High Power KrF for Laser Processing

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<h2 class="wp-block-heading" id="krf-4-khz-excimer-laser-for-up-to-130-nm-technology-nodes">2 kHz KrF Excimer Laser for 0.18 µm Design Rule</h2>



<p>The G20K features high energy stability (±0.4%) and a narrow spectral bandwidth (FWHM) of 0.6 pm or less to allow exposure of 0.18-µm geometries at high resolution.</p>



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<h3 class="wp-block-heading" id="key-features">Key Features</h3>



<ul class="wp-block-list"><li>Repetition rate increased from 1000 Hz (G10K) to 2000 Hz to achieve higher throughput.</li><li>Great enhancement of laser emission stability and module durability allows further reduction of the CoO (running cost per pulse).</li><li>Compact size that reduces the floor footprint by 14% compared with the G10K.</li><li>A newly designed solid-state pulse power supply allows a 20% reduction of power consumption.</li></ul>
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<h3 class="wp-block-heading" id="general-specifications">General Specifications</h3>



<figure class="wp-block-table"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>248 nm</td></tr><tr><td>Average Output</td><td>20 W</td></tr><tr><td>Pulse Energy</td><td>10.0 mJ</td></tr><tr><td>Repetition Rate</td><td>2,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.6 pm</td></tr><tr><td>Bandwidth (E95)</td><td>2.0 pm</td></tr><tr><td>Energy Dose Stability</td><td>0.4 %</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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G20K

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<figure class="aligncenter size-full"><img loading="lazy" decoding="async" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G300K_500.png" alt="G300K" class="wp-image-7601" srcset="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G300K_500.png 500w, https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G300K_500-300x300.png 300w, https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G300K_500-150x150.png 150w" sizes="auto, (max-width: 500px) 100vw, 500px" /></figure></div>


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<h2 class="wp-block-heading has-text-align-center" id="a-new-product-in-the-giganex-series-the-g300k-is-a-300-w-krf-laser-for-next-generation-ultra-fine-ablation-processing-a-high-output-highly-reliable-model-that-helps-to-reduce-cost-of-ownership-coo">A 300 W KrF laser for next-generation ultra-fine ablation processing &#8211; a high output, highly reliable model that helps to reduce Cost of Ownership (COO)</h2>



<p>The KrF laser &#8220;G300K&#8221; is based on the concept of “optimizing processing” such as for ultrafine ablation, the G300K maximizes the return on investment (ROI) of our customers while maintaining high output and high availability of at least 99%. As the basic platform, the G300K uses our KrF light source for semiconductor lithography, the G41K, which has sold more than 900 units. We have also newly developed and installed a power supply and laser chamber optimized for high output. This will help maximize our customers&#8217; ROI by improving productivity and reducing COO in next-generation ultrafine ablation processing in the back-end process of semiconductor manufacturing.</p>



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<h2 class="wp-block-heading" id="key-features">Key Features</h2>



<h3 class="wp-block-heading" id="high-repetition-and-high-output">High repetition and high output</h3>



<p>The G300K achieves a high repetition rate of 4,000 Hz and a high output of 300 W, which puts it in a league of its own as a KrF laser for processing. Ultrafine ablation processing is now possible in areas where it was once out of the question with previous UV lasers.</p>



<h3 class="wp-block-heading" id="high-availability">High availability</h3>



<p>As a lithography KrF light source for semiconductors, the G300K carries the baton of the reliability provided by the G41K, which boasts a track record of more than 900 units, and realizes high availability of at least 99%.</p>



<h3 class="wp-block-heading" id="long-lifespan">Long lifespan</h3>



<p>Built to withstand intense productivity, the G300K carries forward the heritage of our semiconductor manufacturing light sources with its long-lifespan module, and also helps to improve the yields and reduce the maintenance costs of our customers by having long maintenance cycles.</p>
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<h2 class="wp-block-heading" id="general-specifications">General Specifications</h2>



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<table class="has-fixed-layout">
<thead>
<tr>
<th>Item</th>
<th colspan="2">Value<sup>*</sup></th>
</tr>
</thead>
<tbody>
<tr>
<td>Wavelength</td>
<td colspan="2">248 nm</td>
</tr>
<tr>
<td>Average Output</td>
<td>75W</td>
<td>300W</td>
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<tr>
<td>Pulse Energy</td>
<td>75mJ</td>
<td>75mJ</td>
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<tr>
<td>Repetition Rate</td>
<td>1000Hz</td>
<td>4000Hz</td>
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<tr>
<td>Application</td>
<td colspan="2">Next-generation ultra-fine ablation processing</td>
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</tbody>
</table><figcaption>(*) Each of the above specification values represents a typical value.</figcaption></figure>
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G300K


<div class="wp-block-image"><figure class="aligncenter size-full"><img loading="lazy" decoding="async" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G60K_500.png" alt="G60K" class="wp-image-7600" srcset="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G60K_500.png 500w, https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G60K_500-300x300.png 300w, https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G60K_500-150x150.png 150w" sizes="auto, (max-width: 500px) 100vw, 500px" /></figure></div>



<h2 class="wp-block-heading">A KrF Lithography Light Source That Achieves a High Output 150% Greater Than the Previous Model to Meet the Output Demands of Tomorrow</h2>



<p>Based on our KrF light source technology that is the result of many years of technological evolution and accumulated experience, the KrF lithography light source, G60K, which supports a scanner throughput of at least 300 wafers per hour, offers an output 150% greater than the previous model. Also, by extending the module’s lifespan by 200%, the G60K delivers improvements in terms of availability as well. A newly developed power supply and module see the G60K support performance improvements such as higher frequencies in preparation for the higher outputs of tomorrow to meet the demands of KrF lithography technology in the years to come. Helium-free technology is also installed as standard, meaning the G60K also contributes to reducing the energy consumption of utilities.</p>



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<h3 class="wp-block-heading">Key Features</h3>



<h4 class="wp-block-heading">Scanner throughput boasts a greater output of 300 wafers per hour</h4>



<p>By introducing a new power supply unit, it is now possible to output 60 W, which is 150% greater than the output of the previous model. This greater output suppresses throughput loss even for low-sensitivity resistances such as thick-film resistances, thereby contributing to even greater productivity.</p>



<h4 class="wp-block-heading">Follows in the footsteps of our technology that already offers availability of at least 99.9%</h4>



<p>Based on the technology of the G41K, a model that has received rave reviews by our customers for its high availability in the field and performance stability, the G60K achieves an availability of at least 99.9% in all output ranges. The introduction of new technology has extended the module’s lifespan by 200% and offers improved availability.</p>



<h4 class="wp-block-heading">Providing sustainable solutions</h4>



<p>Equipped with helium-free technology as standard, the G60K is an environmentally friendly light source that mitigates the risk of a supply shortage of rare gas and also uses technology to reduce the energy consumption of utilities.</p>
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<h3 class="wp-block-heading">General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>248 nm</td></tr><tr><td>Output</td><td>40W &#8211; 60W</td></tr><tr><td>Pulse Energy</td><td>10mJ &#8211; 15mJ</td></tr><tr><td>Repetition Rate</td><td>4000Hz</td></tr><tr><td>Features</td><td>Continuous Reliability Improvement (CRI) Package<br>Sustainable Solution<br>・Helium Free Operation<br>・TGM Gas Management</td></tr></tbody></table><figcaption>(*) specifications are representative values</figcaption></figure>
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G60K


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<h2 class="wp-block-heading" id="4-khz-krf-excimer-laser-supporting-50-w-output">4 kHz KrF Excimer Laser Supporting 50 W Output</h2>



<p>The G45K, the 3rd generation model in the 4 kHz KrF excimer laser series, is aimed at improving the efficiency of state-of-the-art memory chip production, providing a 50 W maximum high-power output. In addition, both “improved availability” and “reduced environmental impact” are realized through extension of the lifetime of the modules, and through the application of green technology.</p>



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<h3 class="wp-block-heading" id="key-features">Key Features</h3>



<h4 class="wp-block-heading" id="higher-output">Higher output</h4>



<p>A high output power of 50 W has been achieved, representing an increase of 25% in comparison to existing products. This contributes to productivity improvements for state-of-the-art memory chips.</p>



<h4 class="wp-block-heading" id="extended-module-lifetime">Extended module lifetime</h4>



<p>Downtime due to maintenance have been reduced by extending the main module lifetime by 20%. It conduces to further availability improvement in light source.</p>



<h4 class="wp-block-heading" id="green-technology">Green technology</h4>



<p>“Helium-free” technology, which achieves zero consumption of helium during light source operation, is installed as standard. Also, it is compatible with the “hTGM” neon gas recycling system which contributes to reduced operational costs and environmental impact.</p>
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<h3 class="wp-block-heading" id="general-specifications">General Specifications</h3>



<figure class="wp-block-table is-style-regular"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>248 nm</td></tr><tr><td>Average Power</td><td>40 W – 50 W</td></tr><tr><td>Pulse Energy</td><td>10.0 &#8211; 12.5 mJ</td></tr><tr><td>Max Repetition Rate</td><td>4,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.35 pm</td></tr><tr><td>Bandwidth (E95)</td><td>1.1 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value.</figcaption></figure>
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G45K


<div class="wp-block-image"><figure class="aligncenter size-full"><img loading="lazy" decoding="async" width="500" height="500" src="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G41K_500.png" alt="" class="wp-image-7648" srcset="https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G41K_500.png 500w, https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G41K_500-300x300.png 300w, https://webapi.gigaphoton.global/wp-content/uploads/2022/01/G41K_500-150x150.png 150w" sizes="auto, (max-width: 500px) 100vw, 500px" /></figure></div>



<h2 class="wp-block-heading" id="krf-4-khz-excimer-laser-for-up-to-130-nm-technology-nodes">KrF 4 kHz Excimer Laser for up to 130 nm Technology Nodes</h2>



<p>As the upgrade version of the second-generation model of 4-kHz excimer laser G41K, G41K-1H is mounted with a magnetic-levitation laser chamber and highly efficient line-narrowing and monitor modules on the G41K platform as standard features to achieve a high output of 40 W, one class higher than any other product. The G41K-1H has prolonged the life of each optical module to 30 billion pulses (50% longer than the G41K). The G41K can be upgraded to the G41K-1H in the field by replacing their modules.</p>



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<h3 class="wp-block-heading" id="key-features">Key Features</h3>



<ul class="wp-block-list"><li>Higher output of 40 W/ultra-low CoO by further enhancing the emission efficiency of the G41K</li><li>Use of the TGM software allows prolongation of the gas life by an additional 100% compared with the conventional life</li><li>Higher reliability proven by hundreds of laser units running in the field</li></ul>
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<h3 class="wp-block-heading" id="general-specifications">General Specifications</h3>



<figure class="wp-block-table"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>248 nm</td></tr><tr><td>Average Output</td><td>40 W</td></tr><tr><td>Pulse Energy</td><td>10.0 mJ</td></tr><tr><td>Repetition Rate</td><td>4,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.35 pm</td></tr><tr><td>Bandwidth (E95)</td><td>1.1 pm</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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G41K-1H


<h2 class="wp-block-heading" id="krf-4-khz-excimer-laser-for-up-to-130-nm-technology-nodes">2 kHz KrF Excimer Laser for 0.13 µm Design Rule</h2>



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<h3 class="wp-block-heading" id="key-features">Key Features</h3>



<ul class="wp-block-list"><li>Further enhancement of the field-proven energy stability of the G20K</li><li>Ultra-narrow bandwidth of 0.5 pm (FWHM) achieved by improvement of the line-narrowing module to allow exposure of 0.13 µm geometries</li></ul>
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<h3 class="wp-block-heading" id="general-specifications">General Specifications</h3>



<figure class="wp-block-table"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>248 nm</td></tr><tr><td>Average Output</td><td>20 W</td></tr><tr><td>Pulse Energy</td><td>10.0 mJ</td></tr><tr><td>Repetition Rate</td><td>2,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.5 pm</td></tr><tr><td>Bandwidth (E95)</td><td>1.4 pm</td></tr><tr><td>Energy Dose Stability</td><td>0.35 %</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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G21K


<h2 class="wp-block-heading" id="krf-4-khz-excimer-laser-for-up-to-130-nm-technology-nodes">1-kHz KrF Excimer Laser for 0.25 µm to 0.18 µm Design Rule</h2>



<p>Stability and durability are the biggest technological challenges for an excimer laser, because it uses fluorine, high-voltage discharge, and deep UV, all of which are highly reactive. As well as stability and durability, an excimer laser light source for lithography tools requires high monochromaticity for the laser beam and high uniformity for the output energy.<br>As the world’s first excimer laser light source that satisfies all of these requirements, the G10K has earned a top reputation in the lithography light source market since it was marketed in 1997. This model is still operating in the field world wide.</p>



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<h3 class="wp-block-heading" id="key-features">Key Features</h3>



<ul class="wp-block-list"><li>Stable emission and high durability for achieving high uptime and low cost of ownership</li><li>Gigaphoton’s original RF pre-ionizer and newly developed high-voltage pulse power supply allows great improvement of emission stability as well as great enhancement of durability</li><li>A sufficient performance margin for each module and a complete quality assurance system ensure high reliability of the product</li></ul>
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<h3 class="wp-block-heading" id="general-specifications">General Specifications</h3>



<figure class="wp-block-table"><table class="has-fixed-layout"><thead><tr><th>Item</th><th>Value<sup>*</sup></th></tr></thead><tbody><tr><td>Wavelength</td><td>248 nm</td></tr><tr><td>Average Output</td><td>10 W</td></tr><tr><td>Pulse Energy</td><td>10.0 mJ</td></tr><tr><td>Repetition Rate</td><td>1,000 Hz</td></tr><tr><td>Bandwidth (FWHM)</td><td>0.6 pm</td></tr><tr><td>Bandwidth (E95)</td><td>2.0 pm</td></tr><tr><td>Energy Dose Stability</td><td>0.5 %</td></tr></tbody></table><figcaption>(*) Each of the above specification values represents a typical value</figcaption></figure>
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G20KG20K

2 kHz KrF Excimer Laser for 0.18 µm Design Rule

Key Features

General Specifications

Other KrF

G300K

G60K

G45K

G41K-1H

G21K

G10K

Item	Value^*
Wavelength	248 nm
Average Output	20 W
Pulse Energy	10.0 mJ
Repetition Rate	2,000 Hz
Bandwidth (FWHM)	0.6 pm
Bandwidth (E95)	2.0 pm
Energy Dose Stability	0.4 %