Gigaphoton’s EUV Light Source Achieves 250W Output at 4.0% Conversion Efficiency

Company succeeds in light emission levels capable for use in high-volume manufacturing of state-of-the-art semiconductors

OYAMA, Tochigi July 6, 2016 — Gigaphoton Inc., the leading manufacturer of light sources used in lithography, has announced success in achieving 250W light output at 4.0% conversion efficiency with a Laser-Produced Plasma (LPP) light source prototype for EUV scanners, which the company is currently engaged in developing. At this output level, the light sources can be used in high-volume manufacturing of state-of-the-art semiconductors. The company also announced its success in achieving 119 hours of continuous operation at over 130W in testing.

This result was achieved via the culmination of a number of efforts that the company has continued to develop, including the sub 20 μm micro droplet supply technology, the combination of solid state pre-pulse and CO2 main pulse lasers, improvements in energy control technology, and magnetic field enabled debris mitigation technology.

Gigaphoton has also launched operation of a high-power EUV light source verifier designed for use in a semiconductor high-volume manufacturing environment, and is committed to continuing the development of EUV light sources with high operational rates and reliability in an aim to facilitate their implementation in the high-volume manufacturing of semiconductors.

Hakaru Mizoguchi, Vice President and CTO of Gigaphoton says, "Our success in achieving 250W output at 4.0% conversion efficiency serves to demonstrate how very close we are to perfecting an EUV light source that will achieve the high output rates, while delivering stable operation at low running costs, which the semiconductor manufacturers have long waited for. We are confident that Gigaphoton's advanced technological capabilities and development efforts aimed at high-volume manufacturing will ultimately produce ground breaking results by accelerating the development of EUV scanners for mass production, expediting the implementation of EUV scanners as the next generation of technology in lithography, contributing to overall development of the semiconductor industry, and accelerating the realization of an IoT based society.

*This project utilizes results from the New Energy and Industrial Technology Development Organization (NEDO) grant program.

About Gigaphoton

Since it was founded in 2000, Gigaphoton has delivered valuable solutions to semiconductor manufacturers throughout the world as a laser supplier. Gigaphoton's patented and innovative technology of LPP EUV solutions play a leading role in achieving better cost effectiveness and productivity in EUV scanners intended for high-volume manufacturing. In every stage from R&D to manufacture, sales, and maintenance services, Gigaphoton is committed to providing world-class support delivered from the perspective of everyday users. For more information please visit www.gigaphoton.com.

Media contact:

Gigaphoton Inc.

Corporate Planning Department

Akinori Matsui

TEL: 0285-37-6931

Email: web_info@gigaphoton.com

The information contained in this news release is current at the time of announcement and subject to change without notice.