF excimer laser for 193nm immersion lithography (PDF)
2004
- High durable 4-kHz ArF excimer laser G42A for sub-90-nm lithography, SPIE, 5377(2004), pp 1727-1734 (PDF)
- Beam quality of a new-type MOPO laser system for VUV laser lithography, SPIE, 5377(2004), pp 1772-1780 (PDF)
- Development of high power ArF/F2 laser platform for VUV microlithography, SPIE, 5377(2004), pp 1805-1814 (PDF)
2003
- Spectral dynamics analysis of ultra-line-narrowed F2 laser, SPIE, 5040(2003), pp 1363-1370 (PDF)
- Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography, SPIE, 5040(2003), pp 1704-1711 (PDF)
2002
- Development of a 5 kHz ultra-line-narrowed F2 laser for dioptric projection systems, SPIE, 4691(2002),. pp 652-659 (PDF)
- Spectral metrologies for ultra-line-narrowed F2 laser, SPIE, 4691(2002),. pp 1714-1720 (PDF)
2001
- Spectral measurement of ultra line-narrowed F2 laser SPIE, 4346 (2001), pp 1066-1073 (PDF)
- Long pulse duration of F2 laser for 157nm lithography, SPIE, 4346 (2001) ,pp 1074-1077 (PDF)
- Long run-time performance characteristics of a line-selected 2kHz F2-laser for optical microlithography, SPIE, 4346(2001), pp 1137-1144 (PDF)
- Challenge of the F2 Laser for Dioptric Projection System, SPIE, 4346 (2001), pp 1158-1165 (PDF)
- Ultra-high-repetition-rate ArF excimer laser with long pulse duration?for 193-nm lithography, SPIE, 4346(2001), pp 1210-1218 (PDF)
- Ultra-narrow bandwidth 4-kHz ArF excimer laser for 193-nm lithography, SPIE, 4346(2001), pp 1229-1237 (PDF)
- High-resolution multi grating spectrometer for high quality deep UV light source production, SPIE, 4346 (2001), pp 1254-1261 (PDF)
- Extreme high NA, High throughput scanner compatible 4 kHz KrF excimer laser for DUV lithography, SPIE, 4346(2001), pp 1617-1626 (PDF)
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