ArF Immersion

ArF Dry

Data Products

事件

其他

專訪

新聞發布

獎項

Oyama, Tochigi; September 29, 2023, Gigaphoton Inc. (Head Office: Oyama, Tochigi; President and CEO: Katsumi Uranaka), a manufacturer of lightsources for semiconductor lithography, exhibits to APCS (Advanced Packaging and Chiplet Summit) 2023, held in Tokyo Big Sight, Tokyo, Japan from Wednesday, December 13 through Friday, December 15, 2023 JST.



Gigaphoton will introduce its advanced ablation processing products, including the latest test results.



We would like to welcome your visit.



<figure class="wp-block-table"><table><tbody><tr><td>Exhibition</td><td>Advanced Packaging and Chiplet Summit 2023</td></tr><tr><td>HP Address</td><td><a href="https://www.semiconjapan.org/en/apcs">https://www.semiconjapan.org/en/apcs</a></td></tr><tr><td>Holding Period</td><td>from December 13 through 15</td></tr><tr><td>Place</td><td>Tokyo Big Sight</td></tr><tr><td>Booth No.</td><td>2748</td></tr></tbody></table></figure>



About GIGAPHOTON



Since it was founded in 2000, GIGAPHOTON has delivered valuable solutions to semiconductor manufacturers throughout the world as a manufacturer of lightsources. In every stage from R&amp;D to manufacture, sales, and maintenance services, GIGAPHOTON is committed to providing world-class support delivered from the perspective of everyday users. For more information, please visit <a href="https://gigaphoton.com/">https://gigaphoton.com/</a>



<figure class="wp-block-table"><table><tbody><tr><td>Media Contact: GIGAPHOTON Inc. Corporate Planning Department Kenji Ohishi Email: <a href="mailto:web_info@gigaphoton.com">web_info@gigaphoton.com</a></td></tr></tbody></table></figure>

Gigaphoton exhibits to Advanced Packaging and Chiplet Summit 2023

It will publish papers at the largest conference on semiconductor lithography technology



Oyama, Tochigi; February 17, 2023, <a href="https://gigaphoton.com/">Gigaphoton Inc.</a> (Head Office: Oyama, Tochigi; President and CEO: Katsumi Uranaka), a manufacturer of lightsources for semiconductor lithography, participates in <a href="https://spie.org/conferences-and-exhibitions/advanced-lithography-and-patterning">SPIE Advanced Lithography + Patterning 2023</a>, held in San Jose, California from Sunday, February 26 through Thursday, March 2, 2023 PST.



Gigaphoton will introduce the latest technology on yield improvement and sustainability solution with DUV lightsources technology. In addition, Gigaphoton will present the progress of research and development on EUV lightsources.



* If you wish to cite the papers in your materials, please contact us.



Oral Presentations:



<figure class="wp-block-table"><table><tbody><tr><td>1) To enhance EPE and availability simultaneously by the leading-edge immersion light source [Paper#: 12494-44]</td></tr><tr><td>2) Plasma dynamics and future of LPP-EUV source for semiconductor manufacturing [Paper#: 12494-45]</td></tr></tbody></table></figure>



Papers:



<figure class="wp-block-table"><table><tbody><tr><td>3) Development progress of key components for LPP-EUV light sources [Paper#: 12494-51]</td></tr><tr><td>4) The development of a machine learning-based excimer laser performance simulator for engineering maintenance decisions [Paper#: 12496-101]</td></tr><tr><td>5) Contributing to sustainability delivers maximizing availability by the latest light source GT66A for the ArF immersion lithography [Paper#: 12494-60]</td></tr></tbody></table></figure>



About GIGAPHOTON



Since it was founded in 2000, GIGAPHOTON has delivered valuable solutions to semiconductor manufacturers throughout the world as a manufacturer of lightsources. In every stage from R&amp;D to manufacture, sales, and maintenance services, GIGAPHOTON is committed to providing world-class support delivered from the perspective of everyday users. For more information, please visit <a href="https://gigaphoton.com/">https://gigaphoton.com/</a>



<figure class="wp-block-table"><table><tbody><tr><td>Media Contact: GIGAPHOTON Inc. Corporate Planning Department Kenji Ohishi Email: <a href="mailto:web_info@gigaphoton.com">web_info@gigaphoton.com</a></td></tr></tbody></table></figure>

Gigaphoton unveils technology solutions at SPIE Advanced Lithography + Patterning 2023

Gigaphoton will present the following papers at the &#8220;<a href="https://spie.org/search?term=gigaphoton&amp;pageSize=25&amp;pagesVisited=1&amp;sortBy=Relevance&amp;eventName=Advanced_Lithography">SPIE Advanced Lithography 2021</a>&#8221; digital forum, to be held on February 22 (Sun.) through 26 (Thu.) 2021.
This conference is one of the largest event of advanced lithography for semiconductor manufacturing.
Gigaphoton presents following 8 papers discussing advanced lightsource technology which improves yield and availability for semiconductor manufacturing.
 
<ul>
<li>Oral Presentation</li>
</ul>
February 25, 2021 • 10:50 AM PST | Session 11: EUV Source [Extreme Ultraviolet (EUV) Lithography XII] 
Update of &gt;300W High Power LPP-EUV Source Challenge III for Semiconductor HVM                 
Author: Hakaru Mizoguchi; Gigaphoton Inc. (Japan) 
[Paper#: 11609-48]
February 24, 2021 • 9:40 AM PST | Session 4: Lithography Equipment and New Applications [Optical Lithography XXXIV] 
Latest ArF light source with speckle reduction technology for immersion lithography improving chip yield               
Author: Hirotaka Miyamoto; Gigaphoton Inc. (Japan) 
[Paper#: 11613-11]
February 25, 2021 • 8:50 AM PST | Session 8: Novel Optical and ebeam/ion [Novel Patterning Technologies 2021] 
Processability of organic material for semiconductor packaging by 248 nm excimer laser               
Author: Akira Suwa; Gigaphoton Inc. (Japan) 
[Paper#: 11610-27]
<ul>
<li>Poster Presentation</li>
</ul>
February 24, 2021 • 5:30 PM PST | Poster Session [Optical Lithography XXXIV] 
ArF lightsource “GT66A” for next-generation immersion lithography enhancing EPE and CD performance                
Author: Tommy Oga; Gigaphoton Inc. (Japan) 
[Paper#: 11613-30]
February 24, 2021 • 5:30 PM PST | Poster Session [Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV] 
Study of further CD and OL performance improvement by introducing new E95% spectral bandwidth and Wavelength functionality for ArFi lithography lightsource              
Author: Tommy Oga; Gigaphoton Inc. (Japan) 
[Paper#: 11611-92]
February 24, 2021 • 5:30 PM PST | Poster Session [Optical Lithography XXXIV] 
Advanced spectral engineering: A new way of process aware laser spectra optimization for optical lithography   
Author: Koichi Fujii; Gigaphoton Inc. (Japan) 
[Paper#: 11613-33]
February 24, 2021 • 5:30 PM PST | Poster Session [Optical Lithography XXXIV] 
Lithocell availability improvement through light source maintenance cycle improvement and optimization and its availability impact analysis for cutting-edge ArFi Light source         
Author: Takehiko Tomonaga; Gigaphoton Inc. (Japan) 
[Paper#: 11613-29]
February 24, 2021 • 5:30 PM PST | Poster Session [Extreme Ultraviolet (EUV) Lithography XII] 
The development progress of the High Power LPP-EUV light source using a magnetic field 
Author: Hirokazu Hosoda; Gigaphoton Inc. (Japan) 
[Paper#: 11609-52]

NewsNews

Gigaphoton exhibits to Advanced Packaging and Chiplet Summit 2023

Gigaphoton unveils technology solutions at SPIE Advanced Lithography + Patterning 2023

Technical Papers in SPIE Advanced Lithography 2021