ArF Immersion

ArF Dry

Data Products


<h2 class="wp-block-heading">6New 6 kHz Excimer Laser Model for 45-nm or below Technology Node</h2>



<p>Marking less than one year since the company began mass-production and shipment of the GT40A, Gigaphoton has now successfully developed the GT60A, delivering an improved repetition rate 1.5-times that of the GT40A. The GT60A is the latest-generation model, featuring the same injection-locking platform as that used by the GT40A, which has already been accepted by major users in the global semiconductor industry. The design concept and reliability of the GT40A are highly acclaimed in the industry, and because the GT60A is based on the same platform to maximize standardization as well as enable the use of common components, thereby ensuring users to achieve high reliability right from the onset.</p>



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<h3 class="wp-block-heading">Key Features</h3>



<h4 class="wp-block-heading"><strong><strong><strong><strong><strong>High Output and High Repetition Rate</strong></strong></strong></strong></strong></h4>



<p>Improving on the GT40A, which achieved a repetition rate of 4,000 Hz, the GT60A reaches a repetition rate of 6,000 Hz on the same platform through greatly enhanced efficiency. This improvement enables an output level of that is more than 33% higher than the GT40A, while limiting the energy per pulse. While the GT60A features output and repetition frequency enhancements, the laser’s spectral performance supports the resolution of lithography tools at the same level as the GT40A.</p>



<h4 class="wp-block-heading"><strong><strong><strong><strong>High Reliability and High Stability</strong></strong></strong></strong></h4>



<p>The GT60A leverages the same platform as that of the GT40A—maximizing standardization as well as enabling the use of common components for ensuring high reliability. In addition to its advanced self-diagnostic function, the GT60A features a variety of functions to enhance system availability. One of the major advantages of the GT series is the ease of module replacement and serviceability, which ensures the high reliability and high uptime essential in today’s semiconductor fabs.</p>



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<h3 class="wp-block-heading">General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value*</th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Output</td><td>60 W</td></tr><tr><td>Pulse Energy</td><td>10.0 mJ</td></tr><tr><td>Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.2 pm</td></tr><tr><td>Bandwidth (E95)</td><td>0.5 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>


GT60A

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<figure class="aligncenter size-full is-resized"><img loading="lazy" decoding="async" width="800" height="800" src="https://webapi2.gigaphoton.global/wp-content/uploads/2024/03/GT80A_v1_800.png" alt="GT80A" class="wp-image-8942" style="object-fit:cover;width:500px;height:500px" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2024/03/GT80A_v1_800.png 800w, https://webapi2.gigaphoton.global/wp-content/uploads/2024/03/GT80A_v1_800-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2024/03/GT80A_v1_800-150x150.png 150w, https://webapi2.gigaphoton.global/wp-content/uploads/2024/03/GT80A_v1_800-768x768.png 768w" sizes="(max-width: 800px) 100vw, 800px" /></figure></div>


<h2 class="wp-block-heading has-text-align-center" id="an-immersion-lithography-light-source-that-meets-more-stringent-technological-demands">Evolutionary Immersion Lithography Lightsource Driving Lithography Performance</h2>



<p>In the manufacturing of state-of-the-art devices, high productivity is required along with the scaling. Said state-of-the-art devices must meet requirements for lithography patterns transferred to wafers, especially EPE (Edge Placement Error) and high productivity. As a lightsource, by reducing CD LER/LWR (Critical Dimension Line Edge Roughness/Line Width Roughness), which directly affects EPE, the GT80A provides improved yield at mass production sites.<br><br>The new immersion lithography lightsource &#8220;GT80A&#8221; has successfully enhanced the repetition rate by 12.5% with newly developed modules. This leads to a 36% reduction in speckle contrast compared with GT65 and contributes to further reduction of LWR/CDU (Critical Dimension Uniformity). These advancements enable further improvement on process yield and support high productivity in the production of leading-edge nodes.</p>



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<h2 class="wp-block-heading" id="key-features">Key Features</h2>



<h3 class="wp-block-heading" id="improved-yield-with-state-of-the-art-nodes">Improved yield with state-of-the-art nodes</h3>



<p>GT80A achieved the reduction of speckle contrast by 36% and LER/LWR improvement by enhancing repetition rates and applying new optical module.<br>These advancements will enable improved yield in the production of leading-edge nodes in lithography.</p>



<h3 class="wp-block-heading" id="high-level-of-availability">High level of availability</h3>



<p>With the incorporation of newly developed modules, GT80A has achieved the enhanced repetition rate. This will contribute to higher yield in the production of leading-edge nodes.</p>



<h3 class="wp-block-heading" id="providing-sustainability-solutions">Providing sustainability solutions</h3>



<p>Equipped with helium-free technology as standard, the GT80A is an environmentally friendly lightsource that mitigates the risk of a supply shortage of rare gas and also uses technology to reduce the energy consumption of utilities.</p>
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<h2 class="wp-block-heading" id="general-specifications">General Specifications</h2>



<figure class="wp-block-table is-style-regular"><table><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Output</td><td>60 &#8211; 90 W</td></tr><tr><td>Repetition Rate</td><td>6,750 Hz</td></tr><tr><td>Spectral width<br>(95% integral energy &#8211; E95)</td><td>300 +/- 1.5 fm wafer average</td></tr><tr><td>Features</td><td>A solution to reduce EPE<br>Improvement of Reputation Rate<br>Sustainable Solution</td></tr></tbody></table><figcaption class="wp-element-caption">(*) specifications are representative values</figcaption></figure>
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GT80A


<div class="wp-block-image"><figure class="aligncenter size-full"><img loading="lazy" decoding="async" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/GT66A_500.png" alt="GT66A" class="wp-image-7586" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT66A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT66A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT66A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2 class="has-text-align-center wp-block-heading" id="an-immersion-lithography-light-source-that-meets-more-stringent-technological-demands">An Immersion Lithography Light Source That Meets More Stringent Technological Demands</h2>



<p>In the manufacturing of state-of-the-art devices, Moore&#8217;s Law continues today with the size of technology nodes getting smaller and smaller. Said state-of-the-art devices must meet requirements for lithography patterns transferred to wafers, especially EPE (Edge Placement Error). As a light source, by reducing CD LER/LWR (Line Edge Roughness/Line Width Roughness), which directly affects EPE, the GT66A provides improved yield at mass production sites.<br><br>The new immersion lithography light source, the GT66A, has succeeded in reducing speckle contrast by 30% and LER/LWR with a newly developed optical module. We have also extended the module maintenance cycle by 30% by introducing the latest high durability components. This further improves the process yield and improves the availability of the light source, aiding high productivity in the mass production of state-of-the-art nodes.</p>



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<h2 class="wp-block-heading" id="key-features">Key Features</h2>



<h3 class="wp-block-heading" id="improved-yield-with-state-of-the-art-nodes">Improved yield with state-of-the-art nodes</h3>



<p>Improved LER and LWR thanks to the newly developed optical module that reduces speckle contrast by 30%. This provides further yield improvements in the mass production of state-of-the-art lithography nodes.</p>



<h3 class="wp-block-heading" id="high-level-of-availability">High level of availability</h3>



<p>We have extended the module maintenance cycle by 30% by introducing the latest high durability components. This achieves a high level of availability to contribute to improved productivity.</p>



<h3 class="wp-block-heading" id="providing-sustainability-solutions">Providing sustainability solutions</h3>



<p>Equipped with helium-free technology as standard, the GT66A is an environmentally friendly light source that mitigates the risk of a supply shortage of rare gas and also uses technology to reduce the energy consumption of utilities.</p>
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<h2 class="wp-block-heading" id="general-specifications">General Specifications</h2>



<figure class="wp-block-table is-style-regular"><table><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Output</td><td>60 &#8211; 90 W</td></tr><tr><td>Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>Spectral width<br>(95% integral energy &#8211; E95)</td><td>300 +/- 1.5 fm wafer average</td></tr><tr><td>Features</td><td>A solution to reduce EPE<br>CRI (Continuous Reliability Improvement) Package<br>Sustainable Solution</td></tr></tbody></table><figcaption>(*) specifications are representative values</figcaption></figure>
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GT66A


<div class="wp-block-image"><figure class="aligncenter size-full"><img decoding="async" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/GT65A_500.png" alt="GT65A" class="wp-image-7585"/></figure></div>



<h2 class="wp-block-heading">An ArF Excimer Laser that Contributes to Productivity Improvements, for Immersion Exposure Devices Intended for Sub-10nm Nodes.</h2>



<p>GT65A, the seventh generation of platforms using the injection lock method, is installed with leading-edge technology and achieves further improved productivity (wafer output) for the customer through “exposure performance improvements” due to changeable spectral width (E95) and improved stability, “high availability” due to extended module lifespan and “reduced environmental load” as it is helium free.</p>



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<h3 class="wp-block-heading">Key Features</h3>



<h4 class="wp-block-heading">Changeable spectral width (E95)</h4>



<p>The spectral width can be modified in order to suit various customer requirements and uses. For example, the spectral width can compensate for contrast performance variations in different generations of exposure devices. Also, it is possible to match OPC characteristics between equipment or between masks due to the changeable spectral width functionality*<sup>1</sup><br>*1) This functionality varies according to the connected exposure device.</p>



<h4 class="wp-block-heading">Improved spectral width (E95) stability</h4>



<p>The spectral width control speed has been successfully increased to 20 times that of previous equipment. This ensures that the spectral width is more stable during equipment operation and allows for a reduction in critical dimension errors.</p>



<h4 class="wp-block-heading">Extended module lifespan</h4>



<p>By extending the main module lifespan, the maintenance frequency has been decreased even further. This makes it possible to operate the equipment for extended periods of time.</p>



<h4 class="wp-block-heading">Helium free</h4>



<p>Technology that uses zero helium for ArF excimer laser operation is installed. This contributes to a reduction in customer costs and a reduced environmental load.</p>
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<h3 class="wp-block-heading">General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Power</td><td>≥60 W</td></tr><tr><td>Pulse Energy</td><td>10.0 &#8211; 20.0 mJ</td></tr><tr><td>Max Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>Bandwidth (E95)</td><td>0.20 – 0.45 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value.</figcaption></figure>
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GT65A


<div class="wp-block-image"><figure class="aligncenter size-full"><img loading="lazy" decoding="async" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/GT64A_500.png" alt="GT64A" class="wp-image-7593" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT64A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT64A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT64A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2 class="wp-block-heading">State of the Art ArF Immersion Excimer Laser Supporting 450mm Wafer Multi-patterning Lithography</h2>



<p>The GT64A offers the industry&#8217;s highest output power of 120W with &nbsp;high beam performance and stability. &nbsp;With design emphasis on performance, efficiency, and reduction of environmental impact, the product challenges the limits of total operational cost efficiency. &nbsp; This is the 6th generation of products to inherit Gigaphoton&#8217;s timeless Injection Lock (TM) technology.</p>



<p>Based on the GT platform&#8217;s renowned Twin Chamber Architecture, Output Control Algorithm, Beam Alignment Technologies, the GT64A delivers a power output of 120W, exceptional beam performance and stability, and the industry&#8217;s top class reliability, recovery time, and module life.</p>



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<h3 class="wp-block-heading">Key Features</h3>



<h4 class="wp-block-heading">Insustry&#8217;s Highest Level of Efficiency and Output Power</h4>



<p>Based on the industry&#8217;s highest level lasing efficiency achieved through the Injection Lock (TM) technology, the GT64A promises to deliver the necessary power (120W) for achieving high throughput on 450mm wafer multi-patterning lithography.</p>



<h4 class="wp-block-heading">Auto-Adjustable Output</h4>



<p>The GT64A is capable of auto-adjusting the output power to meet the specific requirements of each customers&#8217; processes. &nbsp;Furthermore, this feature also prevent generation of needless light, thus contributing to the reduction of the operational cost and environmental impact.</p>



<h4 class="wp-block-heading">High Laser Beam Stability</h4>



<p>High overlay accuracy, CD control, and reduction of line-edge roughness are extremely important for multi-patterning lithography. &nbsp;In order to address these requirements, the GT64A offers wide pulse widths and high energy, spectrum, and beam shape stability for all power levels.</p>



<h4 class="wp-block-heading">Low Environmental Impact</h4>



<p>One of the product&#8217;s key design concept was the reduction of environmental impact. &nbsp;Because of this, the product is able to reduce the overall electricity, gas, and cooling costs to its limits, resulting in a reduction of total operational cost and impact to the environment.</p>
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<h3 class="wp-block-heading">General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Power</td><td>60 &#8211; 120 W</td></tr><tr><td>Pulse Energy</td><td>10.0 &#8211; 20.0 mJ</td></tr><tr><td>Max Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>E95 Bandwidth &nbsp;</td><td>0.25 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value.</figcaption></figure>
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GT64A


<div class="wp-block-image"><figure class="aligncenter size-full"><img loading="lazy" decoding="async" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/GT63A_500.png" alt="GT63A" class="wp-image-7583" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT63A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT63A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/01/GT63A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2 class="wp-block-heading">Next-Generation ArF Excimer Laser, Model GT63A: Designed for Multi-Patterning Immersion Lithography Scanners</h2>



<p>The GT63A, the latest model of the GT series, is a fifth-generation model featuring the same injection-locking platform.<br>The GT63A is mounted with the four “s” series functions designed in response to customers’ needs to create additional value: sMPL (Spectrum Multi-Positioning LNM)*1, the first customer-approved spectrum control (“focus drilling”) technology to achieve a wider depth of focus; sGRYCOS (Sixty Gigaphoton Recycled Chamber Operation System), a unique chamber technology that lowers operating costs; sTGM (Supreme Total Gas Manager), a gas management system that achieves higher uptime while using less process gas; and sMONITORING (Smart Monitoring), real-time information management tracking of the highest laser stability in the market.<br><br>The GT series has been widely accepted by our major customers; it is renowned worldwide for its design concept and high reliability.<br><br>The GT63A is designed on the same platform as the previous GT series models so as to use as many common components as possible, thus ensuring high reliability immediately after introduction to customers’ sites</p>



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<h3 class="wp-block-heading">GT63A Main Features &#8211;&nbsp;Four “s” Series Functions</h3>



<h4 class="wp-block-heading">sMPL</h4>



<p>The sMPL technology for focus drilling increases laser spectrum control width to a level 10 times that of conventional technology, thus creating a greater depth of focus. Focus drilling enables expansion of the lithography process window for contact holes, trenches and vias that is not possible with conventional technology, while avoiding negative effects on critical dimension uniformity (CDU), overlay and productivity. The sMPL technology was tested in a high-volume manufacturing environment in partnership with a leading scanner manufacturer and device manufacturer.</p>



<h4 class="wp-block-heading">sGRYCOS</h4>



<p>The enhanced sGRYCOS technology extends the effective life of a laser chamber — one of the main consumable components of an excimer laser — to 1.5 times longer than any conventional chamber today, offering world-class endurance that significantly reduces factory operating costs. This durability results from increasing the strength of the pre-ionization &nbsp;in a newly developed chamber and uses a robust pulse-power supply for today’s and tomorrow’s power requirements.</p>



<h4 class="wp-block-heading">sTGM</h4>



<p>The sTGM technology implements an innovative wavelength calibration method to eliminate the previous need to routinely replace the laser chamber’s gas. This new industry standard completely eliminates wasted process gases based on calibration requirements, thereby measurably reducing facility costs and improving laser availability on an annual basis. This unique gas management technology allows for system calibration of laser wavelength “as-is” without replacement of the laser chamber’s gas, a first-of-its-kind capability.</p>



<h4 class="wp-block-heading">sMONITORING</h4>



<p>The sMONITORING technology, an extension of existing real-time monitoring of laser performance, can be connected with the end-user’s FDC (Fault Detection and Classification) system to monitor system operation. It is a final check on highly stable laser output to the scanner and on-wafer performance.</p>
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<h3 class="wp-block-heading">Main Specifications</h3>



<figure class="wp-block-table is-style-regular"><table><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Output</td><td>60/90 W</td></tr><tr><td>Pulse Energy</td><td>10.0/15.0 mJ</td></tr><tr><td>Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>Bandwidth (E95)</td><td>0.3 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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GT63A


<div class="wp-block-image"><figure class="aligncenter size-full"><img loading="lazy" decoding="async" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/05/GT62A_500.png" alt="GT62A" class="wp-image-8005" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/05/GT62A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/05/GT62A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/05/GT62A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2 class="wp-block-heading">6-kHz Excimer Laser, Model GT62A: Designed for Double-Patterning Immersion Lithography Tools, Delivers World&#8217;s Highest Output (90 Watts)</h2>



<p>The GT62A, the latest model of the GT series, is the fourth-generation model featuring the same injection-locking platform; it delivers the world’s highest output, 90 watts, to support double-patterning immersion lithography*. In order to meet a variety of customer needs, a 60-W version of the GT62A also is available to ensure maximum return on investment. In addition, the GT62A incorporates technologies that enable longer life of the laser chamber and optics so as to minimize downtime in support of the most advanced processing with less economic risk.</p>



<p>The GT series already has been accepted by major users in the global semiconductor industry, and its design concept and reliability have received wide acclamation. The GT62A is based on the same platform, thus maximizing standardization as well as enabling the use of common components. Users of the GT62A, therefore, can benefit from its high-reliability advantage right from the start.</p>



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<h3 class="wp-block-heading">Key Features</h3>



<h4 class="wp-block-heading"><strong>High Output and High Reliability</strong></h4>



<p>The GT62A features a newly developed power supply that enables high output of 90 watts (a 50% improvement compared with model GT61A). The light source also is mounted with a technology to take measures against the heat load, which increases as the output increases. It also has newly developed, highly durable optics to ensure high performance reliability even during high-output operation. The GT62A comes with Gigaphoton’s original “Bandwidth Control Module (BCM)” technology as standard to provide a stabilized spectrum.<br>In order to meet a variety of customer needs, a 60-W version of the GT62A also is available. This version allows operation at the 60-watt mode at less cost, but can be upgraded to 90-watt mode when ready to scale; this flexibility enables the return on investment to be maximized.</p>



<h4 class="wp-block-heading"><strong>Cost Savings</strong></h4>



<p>Today, semiconductor equipment has rapidly progressed to demonstrate higher performance and higher throughput. Gigaphoton is committed to ensuring that its lasers deliver high uptime over a long period of time in order to enhance customer fab productivity. The GT62A incorporates technologies that can reduce downtime caused by gas refill to one-tenth that of the previous GT series models; it enables longer life of the laser chamber and optics — ultimately reducing maintenance downtime and costs.</p>



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<h3 class="wp-block-heading">General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value*</th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Output</td><td>60/90 W</td></tr><tr><td>Pulse Energy</td><td>10.0/15.0 mJ</td></tr><tr><td>Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>Bandwidth (E95)</td><td>0.35 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>


GT62A


<div class="wp-block-image"><figure class="aligncenter size-full"><img loading="lazy" decoding="async" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/05/GT61A_500.png" alt="GT61A" class="wp-image-8013" srcset="https://webapi2.gigaphoton.global/wp-content/uploads/2022/05/GT61A_500.png 500w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/05/GT61A_500-300x300.png 300w, https://webapi2.gigaphoton.global/wp-content/uploads/2022/05/GT61A_500-150x150.png 150w" sizes="(max-width: 500px) 100vw, 500px" /></figure></div>



<h2 class="wp-block-heading">6 kHz Excimer Laser for Hyper N.A. Immersion Lithography Tools</h2>



<p><em>6 kHz Excimer Laser Supporting Immersion Lithography Tools with N.A. of 1.3 or more</em></p>



<p>Less than a year after we began mass-production and shipment of the GT60A, Gigaphoton has successfully developed the GT61A. Model GT61A offers a 30% improvement of spectral bandwidth (E95%) from that of the GT60A as well as a longer laser chamber life to reduce both downtime and maintenance cost. The GT61A, the third-generation model of the GT series, features the same injection-locking platform as that used by models GT40A and GT60A, which already have been accepted by major users in the global semiconductor industry. The design concept and reliability of the GT series are highly acclaimed in the industry. Because it is based on the same platform, the GT61A maximizes standardization and enables the use of common components, thereby ensuring that users can achieve high reliability right from the outset.</p>



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<h3 class="wp-block-heading">Key Features</h3>



<h4 class="wp-block-heading"><strong><strong>Improved Spectrum Performance</strong></strong></h4>



<p>Improving on the GT60A, which achieved a spectral bandwidth (E95%) of 0.5 pm, the GT61A reaches a spectral bandwidth of 0.35 pm. In addition, a newly developed high-precision measuring instrument and stabilization mechanism are provided as a standard feature, allowing highly stable spectrum performance throughout the entire life time. The GT61A represents a great contribution to the stability of the lithography process.</p>



<h4 class="wp-block-heading"><strong><strong>High Reliability and High Stability</strong></strong></h4>



<p>With its lengthened laser chamber life, the GT61A enabled a reduction of down time for maintenance as well as reduced maintenance cost. A major advantage of the GT series is the ease of module replacement and serviceability, ensuring the high reliability and high uptime essential in today’s semiconductor fabs. The GT61A leverages the same platform as that of the GT40A/GT60A, thereby maximizing standardization as well as enabling the use of common components to ensure high reliability even from the beginning of its introduction.</p>



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<h3 class="wp-block-heading">General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value*</th></tr></thead><tbody><tr><td>Wavelength</td><td>193 nm</td></tr><tr><td>Average Output</td><td>60 W</td></tr><tr><td>Pulse Energy</td><td>10.0 mJ</td></tr><tr><td>Repetition Rate</td><td>6,000 Hz</td></tr><tr><td>Bandwidth (E95)</td><td>0.35 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>


GT60AGT60A

6New 6 kHz Excimer Laser Model for 45-nm or below Technology Node

Key Features

High Output and High Repetition Rate

High Reliability and High Stability

General Specifications

Other ArF Immersion