GIGAPHOTON CELEBRATES 100TH GIGATWIN ARF LIGHT SOURCE MILESTONE INSTALLATION

OYAMA, JAPAN, APRIL 14, 2008 —  Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced the installation of its 100th GigaTwin ArF light source platform at a major semiconductor foundry in Taiwan.  This milestone is testament to the success and growing adoption of Gigaphoton’s dual-chamber platform, which also features the company’s injection-locking laser technology.  Gigaphoton’s GT40A was integrated into a state-of-the-art ArF lithography tool for the foundry’s next-generation lithography applications.  Gigaphoton reports that its 100th GigaTwin will be used in the production of 55-nm to 65-nm devices.

Gigaphoton President, Dr. Yuji Watanabe, noted, “The installation our 100th GigaTwin light source is yet another example of the growing confidence surrounding our ArF platforms’ capabilities and advantages, which contributed largely to our sales in 2007.   We’re excited to be sharing this milestone installation with one of our most-valued customers, but more importantly, are extremely pleased to be a part of enabling this important foundry’s leading-edge lithography processes.”

Since its inception in 2000, Gigaphoton’s laser shipments and market share have rapidly grown at a double-digit pace, fueled considerably by continued adoption in its ArF business.  The company reports sales of its ArF laser sources significantly exceeded that of its KrF sources in 2007.  This growth has contributed to a significant increase in revenue and worldwide market share, the latter of which Gigaphoton commands approximately 40 percent, based on laser unit sales in 2007.

Gigaphoton’s GT40A offers a 4-kHz, 45-W excimer light source with a spectrum below 0.50pm (E95) for integration into advanced lithography tools to print 65-nm and below circuit patterns.  The GT40A leverages the GigaTwin’s dual-chamber platform and injection-locking resonator that allows for the simultaneous maintenance of a narrow, low-output and an amplified, high-output spectral bandwidth within the system—a combination that is difficult to achieve with conventional technologies.  In addition, it provides lower peak-pulse energy that reduces damage to a lithography tool’s optics to achieve the lowest running cost in the industry.  Gigaphoton’s GT40A is also equipped with advanced self-diagnostics and offers ease of serviceability to ensure high reliability and uptime.

About Gigaphoton
Gigaphoton Inc. was founded in 2000 as a joint venture of Komatsu Ltd., the world’s No. 2 construction machinery manufacturer, and Ushio Inc., the world’s No. 1 lithography lamp manufacturer.  Since then, Gigaphoton has been developing and marketing user-friendly, highly innovative laser light sources that make a great contribution to lithography technology so as to meet the stringent requirements of the ultra-fine circuit patterns of the gigabit era, and is delivering them to major lithography tool suppliers in the global semiconductor industry.  As the world’s no. 2 excimer laser light source manufacturer, Gigaphoton holds a strong position in Asian market, including Japan, while also continuing to enjoy rapid growth in the U.S. and European markets.  More information about Gigaphoton can be found on the company’s website athttp://www.gigaphoton.com.

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The company name, logo, and designations GT40A are trademarks of Gigaphoton, Inc.  The content of this release may be revised without prior notice. Gigaphoton shall not be liable for updating or announcing a correction if the content of this release is changed for any reason in the future.
©2008 Gigaphoton.