In 2001, Gigaphoton introduced the world’s first mass-production ArF excimer laser that enables laser emission at the high repetition rate of 4 KHz. Since then, Gigaphoton has been marketing the most advanced ArF models of excimer laser light sources for high-performance lithography tools and has made a great contribution to the development of lithography technologies that meet the requirements of ultra-fine circuit patterns for gigabit-generation semiconductor devices.
In addition, we offer a complete lineup of KrF excimer laser products that have been widely accepted because of their high performance, high quality, and low cost of ownership (CoO) to support the competitive edge of the world’s major lithography tool manufacturers.
Gigaphoton DUV in Lithography Light Source:
Gigaphoton EUV in Lithography Light Source: