2018

SPIE Laser Damage 2018

• Laser-induced damage and defect analysis of calcium fluoride window caused by the high pulse repetition rate of ArF excimer laser radiation

 
SPIE Photomask Technology + EUV Lithography 2018

• Long Collector Mirror Lifetime Demonstration around 100W Average LPP-EUV Source for Semiconductor High Volume Manufacturing

 
International Conference on Extreme Ultraviolet Lithography 2018

• Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field

 
Optics Express

• Watt-level 193 nm source generation based on compact collinear cascaded sum frequency mixing configuration

 
2018 International Workshop on EUV Lithography

• Long Collector Mirror Lifetime Demonstration around 100W Average LPP-EUV Source for Semiconductor High Volume Manufacturing

 
The 11th Asia-Pacific Laser Symposium

• Thermal Properties and Wavefront Distortions of Yb:YAG Active Mirror Amplifier

 
SPIE Advanced Lithography 2018

• Extreamely long life excimer laser technology for multi-patterning lithography
• High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing
• Improvement of conversion efficiency of DUV light generation at 221-nm using CLBO crystal
• Key components development progress updates of the 250W high-power LPP-EUV light source
• Next-generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes

2017

EUV-FEL Workshop

• 193nm High-Power Laser for Drilling with High Aspect Ratio into Wide Bandgap Materials

 
Laser Institute of America

• High Power LPP-EUV Source with Long Collector Mirror Lifetime for High Volime Semiconductor Manufacturing

 
SEMICON JAPAN 2017

• HIGH POWER LPP-EUV SOURCE WITH LONG COLLECTOR MIRROR LIFETIME FOR HIGH VOLUME SEMICONDUCTOR MANUFACTURING

 
IWAPS 2017 (International Workshop on Advanced Patterning Solutions)

• PRESENT STATUS OF HIGH-POWER LPP-EUV SOURCE FOR HVM

 
SPIE Advanced Lithography 2017

• LPP-EUV light source for HVM lithography
• Performance of 250W high-power HVM LPP-EUV source
• Key components technology update of the 250W high-power LPP-EUV light source
• High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing
• Highly-efficient high-power pulsed CO2 laser characterized by transverse-flow laser amplifiers
• Excimer laser gas usage reduction technology for semiconductor manufacturing
• DUV high power lasers processing for glass and CFRP
• Devlopment of next-generation Arf excimr laser with ultra-narrow stable spectral bandwith for multiple patterning immersion lithography
• Development of 250W EUV light source for HVM lithography
• 193nm high power lasers for the wide bandgap material processing

2016

SPIE Advanced Lithography 2016

• The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation
• The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations
• Performance of new high-power HVM LPP-EUV source
• Key components development progress updates of the 250W high power LPP-EUV light source
• High power DUV lasers for material processing
• 100W EUV light-source key component technology update for HVM

2015

SPIE Advanced Lithography 2015

• Performance of one hundred watt HVM LPP-EUV source
• New robust and highly customizable light source management system
• Green solution: 120W ArF immersion light source supporting the next-generation multiple-pattering lithography
• Extending green technology innovations to enable greener fabs
• 120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography

2014

SPIE Advanced Lithography 2014

• Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes
• Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography
• Advanced excimer technologies enable green semiconductor manufacturing

2013

SPIE Advanced Lithography 2013

• Performance of one hundred watt HVM LPP-EUV source
• LPP-EUV light source development for high volume manufacturing lithography

2012

SPIE Advanced Lithography 2012

• Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography
• Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography
• Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source
• Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography
• Development of laser-produced plasma based EUV light source technology for HVM EUV lithography < Presentation / Manuscript >
• Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source < Presentation / Manuscript >
• A Reliable Higher Power ArF Laser with Advanced Functionality for Immersion Lithography < Presentation / Manuscript >

2011

2011 International Symposia on Extreme Ultraviolet Lithography and Lithography Extensions

• Performance of Bandwidth Tuning Laser for Focus Drilling
• Development of LPP-EUV source for HVM EUVL
• Investigation on high conversion efficiency and Tin debris mitigation for laser produced plasma EUV light source

 
SPIE Advanced Lithography 2011

• 100W 1st generation Laser-Produced Plasma source system for HVM EUV lithography < Presentation / Manuscript >
• Development of the reliable 20 kW Class Pulsed Carbon Dioxide Laser System for LPP EUV Light Source < Presentation / Manuscript >
• Characterization and Optimization of Tin Particle Mitigation and EUV Conversion Efficiency in a Laser Produced Plasma EUV Light Source < Presentation / Manuscript >
• Ecology and High Durability Injection Locked Laser with Flexible Power for Double patterning ArF Immersion Lithography < Presentation / Manuscript >

2010

EUV Symposium 2010

• 1st generation Laser-Produced Plasma 100W source system for HVM EUV lithography (PDF)
• Investigation on high conversion efficiency and Tin debris mitigation for laser produced plasma EUV light source (PDF)
• Improving efficiency of pulsed CO2 Laser system for LPP EUV light source (PDF)

 
SPIE Advanced Lithography 2010

• 1st generation Laser-Produced Plasma source system for HVM EUV lithography (PDF)
• Present status of laser-produced plasma EUV light source (PDF)
• Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography (PDF)

2009

2009 EUVL Symposium

• Laser-produced plasma source for EUV lithography (PDF)
• Present status of laser-produced plasma EUV light source (PDF)
• Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography (PDF)

 
SPIE Advanced Lithography 2009

• Laser-produced plasma source development for EUV lithography (PDF)
• Evaluation at the intermediate focus for EUV Light Source (PDF)
• Optical performance of laser light source for ArF immersion double patterning lithography tool (PDF)
• Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography (PDF)

2008

SPIE Advanced Lithography 2008

• CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography, SPIE 6921-29 (PDF)
• Magnetic debris mitigation of a CO2 laser-produced Sn plasma, SPIE 6921-113 (PDF)
• Sn droplet target development for laser produced plasma EUV light source, SPIE 6921-114 (PDF)
• LPP EUV light source employing high power CO2 laser, SPIE 6921-115 (PDF)
• Reliable High Power Injection Locked 6 kHz 60W Laser for ArF Immersion Lithography, SPIE 6924-198 (PDF)
• High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography, SPIE 6924-199 (PDF)

2007

SEMATECH EUV Source Workshop 2007

• High Power CO2 Laser, EUVA (PDF)
• Combined NdYAG -CO2 LPP EUV source examination with the Code Z (PDF)
• Evaluation of Xe and Sn droplets as LPP targets (PDF)
• Scaling of short pulse CO2 laser into multi 10kW output power (PDF)
• EUV Source Supplier update, Gigaphoton (PDF)

 
SPIE Advanced Lithography 2007

• Laser Produced EUV Light Source Development for HVM, SPIE 6517-23 (PDF)
• Presentation of Laser Produced EUV Light Source Development for HVM, SPIE 6517-23 (PDF)
• Characterization of Various Sn Targets with Respect to Debris and Fast Ion Generation, SPIE 6517-123 (PDF)
• Small Field Exposure Tool (SFET) Light Source, SPIE 6517-124 (PDF)
• Presentation of Small Field Exposure Tool (SFET) Light Source, SPIE 6517-124 (PDF)
• Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool, SPIE 6520-75 (PDF)
• Presentation of Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool, SPIE 6520-75 (PDF)
• Reliable High Power Injection Locked 6kHz 60W Laser for ArF Immersion Lithography, SPIE 6520-111 (PDF)
• Sn + CO2 Poster, SPIE 6517-122 (PDF)
• Sn Debris Poster, SPIE 6517-123 (PDF)
• GT60A Poster, SPIE 8520-111 (PDF)

2006

• KrF Laser Driven Xenon Plasma Light Source of a Small Field Exposure Tool (PDF)
• High Power Pulsed CO2 Laser for EUV Lithography (PDF)
• High Power Injection Lock Laser Platform for ArF Dry/Wet Lithography (PDF)
• Development of CO2 Laser Produced Xe Plasma EUV Light Source for Microlithography (PDF)
• High Power Injection Lock 6kHz 60W Laser for ArF Dry/Wet Lithography (PDF)

2005

• High power injection lock laser platform for ArF dry/wet lithography (PDF)
• Feasibility Study of a 6kHz ArF excimer laser for 193nm immersion lithography (PDF)

2004

• High durable 4-kHz ArF excimer laser G42A for sub-90-nm lithography, SPIE, 5377(2004), pp 1727-1734 (PDF)
• Beam quality of a new-type MOPO laser system for VUV laser lithography, SPIE, 5377(2004), pp 1772-1780 (PDF)
• Development of high power ArF/F2 laser platform for VUV microlithography, SPIE, 5377(2004), pp 1805-1814 (PDF)

2003

• Spectral dynamics analysis of ultra-line-narrowed F2 laser, SPIE, 5040(2003), pp 1363-1370 (PDF)
• Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography, SPIE, 5040(2003), pp 1704-1711 (PDF)

2002

• Development of a 5 kHz ultra-line-narrowed F2 laser for dioptric projection systems, SPIE, 4691(2002),. pp 652-659 (PDF)
• Spectral metrologies for ultra-line-narrowed F2 laser, SPIE, 4691(2002),. pp 1714-1720 (PDF)

2001

• Spectral measurement of ultra line-narrowed F2 laser SPIE, 4346 (2001), pp 1066-1073 (PDF)
• Long pulse duration of F2 laser for 157nm lithography, SPIE, 4346 (2001) ,pp 1074-1077 (PDF)
• Long run-time performance characteristics of a line-selected 2kHz F2-laser for optical microlithography, SPIE, 4346(2001), pp 1137-1144 (PDF)
• Challenge of the F2 Laser for Dioptric Projection System, SPIE, 4346 (2001), pp 1158-1165 (PDF)
• Ultra-high-repetition-rate ArF excimer laser with long pulse duration?for 193-nm lithography, SPIE, 4346(2001), pp 1210-1218 (PDF)
• Ultra-narrow bandwidth 4-kHz ArF excimer laser for 193-nm lithography, SPIE, 4346(2001), pp 1229-1237 (PDF)
• High-resolution multi grating spectrometer for high quality deep UV light source production, SPIE, 4346 (2001), pp 1254-1261 (PDF)
• Extreme high NA, High throughput scanner compatible 4 kHz KrF excimer laser for DUV lithography, SPIE, 4346(2001), pp 1617-1626 (PDF)

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