Technical Papers in SPIE Advanced Lithography 2021

Gigaphoton will present the following papers at the "SPIE Advanced Lithography 2021" digital forum, to be held on February 22 (Sun.) through 26 (Thu.) 2021.

This conference is one of the largest event of advanced lithography for semiconductor manufacturing.

Gigaphoton presents following 8 papers discussing advanced lightsource technology which improves yield and availability for semiconductor manufacturing.

 

  • Oral Presentation

February 25, 2021 • 10:50 AM PST | Session 11: EUV Source [Extreme Ultraviolet (EUV) Lithography XII]
Update of >300W High Power LPP-EUV Source Challenge III for Semiconductor HVM                
Author: Hakaru Mizoguchi; Gigaphoton Inc. (Japan)
[Paper#: 11609-48]

February 24, 2021 • 9:40 AM PST | Session 4: Lithography Equipment and New Applications [Optical Lithography XXXIV]
Latest ArF light source with speckle reduction technology for immersion lithography improving chip yield              
Author: Hirotaka Miyamoto; Gigaphoton Inc. (Japan)
[Paper#: 11613-11]

February 25, 2021 • 8:50 AM PST | Session 8: Novel Optical and ebeam/ion [Novel Patterning Technologies 2021]
Processability of organic material for semiconductor packaging by 248 nm excimer laser              
Author: Akira Suwa; Gigaphoton Inc. (Japan)
[Paper#: 11610-27]

 

 

 

  • Poster Presentation

February 24, 2021 • 5:30 PM PST | Poster Session [Optical Lithography XXXIV]
ArF lightsource “GT66A” for next-generation immersion lithography enhancing EPE and CD performance               
Author: Tommy Oga; Gigaphoton Inc. (Japan)
[Paper#: 11613-30]

February 24, 2021 • 5:30 PM PST | Poster Session [Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV]
Study of further CD and OL performance improvement by introducing new E95% spectral bandwidth and Wavelength functionality for ArFi lithography lightsource             
Author: Tommy Oga; Gigaphoton Inc. (Japan)
[Paper#: 11611-92]

February 24, 2021 • 5:30 PM PST | Poster Session [Optical Lithography XXXIV]
Advanced spectral engineering: A new way of process aware laser spectra optimization for optical lithography  
Author: Koichi Fujii; Gigaphoton Inc. (Japan)
[Paper#: 11613-33]

February 24, 2021 • 5:30 PM PST | Poster Session [Optical Lithography XXXIV]
Lithocell availability improvement through light source maintenance cycle improvement and optimization and its availability impact analysis for cutting-edge ArFi Light source        
Author: Takehiko Tomonaga; Gigaphoton Inc. (Japan)
[Paper#: 11613-29]

February 24, 2021 • 5:30 PM PST | Poster Session [Extreme Ultraviolet (EUV) Lithography XII]
The development progress of the High Power LPP-EUV light source using a magnetic field
Author: Hirokazu Hosoda; Gigaphoton Inc. (Japan)
[Paper#: 11609-52]