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Gigaphoton will present the following paper at the “SPIE Advanced Lithography 2020”, to be held on February 23 (Sun.) through 27 (Thu.), 2020, at the San Jose Convention Center in San Jose, California, USA.
- Oral Presentation, Wednesday 26 February
Time Schedule: 10:50 – 11:10 AM (Conference 11323, Session 8)
Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM
Author: Hakaru Mizoguchi*, Tatsuya Yanagida, Hiroaki Nakarai, Gouta Niimi, Takashi Saitou, Tsuyoshi Yamada, Yasutsugu Usami, Toshihiro Oga; Gigaphoton Inc. (Japan)
[Paper#: 11323-30]
Time Schedule: 9:40 – 10:00 AM (Conference 11327, Session 4)
Next generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes
Author(s): Toshihiro Oga*, Taku Yamazaki, Hiroaki Tsushima, Takeshi Ohta, Satoru Bushida; Gigaphoton Inc. (Japan)
[Paper#: 11327-18]
- Poster Session, Wednesday 26 February, 17:30 PM – 19:30 PM
Update of development progress of the High Power LPP-EUV light source using a magnetic field
Author(s): Gouta Niimi*, Shinji Nagai, Tsukasa Hori, Yoshifumi Ueno, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito and Hakaru Mizoguchi; Gigaphoton Inc. (Japan)
[Paper#: 11323-75]
Advanced E95 spectral engineering: performance of high repetition excimer laser measured with high accurate spectrometer
Author(s): Koichi Fujii*, Takahito Kumazaki, Masakazu Hattori, Yosuke Fujimaki, Toshihiro Oga, Junichi Fujimoto, Hakaru Mizoguchi; Gigaphoton Inc. (Japan)
[Paper#: 11327-34]
Approach for lightsource utilization improvement by extending Preventive Maintenance (PM) cycle along with performance monitoring feature
Author(s): Futoshi Sato*, Taku Yamazaki, Toshihiro Oga, Sophia Hu; Gigaphoton Inc. (Japan)
[Paper#: 11327-35]
Imaging performance enhancement by improvements of spectral performance stability and controllability on the cutting-edge “GT66A” ArF-i lightsource
Author(s): Miwa Igarashi*, Hirotaka Miyamoto, Masahide Katou, Hiroaki Tsushima, Masato Moriya, Akihiko Kurosu, Hiroshi Tanaka, Satoshi Tanaka, Takeshi Ohta, Satoru Bushida, Takashi Saitou, Hakaru Mizoguchi; Gigaphoton Inc. (Japan)
[Paper#: 11327-39]
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ギガフォトンは、SPIE Advanced Lithography 2020においてプライベートランチセミナーを開催致します。（日程:2月27日(木)、場所:米サンノゼ・ヒルトンホテル）
尚、2月23日(日)～2月27日(木)に開催されるSPIE Advanced Lithography 2020（会場: 米サンノゼ・コンベンションセンター）で次の論文発表を行います：）
- プレゼンテーション発表 2月26日（水）
Time Schedule: 10:50 – 11:10 AM (Conference 11323, Session 8)
Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM
Author: Hakaru Mizoguchi*, Tatsuya Yanagida, Hiroaki Nakarai, Gouta Niimi, Takashi Saitou, Tsuyoshi Yamada, Yasutsugu Usami, Toshihiro Oga; Gigaphoton Inc. (Japan)
[Paper#: 11323-30]
Time Schedule: 9:40 – 10:00 AM (Conference 11327, Session 4)
Next generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes
Author(s): Toshihiro Oga*, Taku Yamazaki, Hiroaki Tsushima, Takeshi Ohta, Satoru Bushida; Gigaphoton Inc. (Japan)
[Paper#: 11327-18]
- ポスター発表 2月26日（水） 5:30 PM – 7:30 PM
Update of development progress of the High Power LPP-EUV light source using a magnetic field
Author(s): Gouta Niimi*, Shinji Nagai, Tsukasa Hori, Yoshifumi Ueno, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito and Hakaru Mizoguchi; Gigaphoton Inc. (Japan)
[Paper#: 11323-75]
Advanced E95 spectral engineering: performance of high repetition excimer laser measured with high accurate spectrometer
Author(s): Koichi Fujii*, Takahito Kumazaki, Masakazu Hattori, Yosuke Fujimaki, Toshihiro Oga, Junichi Fujimoto, Hakaru Mizoguchi; Gigaphoton Inc. (Japan)
[Paper#: 11327-34]
Approach for lightsource utilization improvement by extending Preventive Maintenance (PM) cycle along with performance monitoring feature
Author(s): Futoshi Sato*, Taku Yamazaki, Toshihiro Oga, Sophia Hu; Gigaphoton Inc. (Japan)
[Paper#: 11327-35]
Imaging performance enhancement by improvements of spectral performance stability and controllability on the cutting-edge “GT66A” ArF-i lightsource
Author(s): Miwa Igarashi*, Hirotaka Miyamoto, Masahide Katou, Hiroaki Tsushima, Masato Moriya, Akihiko Kurosu, Hiroshi Tanaka, Satoshi Tanaka, Takeshi Ohta, Satoru Bushida, Takashi Saitou, Hakaru Mizoguchi; Gigaphoton Inc. (Japan)
[Paper#: 11327-39]
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