Gigaphoton wins Excellence Award at The Laser Society Industry Awards

May 24, 2019

Received the prize for the second time after ten years.
The evolution and development of R&D and practical application of the ArF excimer laser were highly evaluated.

Gigaphoton received the Excellence Award at the 11th Laser Society Industry Awards 2019 on April 1, 2019, for its “R&D and practical application of the ArF Immersion Lithography Laser GT6XA Series and optional units.” CTO Mizoguchi and four other directors of the laser development department attended the award ceremony held at Pacifico Yokohama Exhibition Hall on April 25. This is the second time to win the award after the first one at the 1st Laser Society Industry Awards in 2009.

The Laser Society Industry Awards are sponsored by The Laser Society of Japan. The Excellence Award, Encouragement Award, and Contribution Award are given to those who have made a significant contribution to the growth of domestic laser-related industries in developing, commercializing, and spreading products and technologies related to lasers. We are proud to announce that Gigaphoton won the highest prize, the Excellence Award. The product that won the award, namely the ArF Immersion Lithography Laser GT6XA Series and optional units, is the platform of the Injection-Lock ArF Excimer Laser GT62A which previously won the award, and has enabled the rapid progress and growth of our technologies over the last ten years. These technologies have been widely accepted by clients and industry, and we have captured a large market share. These facts were also highly evaluated by the Society and led to the prize.

Vice President & CTO, Hakaru Mizoguchi, commented as follows.
“Gigaphoton’s Injection-Lock ArF Excimer Laser was successfully commercialized in 2005 and broadly accepted in the market thanks to the GT62A which previously won the award. After receiving the prize, we successively improved the model of the GT series up to GT65A by 2018. Today, these products are used 24/7/365 as an essential main light source for cutting-edge lithography processes in semiconductor factories all over the world. Optional modules reflecting the needs of users are also widely popular.
I am delighted to receive this award because it reflects the popularity of the Semiconductor Lithography ArF Excimer Laser we developed and commercialized owing to its contribution to industry as a pioneer and our continuous efforts and progress in developing the GT series over the last decade.
I would like to take this opportunity to thank everyone from The Laser Society of Japan, the Ministry of Economy, Trade and Industry (METI), and NEDO, as well as the personnel of Gigaphoton who have worked hard on the business, for their support. We look forward to contributing to global growth and industrial techniques by researching and developing innovative, revolutionary technologies, and excimer lasers in particular.”

At the award ceremony (from left): Executive officer Mr. Fujimoto, Vice president Mr. Mizoguchi, Executive officers Mr. Matsunaga and Mr. Bushida


Commemorative photo at the ceremony