ArF Immersion

ArF Dry

High Power KrF for Laser Processing

High Power KrF

Versatile Tool Monitoring and Analysis System

Data Products


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/GT66A_500.png" alt="GT66A" class="wp-image-7586" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT66A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT66A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT66A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2 class="has-text-align-center" id="an-immersion-lithography-light-source-that-meets-more-stringent-technological-demands">An Immersion Lithography Light Source That Meets More Stringent Technological Demands</h2>



<p>In the manufacturing of state-of-the-art devices, Moore&#8217;s Law continues today with the size of technology nodes getting smaller and smaller. Said state-of-the-art devices must meet requirements for lithography patterns transferred to wafers, especially EPE (Edge Placement Error). As a light source, by reducing CD LER/LWR (Line Edge Roughness/Line Width Roughness), which directly affects EPE, the GT66A provides improved yield at mass production sites.<br><br>The new immersion lithography light source, the GT66A, has succeeded in reducing speckle contrast by 30% and LER/LWR with a newly developed optical module. We have also extended the module maintenance cycle by 30% by introducing the latest high durability components. This further improves the process yield and improves the availability of the light source, aiding high productivity in the mass production of state-of-the-art nodes.</p>



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<h2 id="key-features">Key Features</h2>



<h3 id="improved-yield-with-state-of-the-art-nodes">Improved yield with state-of-the-art nodes</h3>



<p>Improved LER and LWR thanks to the newly developed optical module that reduces speckle contrast by 30%. This provides further yield improvements in the mass production of state-of-the-art lithography nodes.</p>



<h3 id="high-level-of-availability">High level of availability</h3>



<p>We have extended the module maintenance cycle by 30% by introducing the latest high durability components. This achieves a high level of availability to contribute to improved productivity.</p>



<h3 id="providing-sustainability-solutions">Providing sustainability solutions</h3>



<p>Equipped with helium-free technology as standard, the GT66A is an environmentally friendly light source that mitigates the risk of a supply shortage of rare gas and also uses technology to reduce the energy consumption of utilities.</p>
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<h2 id="general-specifications">General Specifications</h2>



<figure class="wp-block-table is-style-regular"><table><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Output</td><td>60 &#8211; 90 W</td></tr><tr><td>Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>Spectral width<br>(95% integral energy &#8211; E95)</td><td>300 +/- 1.5 fm wafer average</td></tr><tr><td>Features</td><td>A solution to reduce EPE<br>CRI (Continuous Reliability Improvement) Package<br>Sustainable Solution</td></tr></tbody></table><figcaption>(*) specifications are representative values</figcaption></figure>
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GT66A


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/GT65A_500.png" alt="GT65A" class="wp-image-7585"/></figure></div>



<h2>An ArF Excimer Laser that Contributes to Productivity Improvements, for Immersion Exposure Devices Intended for Sub-10nm Nodes.</h2>



<p>GT65A, the seventh generation of platforms using the injection lock method, is installed with leading-edge technology and achieves further improved productivity (wafer output) for the customer through “exposure performance improvements” due to changeable spectral width (E95) and improved stability, “high availability” due to extended module lifespan and “reduced environmental load” as it is helium free.</p>



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<h3>Key Features</h3>



<h4>Changeable spectral width (E95)</h4>



<p>The spectral width can be modified in order to suit various customer requirements and uses. For example, the spectral width can compensate for contrast performance variations in different generations of exposure devices. Also, it is possible to match OPC characteristics between equipment or between masks due to the changeable spectral width functionality*<sup>1</sup><br>*1) This functionality varies according to the connected exposure device.</p>



<h4>Improved spectral width (E95) stability</h4>



<p>The spectral width control speed has been successfully increased to 20 times that of previous equipment. This ensures that the spectral width is more stable during equipment operation and allows for a reduction in critical dimension errors.</p>



<h4>Extended module lifespan</h4>



<p>By extending the main module lifespan, the maintenance frequency has been decreased even further. This makes it possible to operate the equipment for extended periods of time.</p>



<h4>Helium free</h4>



<p>Technology that uses zero helium for ArF excimer laser operation is installed. This contributes to a reduction in customer costs and a reduced environmental load.</p>
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<h3>General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Power</td><td>≥60 W</td></tr><tr><td>Pulse Energy</td><td>10.0 &#8211; 20.0 mJ</td></tr><tr><td>Max Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>Bandwidth (E95)</td><td>0.20 – 0.45 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value.</figcaption></figure>
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GT65A


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/GT64A_500.png" alt="GT64A" class="wp-image-7593" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT64A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT64A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT64A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2>State of the Art ArF Immersion Excimer Laser Supporting 450mm Wafer Multi-patterning Lithography</h2>



<p>The GT64A offers the industry&#8217;s highest output power of 120W with &nbsp;high beam performance and stability. &nbsp;With design emphasis on performance, efficiency, and reduction of environmental impact, the product challenges the limits of total operational cost efficiency. &nbsp; This is the 6th generation of products to inherit Gigaphoton&#8217;s timeless Injection Lock (TM) technology.</p>



<p>Based on the GT platform&#8217;s renowned Twin Chamber Architecture, Output Control Algorithm, Beam Alignment Technologies, the GT64A delivers a power output of 120W, exceptional beam performance and stability, and the industry&#8217;s top class reliability, recovery time, and module life.</p>



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<h3>Key Features</h3>



<h4>Insustry&#8217;s Highest Level of Efficiency and Output Power</h4>



<p>Based on the industry&#8217;s highest level lasing efficiency achieved through the Injection Lock (TM) technology, the GT64A promises to deliver the necessary power (120W) for achieving high throughput on 450mm wafer multi-patterning lithography.</p>



<h4>Auto-Adjustable Output</h4>



<p>The GT64A is capable of auto-adjusting the output power to meet the specific requirements of each customers&#8217; processes. &nbsp;Furthermore, this feature also prevent generation of needless light, thus contributing to the reduction of the operational cost and environmental impact.</p>



<h4>High Laser Beam Stability</h4>



<p>High overlay accuracy, CD control, and reduction of line-edge roughness are extremely important for multi-patterning lithography. &nbsp;In order to address these requirements, the GT64A offers wide pulse widths and high energy, spectrum, and beam shape stability for all power levels.</p>



<h4>Low Environmental Impact</h4>



<p>One of the product&#8217;s key design concept was the reduction of environmental impact. &nbsp;Because of this, the product is able to reduce the overall electricity, gas, and cooling costs to its limits, resulting in a reduction of total operational cost and impact to the environment.</p>
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<h3>General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Power</td><td>60 &#8211; 120 W</td></tr><tr><td>Pulse Energy</td><td>10.0 &#8211; 20.0 mJ</td></tr><tr><td>Max Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>E95 Bandwidth &nbsp;</td><td>0.25 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value.</figcaption></figure>
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GT64A


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/GT63A_500.png" alt="GT63A" class="wp-image-7583" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT63A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT63A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT63A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2>Next-Generation ArF Excimer Laser, Model GT63A: Designed for Multi-Patterning Immersion Lithography Scanners</h2>



<p>The GT63A, the latest model of the GT series, is a fifth-generation model featuring the same injection-locking platform.<br>The GT63A is mounted with the four “s” series functions designed in response to customers’ needs to create additional value: sMPL (Spectrum Multi-Positioning LNM)*1, the first customer-approved spectrum control (“focus drilling”) technology to achieve a wider depth of focus; sGRYCOS (Sixty Gigaphoton Recycled Chamber Operation System), a unique chamber technology that lowers operating costs; sTGM (Supreme Total Gas Manager), a gas management system that achieves higher uptime while using less process gas; and sMONITORING (Smart Monitoring), real-time information management tracking of the highest laser stability in the market.<br><br>The GT series has been widely accepted by our major customers; it is renowned worldwide for its design concept and high reliability.<br><br>The GT63A is designed on the same platform as the previous GT series models so as to use as many common components as possible, thus ensuring high reliability immediately after introduction to customers’ sites</p>



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<h3>GT63A Main Features &#8211;&nbsp;Four “s” Series Functions</h3>



<h4>sMPL</h4>



<p>The sMPL technology for focus drilling increases laser spectrum control width to a level 10 times that of conventional technology, thus creating a greater depth of focus. Focus drilling enables expansion of the lithography process window for contact holes, trenches and vias that is not possible with conventional technology, while avoiding negative effects on critical dimension uniformity (CDU), overlay and productivity. The sMPL technology was tested in a high-volume manufacturing environment in partnership with a leading scanner manufacturer and device manufacturer.</p>



<h4>sGRYCOS</h4>



<p>The enhanced sGRYCOS technology extends the effective life of a laser chamber — one of the main consumable components of an excimer laser — to 1.5 times longer than any conventional chamber today, offering world-class endurance that significantly reduces factory operating costs. This durability results from increasing the strength of the pre-ionization &nbsp;in a newly developed chamber and uses a robust pulse-power supply for today’s and tomorrow’s power requirements.</p>



<h4>sTGM</h4>



<p>The sTGM technology implements an innovative wavelength calibration method to eliminate the previous need to routinely replace the laser chamber’s gas. This new industry standard completely eliminates wasted process gases based on calibration requirements, thereby measurably reducing facility costs and improving laser availability on an annual basis. This unique gas management technology allows for system calibration of laser wavelength “as-is” without replacement of the laser chamber’s gas, a first-of-its-kind capability.</p>



<h4>sMONITORING</h4>



<p>The sMONITORING technology, an extension of existing real-time monitoring of laser performance, can be connected with the end-user’s FDC (Fault Detection and Classification) system to monitor system operation. It is a final check on highly stable laser output to the scanner and on-wafer performance.</p>
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<h3>Main Specifications</h3>



<figure class="wp-block-table is-style-regular"><table><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Output</td><td>60/90 W</td></tr><tr><td>Pulse Energy</td><td>10.0/15.0 mJ</td></tr><tr><td>Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>Bandwidth (E95)</td><td>0.3 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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GT63A


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/05/GT62A_500.png" alt="GT62A" class="wp-image-8005" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/05/GT62A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/05/GT62A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/05/GT62A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2>6-kHz Excimer Laser, Model GT62A: Designed for Double-Patterning Immersion Lithography Tools, Delivers World&#8217;s Highest Output (90 Watts)</h2>



<p>The GT62A, the latest model of the GT series, is the fourth-generation model featuring the same injection-locking platform; it delivers the world’s highest output, 90 watts, to support double-patterning immersion lithography*. In order to meet a variety of customer needs, a 60-W version of the GT62A also is available to ensure maximum return on investment. In addition, the GT62A incorporates technologies that enable longer life of the laser chamber and optics so as to minimize downtime in support of the most advanced processing with less economic risk.</p>



<p>The GT series already has been accepted by major users in the global semiconductor industry, and its design concept and reliability have received wide acclamation. The GT62A is based on the same platform, thus maximizing standardization as well as enabling the use of common components. Users of the GT62A, therefore, can benefit from its high-reliability advantage right from the start.</p>



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<h3>Key Features</h3>



<h4><strong>High Output and High Reliability</strong></h4>



<p>The GT62A features a newly developed power supply that enables high output of 90 watts (a 50% improvement compared with model GT61A). The light source also is mounted with a technology to take measures against the heat load, which increases as the output increases. It also has newly developed, highly durable optics to ensure high performance reliability even during high-output operation. The GT62A comes with Gigaphoton’s original “Bandwidth Control Module (BCM)” technology as standard to provide a stabilized spectrum.<br>In order to meet a variety of customer needs, a 60-W version of the GT62A also is available. This version allows operation at the 60-watt mode at less cost, but can be upgraded to 90-watt mode when ready to scale; this flexibility enables the return on investment to be maximized.</p>



<h4><strong>Cost Savings</strong></h4>



<p>Today, semiconductor equipment has rapidly progressed to demonstrate higher performance and higher throughput. Gigaphoton is committed to ensuring that its lasers deliver high uptime over a long period of time in order to enhance customer fab productivity. The GT62A incorporates technologies that can reduce downtime caused by gas refill to one-tenth that of the previous GT series models; it enables longer life of the laser chamber and optics — ultimately reducing maintenance downtime and costs.</p>



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<h3>General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value*</th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Output</td><td>60/90 W</td></tr><tr><td>Pulse Energy</td><td>10.0/15.0 mJ</td></tr><tr><td>Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>Bandwidth (E95)</td><td>0.35 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>


GT62A


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/05/GT61A_500.png" alt="GT61A" class="wp-image-8013" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/05/GT61A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/05/GT61A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/05/GT61A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2>6 kHz Excimer Laser for Hyper N.A. Immersion Lithography Tools</h2>



<p><em>6 kHz Excimer Laser Supporting Immersion Lithography Tools with N.A. of 1.3 or more</em></p>



<p>Less than a year after we began mass-production and shipment of the GT60A, Gigaphoton has successfully developed the GT61A. Model GT61A offers a 30% improvement of spectral bandwidth (E95%) from that of the GT60A as well as a longer laser chamber life to reduce both downtime and maintenance cost. The GT61A, the third-generation model of the GT series, features the same injection-locking platform as that used by models GT40A and GT60A, which already have been accepted by major users in the global semiconductor industry. The design concept and reliability of the GT series are highly acclaimed in the industry. Because it is based on the same platform, the GT61A maximizes standardization and enables the use of common components, thereby ensuring that users can achieve high reliability right from the outset.</p>



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<h3>Key Features</h3>



<h4><strong><strong>Improved Spectrum Performance</strong></strong></h4>



<p>Improving on the GT60A, which achieved a spectral bandwidth (E95%) of 0.5 pm, the GT61A reaches a spectral bandwidth of 0.35 pm. In addition, a newly developed high-precision measuring instrument and stabilization mechanism are provided as a standard feature, allowing highly stable spectrum performance throughout the entire life time. The GT61A represents a great contribution to the stability of the lithography process.</p>



<h4><strong><strong>High Reliability and High Stability</strong></strong></h4>



<p>With its lengthened laser chamber life, the GT61A enabled a reduction of down time for maintenance as well as reduced maintenance cost. A major advantage of the GT series is the ease of module replacement and serviceability, ensuring the high reliability and high uptime essential in today’s semiconductor fabs. The GT61A leverages the same platform as that of the GT40A/GT60A, thereby maximizing standardization as well as enabling the use of common components to ensure high reliability even from the beginning of its introduction.</p>



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<h3>General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value*</th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Output</td><td>60 W</td></tr><tr><td>Pulse Energy</td><td>10.0 mJ</td></tr><tr><td>Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>Bandwidth (E95)</td><td>0.35 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>


GT61A


<h2>6New 6 kHz Excimer Laser Model for 45-nm or below Technology Node</h2>



<p>Marking less than one year since the company began mass-production and shipment of the GT40A, Gigaphoton has now successfully developed the GT60A, delivering an improved repetition rate 1.5-times that of the GT40A. The GT60A is the latest-generation model, featuring the same injection-locking platform as that used by the GT40A, which has already been accepted by major users in the global semiconductor industry. The design concept and reliability of the GT40A are highly acclaimed in the industry, and because the GT60A is based on the same platform to maximize standardization as well as enable the use of common components, thereby ensuring users to achieve high reliability right from the onset.</p>



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<h3>Key Features</h3>



<h4><strong><strong><strong><strong><strong>High Output and High Repetition Rate</strong></strong></strong></strong></strong></h4>



<p>Improving on the GT40A, which achieved a repetition rate of 4,000 Hz, the GT60A reaches a repetition rate of 6,000 Hz on the same platform through greatly enhanced efficiency. This improvement enables an output level of that is more than 33% higher than the GT40A, while limiting the energy per pulse. While the GT60A features output and repetition frequency enhancements, the laser’s spectral performance supports the resolution of lithography tools at the same level as the GT40A.</p>



<h4><strong><strong><strong><strong>High Reliability and High Stability</strong></strong></strong></strong></h4>



<p>The GT60A leverages the same platform as that of the GT40A—maximizing standardization as well as enabling the use of common components for ensuring high reliability. In addition to its advanced self-diagnostic function, the GT60A features a variety of functions to enhance system availability. One of the major advantages of the GT series is the ease of module replacement and serviceability, which ensures the high reliability and high uptime essential in today’s semiconductor fabs.</p>



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<h3>General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value*</th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Output</td><td>60 W</td></tr><tr><td>Pulse Energy</td><td>10.0 mJ</td></tr><tr><td>Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.2 pm</td></tr><tr><td>Bandwidth (E95)</td><td>0.5 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>


GT60A


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/GT45A_500.png" alt="GT45A" class="wp-image-7624" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT45A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT45A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT45A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2 id="the-gt45a-adopts-cutting-edge-technology-and-high-functional-augmentability-to-realize-further-productivity-improvements-wafer-output">The GT45A Adopts Cutting-Edge Technology and High Functional Augmentability to Realize Further Productivity Improvements (Wafer Output)</h2>



<p>The GT45A is based on the cutting-edge GT65A light source platform for ArF immersion, and is a model prepared for high functional augmentability.<br>Equipped with the latest model modules for “high availability” and inheriting “helium free” technology from the current model GT40A, improved productivity and environmental load reduction are simultaneously achieved.<br>It meets a wide range of customer needs with improved spectral width stability, variable technology and a maximum possible output of 90 W.</p>



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<h3 id="benefits">Benefits</h3>



<h4 id="extended-module-lifespan">Extended module lifespan</h4>



<p>The module lifespan extension technology introduced and achieved with the GT65A is equipped as standard. Contributes to decreased maintenance frequency and improved productivity.</p>



<h4 id="high-functional-augmentability">High functional augmentability</h4>



<p>Functions and technologies that can be used with the GT65A can be equipped.</p>



<ul><li>Improved CD uniformity through increased spectral width stability</li><li>Compensates for differences in contrast performance in various generations of exposure machines with variable spectral width technology</li><li>Further productivity (throughput) improvements with an oscillation frequency of 6 kHz and a 90 W maximum high output</li><li>Data collection, monitoring and analysis through sMonitoring</li></ul>
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<h3 id="general-specifications">General Specifications</h3>



<figure class="wp-block-table"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Power</td><td>45 &#8211; 90 W</td></tr><tr><td>Pulse Energy</td><td>11.25 &#8211; 15 mJ</td></tr><tr><td>Max Repetition Rate</td><td>4,000 &#8211; 6,000 Hz</td></tr><tr><td>Bandwidth (E95)</td><td>≤ 0.5 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value.</figcaption></figure>
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GT45A


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/GT40A_500.png" alt="GT40A" class="wp-image-7623" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT40A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT40A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT40A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2>4-kHz ArF Excimer Laser for 65-nm or below Technology Node</h2>



<p>Model GT40A uses an injection-locking resonator (first in the world) as a lithography tool light source to allow simultaneous maintenance of narrower spectral bandwidth and higher output, a combination that is difficult to achieve with conventional technologies. In addition, it provides lower peak-pulse energy that reduces damage to the lithography tool optics to achieve the lowest running cost in the industry. Model GT40A is also equipped with the newly developed advanced self-diagnosis function as well as it has greatly improved its serviceability such as the ease of module replacement to achieve higher reliability and higher uptime.</p>



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<h3>Key Features</h3>



<h4>An injection-locking laser</h4>



<p>The GT40A is the industry’s first mass-production model to use <i>injection-locking</i> technology. This ensures highly stable emission of a DUV beam with high output of 45 W and a spectral bandwidth of 0.2 picometer (pm) for FWHM and 0.5 picometer for E95 — the highest bandwidth level in the industry. It also provides lower peak-pulse energy that reduces damages to the lithography tool optics.</p>



<figure class="wp-block-table is-style-regular"><table><tbody><tr><td><strong>Injection-locking</strong> technology injects a low-output laser beam (master), which is emitted after bring tuned to an extremely narrow spectral bandwidth, into a laser resonator (amplifier) that amplifies it with laser resonation. This technology allows simultaneous maintenance of a narrower spectral bandwidth and higher output, a combination that is difficult to achieve with conventional technologies.</td></tr></tbody></table></figure>



<h4>The industry&#8217;s lowest running cost</h4>



<p>The injection-locking technology allows greater reduction of the load upon the laser optics. Furthermore, the system configuration has been refined to significantly reduce both the number of consumables (modules) and their replacement frequency. As a result, the GT40A can achieve the lowest running cost in the industry.</p>



<h4>A highly reliable/operable design</h4>



<p>The high reliability and high uptime essential to semiconductor factories are achieved by introduction of a newly developed self-diagnosis function and great improvement in the ease of module replacement and serviceability.</p>
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<h3>General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value*</th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Output</td><td>45 W</td></tr><tr><td>Pulse Energy</td><td>11.25 mj</td></tr><tr><td>Repetition Rate</td><td>4,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.2 pm</td></tr><tr><td>Bandwidth (E95)</td><td>0.5 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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GT40A


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G42A_500.png" alt="G42A" class="wp-image-7658" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G42A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G42A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G42A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2 id="4-khz-arf-excimer-laser-for-80-nm-technology-node">4-kHz ArF Excimer Laser for 80-nm Technology Node</h2>



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<h3 id="key-features">Key Features</h3>



<ul><li>Spectral bandwidth (FWHM) improved from 0.35 pm (G41A) to 0.3 pm to allow exposure of 80-nm geometries based on the G41A</li><li>Use of highly durable parts for each module to prolong the optical module life and further reduce CoO</li><li>Laser chamber: Use of highly durable parts for the electrodes</li><li>Line-narrowing module, monitor module, etc.: Use of highly durable materials for the optics</li></ul>
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<h3 id="general-specifications">General Specifications</h3>



<figure class="wp-block-table"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value*</th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Output</td><td>20 W</td></tr><tr><td>Pulse Energy</td><td>5.0 mJ</td></tr><tr><td>Repetition Rate</td><td>4,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.3 pm</td></tr><tr><td>Bandwidth (E95)</td><td>0.75 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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G42A


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G41A_500.png" alt="G41A" class="wp-image-7664" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G41A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G41A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G41A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2 id="4-khz-arf-excimer-laser-for-design-rules-of-up-to-0-10-µm">4-kHz ArF Excimer Laser for Design Rules of up to 0.10 µm</h2>



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<h3 id="main-features">Main Features</h3>



<ul><li>Mounted with a newly designed solid-state pulse power supply that allows a repetition rate of 4000 Hz so as to achieve high throughput</li><li>High-reliability design inherited from our field-proven KrF excimer laser G10K/20K series</li></ul>
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<figure class="wp-block-table"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Output</td><td>20 W</td></tr><tr><td>Pulse Energy</td><td>5.0 mJ</td></tr><tr><td>Repetition Rate</td><td>4,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.35 pm</td></tr><tr><td>Bandwidth (E95)</td><td>0.85 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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G41A


<div class="wp-block-image is-style-default"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G300K_500.png" alt="G300K" class="wp-image-7601" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G300K_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G300K_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G300K_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<div class="wp-block-image"><figure class="aligncenter size-full is-resized"><img decoding="async" loading="lazy" src="https://webapi.gigaphoton.global/wp-content/uploads/2016/03/GIGANEX2_sm.png" alt="" class="wp-image-4555" width="300" height="29"/></figure></div>



<p> </p>



<h2 class="has-text-align-center" id="a-new-product-in-the-giganex-series-the-g300k-is-a-300-w-krf-laser-for-next-generation-ultra-fine-ablation-processing-a-high-output-highly-reliable-model-that-helps-to-reduce-cost-of-ownership-coo">A new product in the GIGANEX Series, the G300K is a 300 W Krf laser for next-generation ultra-fine ablation processing &#8211; a high output, highly reliable model that helps to reduce Cost of Ownership (COO)</h2>



<p>The KrF laser, G300K, is a new model that joins the GIGANEX lineup. Based on the concept of “optimizing processing” such as for ultrafine ablation, the G300K maximizes the return on investment (ROI) of our customers while maintaining high output and high availability of at least 99%. As the basic platform, the G300K uses our KrF light source for semiconductor lithography, the G41K, which has sold more than 900 units. We have also newly developed and installed a power supply and laser chamber optimized for high output. This will help maximize our customers&#8217; ROI by improving productivity and reducing COO in next-generation ultrafine ablation processing in the back-end process of semiconductor manufacturing.</p>



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<h3 id="high-repetition-and-high-output">High repetition and high output</h3>



<p>The G300K achieves a high repetition rate of 4,000 Hz and a high output of 300 W, which puts it in a league of its own as a KrF laser for processing. Ultrafine ablation processing is now possible in areas where it was once out of the question with previous UV lasers.</p>



<h3 id="high-availability">High availability</h3>



<p>As a lithography KrF light source for semiconductors, the G300K carries the baton of the reliability provided by the G41K, which boasts a track record of more than 900 units, and realizes high availability of at least 99%.</p>



<h3 id="long-lifespan">Long lifespan</h3>



<p>Built to withstand intense productivity, the G300K carries forward the heritage of our semiconductor manufacturing light sources with its long-lifespan module, and also helps to improve the yields and reduce the maintenance costs of our customers by having long maintenance cycles.</p>
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<h2 id="general-specifications">General Specifications</h2>



<figure class="wp-block-table">
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<thead>
<tr>
<th>Item</th>
<th colspan="2">Value<sup>*</sup></th>
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</thead>
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<tr>
<td>Wavelength</td>
<td colspan="2">248 nm</td>
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<tr>
<td>Average Output</td>
<td>75W</td>
<td>300W</td>
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<tr>
<td>Pulse Energy</td>
<td>75mJ</td>
<td>75mJ</td>
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<tr>
<td>Repetition Rate</td>
<td>1000Hz</td>
<td>4000Hz</td>
</tr>
<tr>
<td>Application</td>
<td colspan="2">Next-generation ultra-fine ablation processing</td>
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</tbody>
</table><figcaption>(*) Each of the above specification values represents a typical value.</figcaption></figure>
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G300K


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G60K_500.png" alt="G60K" class="wp-image-7600" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G60K_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G60K_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G60K_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2>A KrF Lithography Light Source That Achieves a High Output 150% Greater Than the Previous Model to Meet the Output Demands of Tomorrow</h2>



<p>Based on our KrF light source technology that is the result of many years of technological evolution and accumulated experience, the KrF lithography light source, G60K, which supports a scanner throughput of at least 300 wafers per hour, offers an output 150% greater than the previous model. Also, by extending the module’s lifespan by 200%, the G60K delivers improvements in terms of availability as well. A newly developed power supply and module see the G60K support performance improvements such as higher frequencies in preparation for the higher outputs of tomorrow to meet the demands of KrF lithography technology in the years to come. Helium-free technology is also installed as standard, meaning the G60K also contributes to reducing the energy consumption of utilities.</p>



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<h3>Key Features</h3>



<h4>Scanner throughput boasts a greater output of 300 wafers per hour</h4>



<p>By introducing a new power supply unit, it is now possible to output 60 W, which is 150% greater than the output of the previous model. This greater output suppresses throughput loss even for low-sensitivity resistances such as thick-film resistances, thereby contributing to even greater productivity.</p>



<h4>Follows in the footsteps of our technology that already offers availability of at least 99.9%</h4>



<p>Based on the technology of the G41K, a model that has received rave reviews by our customers for its high availability in the field and performance stability, the G60K achieves an availability of at least 99.9% in all output ranges. The introduction of new technology has extended the module’s lifespan by 200% and offers improved availability.</p>



<h4>Providing sustainable solutions</h4>



<p>Equipped with helium-free technology as standard, the G60K is an environmentally friendly light source that mitigates the risk of a supply shortage of rare gas and also uses technology to reduce the energy consumption of utilities.</p>
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<h3>General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>248 nm</td></tr><tr><td>Output</td><td>40W &#8211; 60W</td></tr><tr><td>Pulse Energy</td><td>10mJ &#8211; 15mJ</td></tr><tr><td>Repetition Rate</td><td>4000Hz</td></tr><tr><td>Features</td><td>Continuous Reliability Improvement (CRI) Package<br>Sustainable Solution<br>・Helium Free Operation<br>・TGM Gas Management</td></tr></tbody></table><figcaption>(*) specifications are representative values</figcaption></figure>
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G60K


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G45K_500.png" alt="" class="wp-image-7620"/></figure></div>



<h2 id="4-khz-krf-excimer-laser-supporting-50-w-output">4 kHz KrF Excimer Laser Supporting 50 W Output</h2>



<p>The G45K, the 3rd generation model in the 4 kHz KrF excimer laser series, is aimed at improving the efficiency of state-of-the-art memory chip production, providing a 50 W maximum high-power output. In addition, both “improved availability” and “reduced environmental impact” are realized through extension of the lifetime of the modules, and through the application of green technology.</p>



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<h3 id="key-features">Key Features</h3>



<h4 id="higher-output">Higher output</h4>



<p>A high output power of 50 W has been achieved, representing an increase of 25% in comparison to existing products. This contributes to productivity improvements for state-of-the-art memory chips.</p>



<h4 id="extended-module-lifetime">Extended module lifetime</h4>



<p>Downtime due to maintenance have been reduced by extending the main module lifetime by 20%. It conduces to further availability improvement in light source.</p>



<h4 id="green-technology">Green technology</h4>



<p>“Helium-free” technology, which achieves zero consumption of helium during light source operation, is installed as standard. Also, it is compatible with the “hTGM” neon gas recycling system which contributes to reduced operational costs and environmental impact.</p>
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<figure class="wp-block-table is-style-regular"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>248 nm</td></tr><tr><td>Average Power</td><td>40 W – 50 W</td></tr><tr><td>Pulse Energy</td><td>10.0 &#8211; 12.5 mJ</td></tr><tr><td>Max Repetition Rate</td><td>4,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.35 pm</td></tr><tr><td>Bandwidth (E95)</td><td>1.1 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value.</figcaption></figure>
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G45K


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G41K_500.png" alt="" class="wp-image-7648" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G41K_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G41K_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/G41K_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2 id="krf-4-khz-excimer-laser-for-up-to-130-nm-technology-nodes">KrF 4 kHz Excimer Laser for up to 130 nm Technology Nodes</h2>



<p>As the upgrade version of the second-generation model of 4-kHz excimer laser G41K, G41K-1H is mounted with a magnetic-levitation laser chamber and highly efficient line-narrowing and monitor modules on the G41K platform as standard features to achieve a high output of 40 W, one class higher than any other product. The G41K-1H has prolonged the life of each optical module to 30 billion pulses (50% longer than the G41K). The G41K can be upgraded to the G41K-1H in the field by replacing their modules.</p>



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<h3 id="key-features">Key Features</h3>



<ul><li>Higher output of 40 W/ultra-low CoO by further enhancing the emission efficiency of the G41K</li><li>Use of the TGM software allows prolongation of the gas life by an additional 100% compared with the conventional life</li><li>Higher reliability proven by hundreds of laser units running in the field</li></ul>
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<h3 id="general-specifications">General Specifications</h3>



<figure class="wp-block-table"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>248 nm</td></tr><tr><td>Average Output</td><td>40 W</td></tr><tr><td>Pulse Energy</td><td>10.0 mJ</td></tr><tr><td>Repetition Rate</td><td>4,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.35 pm</td></tr><tr><td>Bandwidth (E95)</td><td>1.1 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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G41K-1H


<h2 id="krf-4-khz-excimer-laser-for-up-to-130-nm-technology-nodes">2 kHz KrF Excimer Laser for 0.13 µm Design Rule</h2>



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<h3 id="key-features">Key Features</h3>



<ul><li>Further enhancement of the field-proven energy stability of the G20K</li><li>Ultra-narrow bandwidth of 0.5 pm (FWHM) achieved by improvement of the line-narrowing module to allow exposure of 0.13 µm geometries</li></ul>
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<h3 id="general-specifications">General Specifications</h3>



<figure class="wp-block-table"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>248 nm</td></tr><tr><td>Average Output</td><td>20 W</td></tr><tr><td>Pulse Energy</td><td>10.0 mJ</td></tr><tr><td>Repetition Rate</td><td>2,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.5 pm</td></tr><tr><td>Bandwidth (E95)</td><td>1.4 pm</td></tr><tr><td>Energy Dose Stability</td><td>0.35 %</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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G21K


<h2 id="krf-4-khz-excimer-laser-for-up-to-130-nm-technology-nodes">2 kHz KrF Excimer Laser for 0.18 µm Design Rule</h2>



<p>The G20K features high energy stability (±0.4%) and a narrow spectral bandwidth (FWHM) of 0.6 pm or less to allow exposure of 0.18-µm geometries at high resolution.</p>



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<h3 id="key-features">Key Features</h3>



<ul><li>Repetition rate increased from 1000 Hz (G10K) to 2000 Hz to achieve higher throughput.</li><li>Great enhancement of laser emission stability and module durability allows further reduction of the CoO (running cost per pulse).</li><li>Compact size that reduces the floor footprint by 14% compared with the G10K.</li><li>A newly designed solid-state pulse power supply allows a 20% reduction of power consumption.</li></ul>
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<figure class="wp-block-table"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>248 nm</td></tr><tr><td>Average Output</td><td>20 W</td></tr><tr><td>Pulse Energy</td><td>10.0 mJ</td></tr><tr><td>Repetition Rate</td><td>2,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.6 pm</td></tr><tr><td>Bandwidth (E95)</td><td>2.0 pm</td></tr><tr><td>Energy Dose Stability</td><td>0.4 %</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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G20K


<h2 id="krf-4-khz-excimer-laser-for-up-to-130-nm-technology-nodes">1-kHz KrF Excimer Laser for 0.25 µm to 0.18 µm Design Rule</h2>



<p>Stability and durability are the biggest technological challenges for an excimer laser, because it uses fluorine, high-voltage discharge, and deep UV, all of which are highly reactive. As well as stability and durability, an excimer laser light source for lithography tools requires high monochromaticity for the laser beam and high uniformity for the output energy.<br>As the world’s first excimer laser light source that satisfies all of these requirements, the G10K has earned a top reputation in the lithography light source market since it was marketed in 1997. This model is still operating in the field world wide.</p>



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<h3 id="key-features">Key Features</h3>



<ul><li>Stable emission and high durability for achieving high uptime and low cost of ownership</li><li>Gigaphoton’s original RF pre-ionizer and newly developed high-voltage pulse power supply allows great improvement of emission stability as well as great enhancement of durability</li><li>A sufficient performance margin for each module and a complete quality assurance system ensure high reliability of the product</li></ul>
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<h3 id="general-specifications">General Specifications</h3>



<figure class="wp-block-table"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>248 nm</td></tr><tr><td>Average Output</td><td>10 W</td></tr><tr><td>Pulse Energy</td><td>10.0 mJ</td></tr><tr><td>Repetition Rate</td><td>1,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.6 pm</td></tr><tr><td>Bandwidth (E95)</td><td>2.0 pm</td></tr><tr><td>Energy Dose Stability</td><td>0.5 %</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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G10K


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" loading="lazy" width="697" height="150" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/Fabscape_logo_2021_Color_light.png" alt="Fabscape" class="wp-image-7683" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/Fabscape_logo_2021_Color_light.png 697w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/Fabscape_logo_2021_Color_light-300x65.png 300w" sizes="(max-width: 697px) 100vw, 697px" /></figure></div>



<p>Fabscape is a highly secure, scalable and customizable open platform for managing manufacturing equipment data. While many manufacturing platforms typically focus on collecting and storing equipment data, the Fabscape platform also serves as a robust application framework that allows you to create custom applications or modify existing features.</p>



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<h2 id="key-features">Key Features</h2>



<h3 id="adapting-to-you">Adapting to you</h3>



<p>Fabscape aims to be exactly what each user needs &#8211; no more, no less. It&#8217;s goal is not for you to adapt to it, but rather for it to adapt to you. You will have a wide range of options to personalize Fabscape for your specific needs.</p>



<h3 id="relieve-data-ambiguity">Relieve data ambiguity</h3>



<p>One of Fabscape&#8217;s missions is to resolve the problem of data ambiguity between multiple equipment vendors through standardized data management. This enables true apples-to-apples comparison and the creation of a broader range of correlation analysis features for all of your fab equipment regardless of type, model or vendor.</p>



<h3 id="choose-only-the-features-you-need">Choose only the features you need</h3>



<p>Many of Fabscape&#8217;s features offered separately as plugins or drivers. This means you can mix and match only the features that are important to you and ignore others, so your system is not cluttered with features you don&#8217;t use.</p>



<h3 id="highly-flexible-development-environment">Highly flexible development environment</h3>



<p>Fabscape&#8217;s container-based microservice architecture offers the freedom to develop extensions and custom features with relative ease. Each of Fabscape&#8217;s core features, plugins, and drivers are isolated in its own Docker container.</p>
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<div class="wp-block-media-text alignwide is-stacked-on-mobile is-vertically-aligned-center"><figure class="wp-block-media-text__media"><img decoding="async" loading="lazy" width="401" height="376" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/framework.png" alt="" class="wp-image-7684 size-full" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/framework.png 401w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/framework-300x281.png 300w" sizes="(max-width: 401px) 100vw, 401px" /></figure><div class="wp-block-media-text__content">
<p class="has-medium-font-size">Fabscape is comprised of two key parts: the Platform and Visualizer. The Platform (or “backend”) is like the brain and the heart of Fabscape. This is where all data is collected, managed, manipulated, created and hosted. It is also responsible for managing plugins and drivers that add new capabilities to the system.</p>
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<div class="wp-block-media-text alignwide is-stacked-on-mobile is-vertically-aligned-center"><figure class="wp-block-media-text__media"><img decoding="async" loading="lazy" width="300" height="211" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/console-300x211.png" alt="" class="wp-image-7688 size-medium" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/console-300x211.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/console-768x541.png 768w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/console.png 959w" sizes="(max-width: 300px) 100vw, 300px" /></figure><div class="wp-block-media-text__content">
<p class="has-medium-font-size">The Visualizer (or the “frontend”) is the user-facing component of Fabscape. This is where users interact with the various features of Fabscape, not just with its standard feature set but also features offered via plugins and drivers as well.</p>
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<div class="wp-block-media-text alignwide is-stacked-on-mobile is-vertically-aligned-center"><figure class="wp-block-media-text__media"><img decoding="async" loading="lazy" width="717" height="409" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/extensions-color.png" alt="" class="wp-image-7687 size-full" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/extensions-color.png 717w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/extensions-color-300x171.png 300w" sizes="(max-width: 717px) 100vw, 717px" /></figure><div class="wp-block-media-text__content">
<p class="has-medium-font-size" id="each-feature-of-the-fabscape-system-is-broken-up-into-components-that-you-can-easily-hook-into-and-take-advantage-of">Drivers allow the platform to talk to various equipment of servers in the fab. Plugins add specific capabilities to harness the vast data data and communication resources provided by the platform into meaningful tasks for the user.<br>Each feature of the Fabscape system is broken up into components that you can easily hook into and take advantage of.<br>Features include:<br>&#8211; Wafer/lot level analysis<br>&#8211; Errors and alerts<br>&#8211; Availability metrics monitoring<br>&#8211; PM scheduling and alignment</p>
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