GIGAPHOTON Shipped New Model Light Source “GT45A” for ArF Dry Lithography Scanner in August

September 16, 2019

Introduced cutting-edge technology on ArF immersion, meeting with further customer needs

Oyama, Tochigi; September 16, 2019 -- GIGAPHOTON Inc. (Head Office: Oyama, Tochigi; President & CEO: Katsumi Uranaka), a manufacturer of light sources used in semiconductor lithography, has announced that new model light source “GT45A” for ArF dry lithography tool had been shipped in August 2019.

State-of-the-art semiconductor manufacturing processes involve 10/7 nm (nanometer) technology nodes, and with the introduction of EUV light sources, further advancing to 7nm and beyond are attracting attention for the future. On the other hand, due to further demands including the spread of IoT, the semiconductor demand is expected to increase for primarily technically mature nodes such as 14-65mm nodes, leading to the expansion of production capacity through new investment and the upgrade of existing fabs. Accordingly, there is demand for further improvements for dry lithography equipment in high productivity and high availability are becoming essential for lithography tool.

By applying the following light source technologies for ArF immersion that have already been introduced to production sites, the GT45A is equipped for functional augmentation to meet an extensive range of user expectations.

  • The lifetime of the main modules can be extended up to 50% compared to conventional products, and its leads the tool availability can be improved.
  • By increasing the maximum output power to 90W, provides further productivity improvements.
  • By being capable of supporting repetition rate from 4kHz to 6kHz, it can support a wide range of exposure device requirements and contributes to improved exposure optical performance.

 
Katsumi Uranaka, President & CEO of GIGAPHOTON said, “The GT45A can provide optimal solutions to an extensive range of customer needs with state-of-the-art technology by applying the technologies cultivated and implemented through the development of light sources for ArF immersion. GIGAPHOTON will continue in the future to provide optimal solutions to meet customer needs and make further contributions to the semiconductor manufacturing industry.”

 

About GIGAPHOTON

Since it was founded in 2000, GIGAPHOTON has delivered valuable solutions to semiconductor manufacturers throughout the world as a laser supplier. In every stage from R&D to manufacture, sales, and maintenance services, GIGAPHOTON is committed to providing world-class support delivered from the perspective of everyday users. For more information please visit www.gigaphoton.com

 
Media contact:
GIGAPHOTON Inc
Corporate Planning Division
Kenji Takahisa
TEL: +81-285-37-6931
E-mail: web_info@gigaphoton.com