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Gigaphoton Provides G450C with Light Source for Development and Demonstration of HVM 450mm Lithography Process2014/02/17 - News
Marking an important step in demonstrating the capability of Gigaphoton’s most advanced high-power GT64A laser for high-volume-production 450mm lithography processes Albany, New York and Oyama, Japan; February 17, 2014 — Gigaphoton Inc., a major lithography light source manufacturer, announced today that the company’s flagship high-power ArF Immersion Laser (GT64A) will be used by the Global [...]
New milestone moves industry closer to production-level LPP EUV light sources Oyama, Japan; February 17, 2014 — Gigaphoton Inc., a major lithography light source manufacturer, announced today that it has achieved 43W output at 100kHz from its second prototype laser-produced plasma (LPP) light source for EUV lithography scanners. The 43W output was achieved at 2.4 [...]
What is EcoPhoton
Gigaphoton has executed programs for reducing cost of operation (CoO) since 2007. Through the development of longer life consumables, gas modules with less refill requirements, and minimization of downtime, we have been able to reduce the overall cost of operation for our customers.