Pilot light source for EUV lithography mass production plants achieves stable average output of 100W and 5% conversion efficiency
Oyama, Tochigi; October 21, 2016 -- Gigaphoton Inc., a leading manufacturer of light sources used in lithography, has announced success in achieving a world record 5% conversion efficiency with 100W of average output in stable operation and a high duty rate of 95%. This comes as a result of perfecting a pilot light source1 designed for operation in state-of-the-art semiconductor mass production lines that utilize Laser-Produced Plasma (LPP) light sources for EUV scanners, which the company is currently engaged in developing.
To date, Gigaphoton has developed a number of innovative technologies and improvements, which include sub 20 μm micro droplet supply technology; a high luminous-quality main pulse beam that combines an improved solid-state pre-pulse laser with a newly introduced Mitsubishi Electric product designated as a high frequency discharge excitation-type three-axis orthogonal CO2 laser amplifier; improvements in energy control technology; and a debris removal technology developed by Gigaphoton that operates via magnetic fields. These advancements have all contributed to accomplishing 130W or better continuous operation on a prototype machine, an achievement announced earlier this year in July. This latest pilot light source incorporates these new technologies in a system designed based on the assumption of integrating an EUV scanner.
The pilot light source has successfully achieved 5% conversion efficiency with 105W of average output in stable operation and a high duty rate of 95% (a rate that measures light emission time versus operating time), which is a more demanding workload than the prototype underwent. This is in line with the 100W average output that governs throughput in semiconductor production, and is considered a performance level that exceeds the requirements of users today. The success achieved in this operational demonstration confirms that the realization of cutting edge semiconductor production lines is just around the corner.
Hakaru Mizoguchi, Vice President & CTO of Gigaphoton says, "Our success in achieving a world record 5% conversion efficiency while attaining a 100W average output in stable operation and high duty rate of 95% with our pilot light source―which is designed to operate in state-of-the-art semiconductor mass production lines―shows that we are very close to the market introduction stage for EUV light sources that will be capable of delivering stable operation, high output, and low running costs. We are confident that Gigaphoton's advanced technological capabilities and development efforts will not only accelerate the development of EUV scanners for mass production, which is the next generation of technology in lithography, but will also support overall development in the semiconductor industry and contribute to the realization of an IoT based society."
1: a light source designed by Gigaphoton for use in mass production plants that use EUV lithography; also referred to as a, "High Output Demonstration Unit."
*More details on this matter scheduled for release at the following upcoming event (October 24-26, 2016):
*This project utilizes results from the New Energy and Industrial Technology Development Organization (NEDO) grant program.
Since it was founded in 2000, Gigaphoton has delivered valuable solutions to semiconductor manufacturers throughout the world as a laser supplier. Gigaphoton's patented and innovative technology of LPP EUV solutions play a leading role in achieving better cost effectiveness and productivity in EUV scanners intended for high-volume manufacturing. In every stage from R&D to manufacture, sales, and maintenance services, Gigaphoton is committed to providing world-class support delivered from the perspective of everyday users. For more information please visit www.gigaphoton.com.
Corporate Planning Department
The information contained in this news release is current at the time of announcement and subject to change without notice.