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We do not observe any damage or impact on employees’ lives, buildings, production facilities, customer support, etc. due to the Earthquake off the coast of Fukushima on March 16th.



I would like to express my heartfelt sympathy to the affected people due to the earthquake that occurred at 23:36 JPT on March 16th off the coast of Fukushima as an epicenter.



As of today, we have confirmed that all Gigaphoton employees and facilities in Oyama, Hiratsuka, and other locations in Japan are unharmed. And we have also confirmed that it has not affected on our production facilities..



<ol class="wp-block-list"><li>Overview We had started checking the safety of our buildings and facilities since the morning of the 17th, and we have confirmed that there is no damage that would affect our business activities.</li><li>Details ・No damage has been observed on our production facilities. We resumed production activities&nbsp; &nbsp; &nbsp;since 9:00 JPT on March 17th. ・Our customer support capabilities are unaffected. ・We are currently investigating the impact on our supply chain.</li></ol>



GIGAPHOTON Inc President Katsumi Uranaka



<figure class="wp-block-table"><table><tbody><tr><td>Media contact: GIGAPHOTON Inc Corporate Planning Division E-mail: web_info@gigaphoton.com</td></tr></tbody></table></figure>

Impact of the Earthquakes off the coast of Fukushima upon GIGAPHOTON’s Business

在IC封裝技術研究上，採用提供加工用途的準分子雷射裝置「G300K」


<div class="wp-block-image">
<figure class="aligncenter size-large is-resized"><img loading="lazy" decoding="async" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/04/20220210-01-1024x768.jpg" alt="" class="wp-image-7952" width="512" height="384" srcset="https://webapi.gigaphoton.global/wp-content/uploads/2022/04/20220210-01-1024x768.jpg 1024w, https://webapi.gigaphoton.global/wp-content/uploads/2022/04/20220210-01-300x225.jpg 300w, https://webapi.gigaphoton.global/wp-content/uploads/2022/04/20220210-01-768x576.jpg 768w, https://webapi.gigaphoton.global/wp-content/uploads/2022/04/20220210-01-1536x1152.jpg 1536w, https://webapi.gigaphoton.global/wp-content/uploads/2022/04/20220210-01-2048x1536.jpg 2048w" sizes="auto, (max-width: 512px) 100vw, 512px" /></figure></div>


栃木縣小山市；2022年2月16日，半導體微影光源製造商<a href="https://www.gigaphoton.com/ct/">Gigaphoton株式會社（</a>總公司：栃木縣小山市；總裁：浦中克己）宣布，專為加工用途的KrF準分子雷射裝置「G300K」，已獲得台灣國家實驗研究院專案所採用，並已於12/27完成機台導入國立成功大學的作業。



台灣國家實驗研究院 (NARLabos) 籌劃機構之國立成功大學正投入運用準分子雷射裝置，研究IC封裝技術的相關專案。以精細燒蝕加工為首的「優化加工」概念所開發的Gigaphoton KrF雷射光源裝置「G300K」，評估最適合這項研究，因而獲得本專案採用。



Gigaphoton總裁兼CEO浦中克己表示：「在半導體微影以外領域上發展的GIGANEX系列G300K，是以實現Gigaphoton長年培育的99％以上高運轉率、高輸出的微影光源技術為基礎下所開發而成，因此確信可為本次的專案做出貢獻。可為廣泛領域的客戶提供解決方案的GIGANEX系列，今後可望將運用於全新應用領域，為次世代的產業界發展做出貢獻。」



<a href="/products/7677" target="_blank" rel="noreferrer noopener">產品 G300K</a>



Gigaphoton公司簡介 Gigaphoton作為開發和生產半導體微影DUV光源先驅企業，從成立初期便對全球半導體製造商，提供運用最尖端技術的多項解決方案。此外，也積極投入開發EUV光源及微影以外領域的DUV光源。Gigaphoton從產品研發到生產、銷售及維護始終站在用戶立場，以具備豐富知識與經驗的專業集團之姿，為用戶提供業界最高水準的支援。 詳細資訊請參閱網站<a href="https://www.gigaphoton.com/ct/">www.gigaphoton.com</a>



<figure class="wp-block-table"><table><tbody><tr><td>新聞公關聯絡窗口: GIGAPHOTON 經營企畫部 Email: <a href="mailto:web_info@gigaphoton.com">web_info@gigaphoton.com</a></td></tr></tbody></table></figure>

Gigaphoton向台灣國立研究機構交付KrF準分子雷射裝置

<h5 class="wp-block-heading">Gigaphoton survey reveals important data that can unleash intelligence for the semiconductor industry</h5>



January 7, 2022



OYAMA, Japan – January 7, 2022 – Gigaphoton Inc., (Head Office: Oyama, Tochigi; President and CEO: Katsumi Uranaka), a manufacturer of light sources used in semiconductor lithography, today released the results of a survey that provides insights into the current state of the semiconductor manufacturing industry. The results reveal significant gaps in semiconductor manufacturing analytics capabilities that could help solve the semiconductor shortage and unleash intelligence for the global semiconductor industry.



The Gigaphoton survey reveals unmet analytics needs that offer a roadmap to what the semiconductor industry must do to meet growing demand and help solve the chip shortage. Shrinking chip sizes and advancing technology are challenging the ability of semiconductor manufacturers to sustain uptime and yield. At the same time, worldwide demand is increasing, and shortages throughout the supply chain have forced semiconductor manufacturers to focus their attention on using analytics to gain efficiencies with their equipment and processes.



“As semiconductor manufacturing processes have become more complex, we’ve seen an increase in customer requests for more advanced intelligence into our tools, and each customer needs something unique. Since COVID, we believe these requests will be compounded further as semiconductor manufacturers scale up their chip production,” said Yuji Minegishi, General Manager at Gigaphoton.



As manufacturing processes continue to require greater precision, it has been challenging for chip manufacturers to achieve the depth and breadth of intelligence they need to increase or even sustain uptime. Currently, intelligence is siloed among proprietary analytics solutions developed by tool manufacturers and third-party analytics platforms. This creates barriers to usability which are becoming more problematic as processes become more complex.



Gigaphoton conducted a survey with 276 responses from semiconductor manufacturing respondents in all aspects of the manufacturing process. The survey showed that 73% of chip manufacturers must piece together multiple equipment analytics solutions. Despite all the solutions they use and the large investments they make on software, most still don’t have the efficient advanced analytics capabilities they need to increase uptime and output.



“The survey results reveal a significant gap in semiconductor manufacturing analytics capabilities that can’t really be filled by a single software vendor. This is a global semiconductor industry problem that will need an industry-wide solution,” said Mario Faria, Vice President and Partner, Americas at the MAX Group.



“This study has helped us uncover the industry’s critical need for more advanced and intelligent analytics capabilities,” said Katsumi Uranaka, President and CEO of Gigaphoton. “We are committed to providing state of the art advanced platforms and solutions to help our customers increase productivity and output.”



Download the full report from <a href="https://fabscape.net/survey">https://fabscape.net/survey</a> to learn more.







<figure class="wp-block-table is-style-regular"><table><tbody><tr><td>About Gigaphoton Since it was founded in 2000, Gigaphoton has delivered valuable solutions to semiconductor manufacturers throughout the world as a manufacturer of light sources and equipment analytics software. In every stage from R&amp;D to manufacture, sales, and maintenance services, Gigaphoton is committed to providing world-class support delivered from the perspective of everyday users. For more information about Gigaphoton, visit <a href="https://www.gigaphoton.com/">https://www.gigaphoton.com</a>. For information about Fabscape, a secure, open equipment monitoring and analytics platform developed by Gigaphoton, visit <a href="https://www.fabscape.net">https://www.fabscape.net</a>. Media Contact: Gigaphoton Inc. <meta charset="utf-8"></meta>E-mail web_info@gigaphoton.com or visit <a href="https://fabscape.net/contact">https://fabscape.net/contact</a></td></tr></tbody></table></figure>

Semiconductor Manufacturing Survey Reveals Insights to End Chip Shortage

透過支援半導體需求驟增的最新技術提升產能



2021年10月26日



栃木縣小山市：2021年10月26日，半導體微影光源製造商<a href="https://www.gigaphoton.com/ct/">Gigaphoton株式會社</a>（總公司：栃木縣小山市；總裁：浦中克己）宣布，最尖端的ArF濕浸式微影光源「GT66A」已在世界半導體廠正式運作中。



近年來，全球急速增加的電子產品和雲端設備需求趨勢下，用於這些產品和設備的半導體需求也在激增。再者，由於DX逐步深入到企業，以及為了邁向碳中和社會的EV增產和轉換為可再生能源等，半導體在社會基礎設施中扮演樞紐的角色，因此更進一步帶動半導體的需求。特別是自動駕駛和高性能伺服器 ，這種同時具備高速運算和低耗電的高端設備需求的成長，更加速了半導體的需求。



GT66A是支援這種高端設備專用半導體所需5nm節點，以及生產新世代節點的機種。



此外，GT66A透過降低 (30%) 光斑對比值，以減少佈線和光阻劑曝光圖樣偏離的 EPE。可望藉此抑制顯示壁面微細圖樣凹凸尺寸的LER，以及顯示因凹凸產生圖樣寬幅偏差的LWR，以提升成品率 (yield)。再加上導入高耐久性零組件，將維修週期延長30%，以提升裝置可用性，並可實現超高產能。



Gigaphoton總裁兼CEO浦中克己表示：「GT66A以穩定生產最尖端半導體及高成品率為指標，特別鎖定提升最尖端製程節點產能之下投入市場。Gigaphoton往後也將繼續透過活動，以利求整體半導體廠的產能最大化。」



Gigaphoton公司簡介 作為開發和生產微影DUV光源先驅企業的Gigaphoton，從成立初期便對全球半導體製造商，提供運用最尖端技術的多項解決方案。此外，也積極投入於開發EUV光源。作為具備豐富知識的專業集團，始終站在用戶立場的Gigaphoton，將繼續從產品研發到生產、銷售及維護，為用戶提供業界最高水準的支援。 更多詳細介紹請參閱<a href="https://www.gigaphoton.com/ct/">https://www.gigaphoton.com/ct/</a>



新聞公關聯絡窗口: GIGAPHOTON 經營企畫部 Email: <a href="mailto:web_info@gigaphoton.com">web_info@gigaphoton.com</a>

正式運作最尖端ArF濕浸式微影光源「GT66A」

<h5 class="wp-block-heading">以高出以往2倍的產能因應大幅成長的市場需求</h5>



2021年9月15日



栃木縣小山市；2021年9月15日、半導體微影光源製造商<a href="https://gigaphoton.com">Gigaphoton Inc.</a>（總公司：栃木縣小山市、總裁：浦中克己）宣佈，準分子雷射光源的產能，將在2023年之前提高為以往的2倍。



近年來，因全球半導體需求大幅成長，各國主要半導體製造商紛紛加速投資半導體生產設備。半導體微影光源製造商Gigaphoton Inc.也預測，市場需求增加，今後穩健的需求仍將持續。



為了建構更穩定的供應體制以因應市場的需求，Gigaphoton正在建造的新辦公大樓將於2022年4月落成，屆時可望全力運用生產設備及達成製程效率和最佳化，同時將產能提升2倍。



Gigaphoton總裁兼CEO浦中克己表示：「在全球居高不下的半導體需求當中，本公司也將致力於全力回應客戶的需求。今年度，我們除了充分利用現有資源全力投入生產的同時，也提高生產計畫和前置時間 (lead time)。明年新辦公大樓落成時，將可望建立更穩定的供應體制。身為半導體製造所不可或缺的微影光源製造商，往後也將繼續擔負起責任，透過供應產品及支援運作，為產業界做出貢獻。」



關於GIGAPHOTON



2000年成立以來，GIGAPHOTON作為雷射光源製造供應商，不斷提供具有價值且高度整合方案給全球半導體廠商。GIGAPHOTON從研究開發以至製造・銷售・保修服務的所有環節，將承諾秉持著客戶導向的精神，堅持業界最高水準的技術服務持續邁進。詳細資訊請參閱網站<a href="https://www.gigaphoton.com/ct/">https://www.gigaphoton.com/ct/</a>。



新聞公關聯絡窗口:



GIGAPHOTON



經營企畫部











Email: <a href="mailto:web_info@gigaphoton.com">web_info@gigaphoton.com</a>

Gigaphoton加強準分子雷射光源產能

Gigaphoton has been selected by the Ministry of Economy, Trade and Industry (METI) as as one of the assignee for the project &#8220;Research and Development of Enhanced Infrastructures for Post 5G Information and Communications Systems&#8221; and was introduced on the Ministry&#8217;s website.
Please take a look.
Gigaphoton&#8217;s development themes are listed in the following ” 3. Adoption results “
(two PDF files).
<a href="https://www.meti.go.jp/english/press/2021/0616_001.html">Click here for the link.</a>

Gigaphoton has been selected by METI asone of the assignee for the project “Research and Development of Enhanced Infrastructures for Post 5G Information and Communications Systems”.

Gigaphoton has won The Best Supplier in WFE Subsystems Award from VLSI Research, Inc. and has been introduced on their website.
Please take a look.
<a href="https://www.vlsiresearch.com/gigaphoton-honored-with-first-the-best-award-PFEL1SE1000WJOJ#page1">Click here for the link.</a>

Gigaphoton has won The Best Supplier in WFE Subsystems Award from VLSI Research, Inc.

Gigaphoton will present the following papers at the &#8220;<a href="https://spie.org/search?term=gigaphoton&amp;pageSize=25&amp;pagesVisited=1&amp;sortBy=Relevance&amp;eventName=Advanced_Lithography">SPIE Advanced Lithography 2021</a>&#8221; digital forum, to be held on February 22 (Sun.) through 26 (Thu.) 2021.
This conference is one of the largest event of advanced lithography for semiconductor manufacturing.
Gigaphoton presents following 8 papers discussing advanced lightsource technology which improves yield and availability for semiconductor manufacturing.
 
<ul>
<li>Oral Presentation</li>
</ul>
February 25, 2021 • 10:50 AM PST | Session 11: EUV Source [Extreme Ultraviolet (EUV) Lithography XII] 
Update of &gt;300W High Power LPP-EUV Source Challenge III for Semiconductor HVM                 
Author: Hakaru Mizoguchi; Gigaphoton Inc. (Japan) 
[Paper#: 11609-48]
February 24, 2021 • 9:40 AM PST | Session 4: Lithography Equipment and New Applications [Optical Lithography XXXIV] 
Latest ArF light source with speckle reduction technology for immersion lithography improving chip yield               
Author: Hirotaka Miyamoto; Gigaphoton Inc. (Japan) 
[Paper#: 11613-11]
February 25, 2021 • 8:50 AM PST | Session 8: Novel Optical and ebeam/ion [Novel Patterning Technologies 2021] 
Processability of organic material for semiconductor packaging by 248 nm excimer laser               
Author: Akira Suwa; Gigaphoton Inc. (Japan) 
[Paper#: 11610-27]
<ul>
<li>Poster Presentation</li>
</ul>
February 24, 2021 • 5:30 PM PST | Poster Session [Optical Lithography XXXIV] 
ArF lightsource “GT66A” for next-generation immersion lithography enhancing EPE and CD performance                
Author: Tommy Oga; Gigaphoton Inc. (Japan) 
[Paper#: 11613-30]
February 24, 2021 • 5:30 PM PST | Poster Session [Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV] 
Study of further CD and OL performance improvement by introducing new E95% spectral bandwidth and Wavelength functionality for ArFi lithography lightsource              
Author: Tommy Oga; Gigaphoton Inc. (Japan) 
[Paper#: 11611-92]
February 24, 2021 • 5:30 PM PST | Poster Session [Optical Lithography XXXIV] 
Advanced spectral engineering: A new way of process aware laser spectra optimization for optical lithography   
Author: Koichi Fujii; Gigaphoton Inc. (Japan) 
[Paper#: 11613-33]
February 24, 2021 • 5:30 PM PST | Poster Session [Optical Lithography XXXIV] 
Lithocell availability improvement through light source maintenance cycle improvement and optimization and its availability impact analysis for cutting-edge ArFi Light source         
Author: Takehiko Tomonaga; Gigaphoton Inc. (Japan) 
[Paper#: 11613-29]
February 24, 2021 • 5:30 PM PST | Poster Session [Extreme Ultraviolet (EUV) Lithography XII] 
The development progress of the High Power LPP-EUV light source using a magnetic field 
Author: Hirokazu Hosoda; Gigaphoton Inc. (Japan) 
[Paper#: 11609-52]

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